JPS6235359A - コ−テツド薄膜の製造法 - Google Patents

コ−テツド薄膜の製造法

Info

Publication number
JPS6235359A
JPS6235359A JP60175249A JP17524985A JPS6235359A JP S6235359 A JPS6235359 A JP S6235359A JP 60175249 A JP60175249 A JP 60175249A JP 17524985 A JP17524985 A JP 17524985A JP S6235359 A JPS6235359 A JP S6235359A
Authority
JP
Japan
Prior art keywords
thin film
layer
coating
calcium fluoride
fluoride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60175249A
Other languages
English (en)
Japanese (ja)
Inventor
Shigeyuki Takahashi
重之 高橋
Kaoru Yamaki
山木　薫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP60175249A priority Critical patent/JPS6235359A/ja
Priority to KR1019850009008A priority patent/KR910005878B1/ko
Priority to US06/806,145 priority patent/US4748050A/en
Priority to CA498102A priority patent/CA1265000C/en
Priority to DE19863601827 priority patent/DE3601827A1/de
Publication of JPS6235359A publication Critical patent/JPS6235359A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/06—Coating with compositions not containing macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
JP60175249A 1985-08-09 1985-08-09 コ−テツド薄膜の製造法 Pending JPS6235359A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP60175249A JPS6235359A (ja) 1985-08-09 1985-08-09 コ−テツド薄膜の製造法
KR1019850009008A KR910005878B1 (ko) 1985-08-09 1985-12-02 얇은 고투광성 필름의 제조방법
US06/806,145 US4748050A (en) 1985-08-09 1985-12-06 Process for preparing thin film having high light transmittance
CA498102A CA1265000C (en) 1985-08-09 1985-12-19 Process for preparing thin film having high light transmittance
DE19863601827 DE3601827A1 (de) 1985-08-09 1986-01-22 Verfahren zur herstellung eines duennen films hoher lichtdurchlaessigkeit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60175249A JPS6235359A (ja) 1985-08-09 1985-08-09 コ−テツド薄膜の製造法

Publications (1)

Publication Number Publication Date
JPS6235359A true JPS6235359A (ja) 1987-02-16

Family

ID=15992863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60175249A Pending JPS6235359A (ja) 1985-08-09 1985-08-09 コ−テツド薄膜の製造法

Country Status (5)

Country Link
US (1) US4748050A (enExample)
JP (1) JPS6235359A (enExample)
KR (1) KR910005878B1 (enExample)
CA (1) CA1265000C (enExample)
DE (1) DE3601827A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01133052A (ja) * 1987-11-18 1989-05-25 Mitsui Petrochem Ind Ltd 防塵膜
JPH0262542A (ja) * 1988-08-29 1990-03-02 Shin Etsu Chem Co Ltd エキシマレーザーリソグラフィー用ペリクル
JPH09218501A (ja) * 1996-10-03 1997-08-19 Mitsui Petrochem Ind Ltd フォトマスク保護用防塵膜

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1330860C (en) * 1987-10-26 1994-07-26 Muneyuki Matsumoto Dust-proof film
JPH01144636A (ja) * 1987-11-17 1989-06-06 Mitsubishi Electric Corp 半導体製造装置
US5339197A (en) * 1989-03-31 1994-08-16 Yen Yung Tsai Optical pellicle with controlled transmission peaking
DE4139959A1 (de) * 1991-12-04 1993-06-09 Bayerische Motoren Werke Ag, 8000 Muenchen, De Elektrisch beheizbare, flexible und transparente scheibe
US5741576A (en) * 1995-09-06 1998-04-21 Inko Industrial Corporation Optical pellicle with controlled transmission peaks and anti-reflective coatings
JP4779211B2 (ja) * 2001-02-14 2011-09-28 コニカミノルタホールディングス株式会社 セルロースエステルフィルムの製造方法
JPWO2006098285A1 (ja) * 2005-03-14 2008-08-21 日本板硝子株式会社 温室、温室を使用した植物の栽培方法、及び透過性基板
JP4728072B2 (ja) * 2005-09-05 2011-07-20 シャープ株式会社 電気泳動装置および装置構成器具
JP4734065B2 (ja) * 2005-09-05 2011-07-27 シャープ株式会社 電気泳動装置および装置構成器具
CN102443763B (zh) * 2010-10-15 2015-03-11 鸿富锦精密工业（深圳）有限公司 具有抗指纹涂层的被覆件及其制备方法
JP7600141B2 (ja) * 2019-12-02 2024-12-16 日本軽金属株式会社 光学部材及びその製造方法
CN112126103B (zh) * 2020-08-24 2022-11-22 浙江长宇新材料股份有限公司 一种金属蒸镀复合纳米纤维素膜集流体及其制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2207656A (en) * 1938-12-27 1940-07-09 Research Corp Process of decreasing reflection of light from surfaces, and articles so produced
US2466119A (en) * 1944-11-06 1949-04-05 American Optical Corp Reflection modifying coatings and articles so coated and method of making the same
US2628921A (en) * 1949-04-18 1953-02-17 Libbey Owens Ford Glass Co Method of producing an intermediate metallic oxide film in a multiple layer articles
US2758948A (en) * 1953-02-02 1956-08-14 Lockheed Aircraft Corp Method of forming a light-transparent electrically conductive coating on a surface and article formed thereby
US3356522A (en) * 1964-02-10 1967-12-05 Mc Donnell Douglas Corp Polycarbonate film containing an antireflection coating
US3475192A (en) * 1966-09-27 1969-10-28 Engelhard Ind Inc Method of coating substrate with metallic fluoride films
US3958042A (en) * 1971-04-05 1976-05-18 Agency Of Industrial Science & Technology Method for manufacture of reflection-proof film
US3944440A (en) * 1972-05-12 1976-03-16 Ppg Industries, Inc. Selective reflecting metal/metal oxide coatings using surfactant to promote uniform oxidation
CH625054A5 (enExample) * 1976-12-27 1981-08-31 Balzers Hochvakuum
US4252843A (en) * 1977-02-18 1981-02-24 Minnesota Mining And Manufacturing Company Process for forming a microstructured transmission and reflectance modifying coating
JPS5547381A (en) * 1978-09-29 1980-04-03 Fujitsu Ltd Plasma etching method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01133052A (ja) * 1987-11-18 1989-05-25 Mitsui Petrochem Ind Ltd 防塵膜
JPH0262542A (ja) * 1988-08-29 1990-03-02 Shin Etsu Chem Co Ltd エキシマレーザーリソグラフィー用ペリクル
JPH09218501A (ja) * 1996-10-03 1997-08-19 Mitsui Petrochem Ind Ltd フォトマスク保護用防塵膜

Also Published As

Publication number Publication date
KR910005878B1 (ko) 1991-08-06
CA1265000A (en) 1990-01-30
DE3601827C2 (enExample) 1989-11-16
KR870002478A (ko) 1987-03-31
US4748050A (en) 1988-05-31
DE3601827A1 (de) 1987-02-12
CA1265000C (en) 1990-01-30

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