JPS6235055B2 - - Google Patents
Info
- Publication number
- JPS6235055B2 JPS6235055B2 JP53016768A JP1676878A JPS6235055B2 JP S6235055 B2 JPS6235055 B2 JP S6235055B2 JP 53016768 A JP53016768 A JP 53016768A JP 1676878 A JP1676878 A JP 1676878A JP S6235055 B2 JPS6235055 B2 JP S6235055B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- electron beam
- ray
- rays
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 27
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000001514 detection method Methods 0.000 claims description 3
- 238000002441 X-ray diffraction Methods 0.000 claims 3
- 239000000523 sample Substances 0.000 description 38
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 239000013078 crystal Substances 0.000 description 7
- 230000003595 spectral effect Effects 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1676878A JPS54109896A (en) | 1978-02-16 | 1978-02-16 | Background quantity assessing apparatus in x-ray microanalyzer or the like |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1676878A JPS54109896A (en) | 1978-02-16 | 1978-02-16 | Background quantity assessing apparatus in x-ray microanalyzer or the like |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54109896A JPS54109896A (en) | 1979-08-28 |
| JPS6235055B2 true JPS6235055B2 (US08124630-20120228-C00152.png) | 1987-07-30 |
Family
ID=11925389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1676878A Granted JPS54109896A (en) | 1978-02-16 | 1978-02-16 | Background quantity assessing apparatus in x-ray microanalyzer or the like |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54109896A (US08124630-20120228-C00152.png) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008122267A (ja) * | 2006-11-14 | 2008-05-29 | Jeol Ltd | 試料分析方法及び試料分析装置 |
| CN108717065A (zh) * | 2018-04-16 | 2018-10-30 | 中国地质大学（武汉） | 一种利用多点拟合确定连续x射线背景强度的方法 |
-
1978
- 1978-02-16 JP JP1676878A patent/JPS54109896A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54109896A (en) | 1979-08-28 |
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