JPH0577168B2 - - Google Patents

Info

Publication number
JPH0577168B2
JPH0577168B2 JP60171893A JP17189385A JPH0577168B2 JP H0577168 B2 JPH0577168 B2 JP H0577168B2 JP 60171893 A JP60171893 A JP 60171893A JP 17189385 A JP17189385 A JP 17189385A JP H0577168 B2 JPH0577168 B2 JP H0577168B2
Authority
JP
Japan
Prior art keywords
optical signal
optical
selection means
wafer
signal selection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60171893A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6232615A (ja
Inventor
Nobuhiro Kodachi
Ichiro Ishama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60171893A priority Critical patent/JPS6232615A/ja
Publication of JPS6232615A publication Critical patent/JPS6232615A/ja
Publication of JPH0577168B2 publication Critical patent/JPH0577168B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60171893A 1985-08-06 1985-08-06 投影露光装置 Granted JPS6232615A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60171893A JPS6232615A (ja) 1985-08-06 1985-08-06 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60171893A JPS6232615A (ja) 1985-08-06 1985-08-06 投影露光装置

Publications (2)

Publication Number Publication Date
JPS6232615A JPS6232615A (ja) 1987-02-12
JPH0577168B2 true JPH0577168B2 (enrdf_load_stackoverflow) 1993-10-26

Family

ID=15931760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60171893A Granted JPS6232615A (ja) 1985-08-06 1985-08-06 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6232615A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2621179B2 (ja) * 1987-06-09 1997-06-18 株式会社ニコン アライメント方法
JPH0315018A (ja) * 1989-01-13 1991-01-23 Dainippon Screen Mfg Co Ltd 画像走査記録装置のレーザ露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494549A (enrdf_load_stackoverflow) * 1972-04-24 1974-01-16
JPS5234907A (en) * 1975-09-11 1977-03-17 Dantani Plywood Co Method of producing decorated boards with gloss change
JPS5612729A (en) * 1979-07-12 1981-02-07 Nippon Kogaku Kk <Nikon> ?alignmening device for ic projection exposure equipment
JPS61121437A (ja) * 1984-11-19 1986-06-09 Nippon Kogaku Kk <Nikon> 投影型露光装置

Also Published As

Publication number Publication date
JPS6232615A (ja) 1987-02-12

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