JPS6232615A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS6232615A
JPS6232615A JP60171893A JP17189385A JPS6232615A JP S6232615 A JPS6232615 A JP S6232615A JP 60171893 A JP60171893 A JP 60171893A JP 17189385 A JP17189385 A JP 17189385A JP S6232615 A JPS6232615 A JP S6232615A
Authority
JP
Japan
Prior art keywords
optical signal
optical
signal
wafer
selection means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60171893A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0577168B2 (enrdf_load_stackoverflow
Inventor
Nobuhiro Kodachi
小太刀　庸弘
Ichiro Ishiyama
一郎 石山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60171893A priority Critical patent/JPS6232615A/ja
Publication of JPS6232615A publication Critical patent/JPS6232615A/ja
Publication of JPH0577168B2 publication Critical patent/JPH0577168B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60171893A 1985-08-06 1985-08-06 投影露光装置 Granted JPS6232615A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60171893A JPS6232615A (ja) 1985-08-06 1985-08-06 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60171893A JPS6232615A (ja) 1985-08-06 1985-08-06 投影露光装置

Publications (2)

Publication Number Publication Date
JPS6232615A true JPS6232615A (ja) 1987-02-12
JPH0577168B2 JPH0577168B2 (enrdf_load_stackoverflow) 1993-10-26

Family

ID=15931760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60171893A Granted JPS6232615A (ja) 1985-08-06 1985-08-06 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6232615A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63306624A (ja) * 1987-06-09 1988-12-14 Nikon Corp アライメント方法
US5099358A (en) * 1989-01-13 1992-03-24 Dainippon Screen Mfg. Co., Ltd. Apparatus for recording image including an afocal optical system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494549A (enrdf_load_stackoverflow) * 1972-04-24 1974-01-16
JPS5234907A (en) * 1975-09-11 1977-03-17 Dantani Plywood Co Method of producing decorated boards with gloss change
JPS5612729A (en) * 1979-07-12 1981-02-07 Nippon Kogaku Kk <Nikon> ?alignmening device for ic projection exposure equipment
JPS61121437A (ja) * 1984-11-19 1986-06-09 Nippon Kogaku Kk <Nikon> 投影型露光装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494549A (enrdf_load_stackoverflow) * 1972-04-24 1974-01-16
JPS5234907A (en) * 1975-09-11 1977-03-17 Dantani Plywood Co Method of producing decorated boards with gloss change
JPS5612729A (en) * 1979-07-12 1981-02-07 Nippon Kogaku Kk <Nikon> ?alignmening device for ic projection exposure equipment
JPS61121437A (ja) * 1984-11-19 1986-06-09 Nippon Kogaku Kk <Nikon> 投影型露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63306624A (ja) * 1987-06-09 1988-12-14 Nikon Corp アライメント方法
US5099358A (en) * 1989-01-13 1992-03-24 Dainippon Screen Mfg. Co., Ltd. Apparatus for recording image including an afocal optical system

Also Published As

Publication number Publication date
JPH0577168B2 (enrdf_load_stackoverflow) 1993-10-26

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