JPH0576765B2 - - Google Patents
Info
- Publication number
- JPH0576765B2 JPH0576765B2 JP59190670A JP19067084A JPH0576765B2 JP H0576765 B2 JPH0576765 B2 JP H0576765B2 JP 59190670 A JP59190670 A JP 59190670A JP 19067084 A JP19067084 A JP 19067084A JP H0576765 B2 JPH0576765 B2 JP H0576765B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- mark
- reticle
- microscope
- marks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims 3
- 235000012431 wafers Nutrition 0.000 description 50
- 238000010586 diagram Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 230000032683 aging Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000012937 correction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59190670A JPS6169127A (ja) | 1984-09-13 | 1984-09-13 | 投影露光装置の基準距離補正方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59190670A JPS6169127A (ja) | 1984-09-13 | 1984-09-13 | 投影露光装置の基準距離補正方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6169127A JPS6169127A (ja) | 1986-04-09 |
| JPH0576765B2 true JPH0576765B2 (enrdf_load_stackoverflow) | 1993-10-25 |
Family
ID=16261936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59190670A Granted JPS6169127A (ja) | 1984-09-13 | 1984-09-13 | 投影露光装置の基準距離補正方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6169127A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI240849B (en) * | 2000-02-10 | 2005-10-01 | Asml Netherlands Bv | Object positioning method for a lithographic projection apparatus |
| JP2007170919A (ja) * | 2005-12-20 | 2007-07-05 | Toshiba Corp | 熱交換器の振動測定方法 |
-
1984
- 1984-09-13 JP JP59190670A patent/JPS6169127A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6169127A (ja) | 1986-04-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |