JPS62274033A - Manufacture of rare earth-transition metal alloy target - Google Patents
Manufacture of rare earth-transition metal alloy targetInfo
- Publication number
- JPS62274033A JPS62274033A JP11818486A JP11818486A JPS62274033A JP S62274033 A JPS62274033 A JP S62274033A JP 11818486 A JP11818486 A JP 11818486A JP 11818486 A JP11818486 A JP 11818486A JP S62274033 A JPS62274033 A JP S62274033A
- Authority
- JP
- Japan
- Prior art keywords
- rare earth
- powder
- eutectic point
- transition metal
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 31
- 239000000956 alloy Substances 0.000 title claims abstract description 31
- 229910052723 transition metal Inorganic materials 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000843 powder Substances 0.000 claims abstract description 31
- 239000000203 mixture Substances 0.000 claims abstract description 28
- 230000005496 eutectics Effects 0.000 claims abstract description 19
- 238000005245 sintering Methods 0.000 claims abstract description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 14
- 239000001301 oxygen Substances 0.000 claims abstract description 14
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 14
- 150000002910 rare earth metals Chemical class 0.000 claims abstract description 12
- 239000007791 liquid phase Substances 0.000 claims abstract description 9
- 150000003624 transition metals Chemical class 0.000 claims abstract description 7
- 239000011261 inert gas Substances 0.000 claims abstract description 5
- 238000001816 cooling Methods 0.000 claims abstract description 4
- 229910052742 iron Inorganic materials 0.000 abstract description 4
- 238000007796 conventional method Methods 0.000 abstract description 3
- -1 Fe) Chemical class 0.000 abstract 1
- 238000010586 diagram Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000001513 hot isostatic pressing Methods 0.000 description 3
- 239000011812 mixed powder Substances 0.000 description 3
- 229910052771 Terbium Inorganic materials 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910017112 Fe—C Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Abstract
Description
【発明の詳細な説明】
３、発明の詳細な説明
〔産業上の利用分野〕
本発明は希土類−遷移金属系光磁気記録媒体として用い
られるスパッタリング用合金ターゲットの製造に関する
ものである。Detailed Description of the Invention 3. Detailed Description of the Invention [Field of Industrial Application] The present invention relates to the production of a sputtering alloy target used as a rare earth-transition metal based magneto-optical recording medium.
最近、ガラスあるいは樹脂の基板にスパッタリング法に
より所望組成の薄膜を形成し、これを記録媒体として用
いた沓き換え可能で高密度記録が可能な光磁気ディスク
の開発が行なわれている。Recently, a magneto-optical disk has been developed in which a thin film of a desired composition is formed on a glass or resin substrate by a sputtering method and is used as a recording medium, and is replaceable and capable of high-density recording.
このスパッタリングに用いられるターゲットは、従来所
望組成の合金を真空又は不活性ガス雰囲気中で溶解・鋳
造して得られたインゴットを粉砕し、１得られた粉末を
圧粉成形後焼結することにより製造されてきた。The target used for this sputtering is conventionally made by melting and casting an alloy of a desired composition in a vacuum or an inert gas atmosphere, pulverizing an ingot, and then sintering the resulting powder after compacting. has been manufactured.
しかしながら、希土類−遷移金属合金は酸化されやすく
、本質的に脆い性質を有するため、製造工程上、たとえ
合金を真空又は不活性ガス雰囲気中で溶解・鋳造しても
、クラッシャーなどでＡｒ中で機械的に粉砕すれば酸素
ガス等を多量に含み、焼結時のカケ、割れ、ボンディン
グ時の冷却割れ、およびスパッタリング時にスパッタ成
膜が酸素富化のため希土類金属が減少する、いわゆる組
成ズレなどの問題点があった。この問題点を解決する方
法として、本発明者等は先に特願昭５９−２６０９２０
号として希土類金属と遷移金属からなる合金を溶解し、
この合金溶湯を急冷して粉末とし、その粉末を圧粉成形
し焼結する方法を提案しているが、得られた合金ターゲ
ットの酸素量は９００〜１５００ｐｐｍとまだ十分に低
いとは言えなかった。また、特開昭６０−２３０９０３
号公報によれば遷移金属−希土類金属系の合金ターゲッ
トを製造するに際し、希土類金属単独では酸化されやす
いため、あらかじめ目標組成よりも遷移金属を１〜１０
重量％少なくした遷移金属−希土類金属の合金粉末と残
りの遷移金属粉末とを混合して成形し、焼結する方法も
提案されているが、この方法においても上述のように溶
解後のインゴットをクラッシャーにより機械的に粉砕し
ているため十分に低い酸素量は得られず、また、その焼
結方法は遷移金属粉末を希土類−遷移金属合金のバイン
ダーとして作用させるため、焼結温度はＦｅあるいはＣ
ｏの液相又は高温拡散を用いる高温焼結となり、その結
果得られる合金ターゲットの酸素量は２０００〜４００
０ｐｐｍと高く、十分に低い酸素量を得ることができな
いことが問題であった。However, rare earth-transition metal alloys are easily oxidized and inherently brittle, so during the manufacturing process, even if the alloy is melted and cast in a vacuum or inert gas atmosphere, it cannot be machined in Ar using a crusher or the like. If it is pulverized, it will contain a large amount of oxygen gas, etc., which will cause chips and cracks during sintering, cooling cracks during bonding, and so-called composition deviations such as a decrease in rare earth metals because the sputtered film is enriched with oxygen during sputtering. There was a problem. As a method to solve this problem, the present inventors have previously filed a patent application No. 59-260920.
