JPS6242157A - イオンビ−ム照射加工装置 - Google Patents

イオンビ−ム照射加工装置

Info

Publication number
JPS6242157A
JPS6242157A JP60182464A JP18246485A JPS6242157A JP S6242157 A JPS6242157 A JP S6242157A JP 60182464 A JP60182464 A JP 60182464A JP 18246485 A JP18246485 A JP 18246485A JP S6242157 A JPS6242157 A JP S6242157A
Authority
JP
Japan
Prior art keywords
ion beam
workpiece
dot
beam irradiation
blank time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60182464A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0135340B2 (enExample
Inventor
Kazuo Aida
和男 相田
Kojin Yasaka
行人 八坂
Yoshitomo Nakagawa
良知 中川
Mitsuyoshi Sato
佐藤　光義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments and Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments and Electronics Ltd filed Critical Seiko Instruments and Electronics Ltd
Priority to JP60182464A priority Critical patent/JPS6242157A/ja
Publication of JPS6242157A publication Critical patent/JPS6242157A/ja
Publication of JPH0135340B2 publication Critical patent/JPH0135340B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60182464A 1985-08-20 1985-08-20 イオンビ−ム照射加工装置 Granted JPS6242157A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60182464A JPS6242157A (ja) 1985-08-20 1985-08-20 イオンビ−ム照射加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60182464A JPS6242157A (ja) 1985-08-20 1985-08-20 イオンビ−ム照射加工装置

Publications (2)

Publication Number Publication Date
JPS6242157A true JPS6242157A (ja) 1987-02-24
JPH0135340B2 JPH0135340B2 (enExample) 1989-07-25

Family

ID=16118719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60182464A Granted JPS6242157A (ja) 1985-08-20 1985-08-20 イオンビ−ム照射加工装置

Country Status (1)

Country Link
JP (1) JPS6242157A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63241953A (ja) * 1987-03-30 1988-10-07 Seiko Instr & Electronics Ltd イオンビーム加工方法
JPH01130158A (ja) * 1987-11-16 1989-05-23 Seiko Instr & Electron Ltd パターン膜修正方法およびその装置
JPH0532289A (ja) * 1991-01-19 1993-02-09 Basf Magnetics Gmbh テープカセツト用の平行六面体容器
CN108766877A (zh) * 2018-04-19 2018-11-06 中国科学院上海应用物理研究所 一种具有周期性的表面电势梯度的材料的制备方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63241953A (ja) * 1987-03-30 1988-10-07 Seiko Instr & Electronics Ltd イオンビーム加工方法
JPH01130158A (ja) * 1987-11-16 1989-05-23 Seiko Instr & Electron Ltd パターン膜修正方法およびその装置
JPH0532289A (ja) * 1991-01-19 1993-02-09 Basf Magnetics Gmbh テープカセツト用の平行六面体容器
CN108766877A (zh) * 2018-04-19 2018-11-06 中国科学院上海应用物理研究所 一种具有周期性的表面电势梯度的材料的制备方法

Also Published As

Publication number Publication date
JPH0135340B2 (enExample) 1989-07-25

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees