JPS6239532B2 - - Google Patents
Info
- Publication number
- JPS6239532B2 JPS6239532B2 JP54149726A JP14972679A JPS6239532B2 JP S6239532 B2 JPS6239532 B2 JP S6239532B2 JP 54149726 A JP54149726 A JP 54149726A JP 14972679 A JP14972679 A JP 14972679A JP S6239532 B2 JPS6239532 B2 JP S6239532B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- gas
- electrodes
- support
- uniform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P14/3411—
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- H10P14/24—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Photoreceptors In Electrophotography (AREA)
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14972679A JPS5671930A (en) | 1979-11-19 | 1979-11-19 | Film formation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14972679A JPS5671930A (en) | 1979-11-19 | 1979-11-19 | Film formation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5671930A JPS5671930A (en) | 1981-06-15 |
| JPS6239532B2 true JPS6239532B2 (en:Method) | 1987-08-24 |
Family
ID=15481461
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14972679A Granted JPS5671930A (en) | 1979-11-19 | 1979-11-19 | Film formation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5671930A (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0382403A (ja) * | 1989-08-28 | 1991-04-08 | Matsushita Electric Works Ltd | 昇降テーブル |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56150874A (en) * | 1980-04-23 | 1981-11-21 | Teijin Ltd | Method of continuously manufacturing amorphous silicon solar battery |
| JPS6059728A (ja) * | 1983-09-12 | 1985-04-06 | Sanyo Electric Co Ltd | 半導体膜の製造方法 |
| JPS6059729A (ja) * | 1983-09-12 | 1985-04-06 | Sanyo Electric Co Ltd | 半導体膜の製造方法 |
| FR2550007A1 (en) * | 1983-07-29 | 1985-02-01 | Sanyo Electric Co | Method for producing a semiconducting film and photovoltaic device obtained by the method |
| JPH0763057B2 (ja) * | 1984-11-12 | 1995-07-05 | 鐘淵化学工業株式会社 | 多電極薄膜形成方法 |
-
1979
- 1979-11-19 JP JP14972679A patent/JPS5671930A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0382403A (ja) * | 1989-08-28 | 1991-04-08 | Matsushita Electric Works Ltd | 昇降テーブル |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5671930A (en) | 1981-06-15 |
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