JPS6230358U - - Google Patents

Info

Publication number
JPS6230358U
JPS6230358U JP12245785U JP12245785U JPS6230358U JP S6230358 U JPS6230358 U JP S6230358U JP 12245785 U JP12245785 U JP 12245785U JP 12245785 U JP12245785 U JP 12245785U JP S6230358 U JPS6230358 U JP S6230358U
Authority
JP
Japan
Prior art keywords
reference resistor
integrated circuit
wiring
polycrystalline silicon
semiconductor integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12245785U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12245785U priority Critical patent/JPS6230358U/ja
Publication of JPS6230358U publication Critical patent/JPS6230358U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Analogue/Digital Conversion (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例の回路図、第2図は
第1図に示す実施例のレイアウト図、第3図は第
2図に示す半導体集積回路のX―X′線断面図で
ある。 1…P型半導体基板、2…N埋込み領域、3
…エピタキシアル領域、4…ベース領域、5,6
…酸化膜、7…多結晶シリコン層、8…白金珪化
物層、R,〜,R…基準抵抗、Q,〜,Q
16…NPNトランジスタ、A…ベース領域、B
…ベース電極、C…基準抵抗、D…配線層。
Fig. 1 is a circuit diagram of an embodiment of the present invention, Fig. 2 is a layout diagram of the embodiment shown in Fig. 1, and Fig. 3 is a cross-sectional view taken along line X-X' of the semiconductor integrated circuit shown in Fig. 2. be. 1...P-type semiconductor substrate, 2...N + buried region, 3
...Epitaxial region, 4...Base region, 5, 6
...Oxide film, 7...Polycrystalline silicon layer, 8...Platinum silicide layer, R1 , ~, R7 ...Reference resistance, Q1 ,~,Q
16 ...NPN transistor, A...base region, B
...Base electrode, C...Reference resistance, D...Wiring layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 多結晶シリコンを電極及び配線に用いて「2
―1」(但し、nは正の整数)個の比較器と2
個の基準抵抗とで構成されるnビツトの並列比較
型のA/D変換器を有する半導体集積回路におい
て、前記基準抵抗及び前記基準抵抗の端子と前記
比較器の基準電圧端子との間を結ぶ配線とが多結
晶シリコン層と金属珪化物層とから成る複合層で
形成されていることを特徴とする半導体集積回路
By using polycrystalline silicon for electrodes and wiring ,
-1" (where n is a positive integer) comparators and 2 n
In a semiconductor integrated circuit having an n-bit parallel comparison type A/D converter configured with a reference resistor, a connection is made between the reference resistor and a terminal of the reference resistor and a reference voltage terminal of the comparator. A semiconductor integrated circuit characterized in that wiring is formed of a composite layer consisting of a polycrystalline silicon layer and a metal silicide layer.
JP12245785U 1985-08-08 1985-08-08 Pending JPS6230358U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12245785U JPS6230358U (en) 1985-08-08 1985-08-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12245785U JPS6230358U (en) 1985-08-08 1985-08-08

Publications (1)

Publication Number Publication Date
JPS6230358U true JPS6230358U (en) 1987-02-24

Family

ID=31012661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12245785U Pending JPS6230358U (en) 1985-08-08 1985-08-08

Country Status (1)

Country Link
JP (1) JPS6230358U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01303840A (en) * 1988-05-31 1989-12-07 Toshiba Corp Portable radiotelephony system
JP2007287899A (en) * 2006-04-17 2007-11-01 Oki Electric Ind Co Ltd Semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01303840A (en) * 1988-05-31 1989-12-07 Toshiba Corp Portable radiotelephony system
JP2007287899A (en) * 2006-04-17 2007-11-01 Oki Electric Ind Co Ltd Semiconductor device

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