An alloy consisting of rare earth metals and transition metals is melted as a
We have proposed a method in which this molten alloy is rapidly cooled to powder, then the powder is compacted and sintered, but the oxygen content of the resulting alloy target is 900 to 1500 ppm, which is still not sufficiently low. . Also, JP-A-60-230903
According to the publication, when manufacturing a transition metal-rare earth metal alloy target, since rare earth metals alone are easily oxidized, the transition metal is added in advance by 1 to 10% less than the target composition.
A method has also been proposed in which a transition metal-rare earth metal alloy powder with a reduced weight percentage is mixed with the remaining transition metal powder, and then molded and sintered. Because it is mechanically pulverized by a crusher, a sufficiently low amount of oxygen cannot be obtained, and since the sintering method uses transition metal powder to act as a binder for the rare earth-transition metal alloy, the sintering temperature is set to Fe or C.
High temperature sintering using liquid phase or high temperature diffusion of
The problem was that the amount of oxygen was as high as 0 ppm, making it impossible to obtain a sufficiently low amount of oxygen.
本発明は上記の問題点を解決したものである０すなわち
希土類−遷移金属合金ターゲットの製造において、希土
類金属側共晶点組成からなる合金を溶解しこの合金溶湯
を急冷処理した粉末と、目標組成に対し残りの遷移金属
からなる溶湯を急冷処理した粉末とを混合して、圧粉成
形後、希土類金１ｉ４１１ＩＪ共晶点以上の温度で、か
つ該共晶点よυも２００℃高い温度以下の温度範囲で加
圧焼結する工程を有し、かつ前記の全工程を真空中又は
不活性ガス雰囲気中で行なうことを特徴とするものであ
る。また、本発明においては、上記液相焼結した合金タ
ーゲットの酸素量が１１０００ｐｐ以下および粉末の密
度との相対密度が９５％以上であることがよシ好ましい
。The present invention solves the above-mentioned problems. In the production of a rare earth-transition metal alloy target, an alloy having a eutectic point composition on the rare earth metal side is melted and the molten alloy is rapidly cooled to produce a powder with a target composition. The molten metal made of the remaining transition metal is mixed with the rapidly cooled powder, and after compacting, it is heated to a temperature above the rare earth gold 1i411IJ eutectic point and below a temperature 200°C higher than the eutectic point. It is characterized in that it has a step of pressure sintering in a temperature range, and all of the above steps are performed in vacuum or in an inert gas atmosphere. In the present invention, it is more preferable that the liquid phase sintered alloy target has an oxygen content of 11,000 pp or less and a relative density of 95% or more with respect to the powder density.
また、本発明において、加圧液相焼結は、ホットプレス
法、熱間静水圧プレス法（ＨＩＰ）および真空常圧焼結
が適用できる。また本発明により得られるターゲット形
状は、通常、円板状であるが、中空リング状、棒状、角
板状等の任意の形状であってもよい。Further, in the present invention, hot press method, hot isostatic pressing method (HIP), and vacuum normal pressure sintering can be applied to the pressurized liquid phase sintering. Further, the target shape obtained by the present invention is usually a disk shape, but it may be any shape such as a hollow ring shape, a rod shape, or a square plate shape.
希土類金属側共晶点組成点組成とは、例えば、Ｆｅ −
Ｔｂ二元系状態図における８８重量％Ｔｂ−１２重ｉ％
Ｆｅの組成を意味するものであり、またこの場合におけ
る希土類金属側共晶点け８４７℃を意味する。なお当然
ながら、本発明は、Ｆｅ −Ｔｂに限定されるものでは
なく、Ｆｅ Ｇｄ ＃ Ｆｅ Ｓｍ ＋ Ｃｏ −
Ｇｄ 、 Ｃｏ −Ｔｂ ｒ Ｃｏ −Ｄ７ ＋ Ｃｏ
−８ｍ ｅあるいはＦｅ −Ｃ。The rare earth metal side eutectic point composition means, for example, Fe −
88% by weight Tb-12% by weight in the Tb binary system phase diagram
It means the composition of Fe, and also means the eutectic point of 847° C. on the rare earth metal side in this case. Note that, as a matter of course, the present invention is not limited to Fe - Tb, but also Fe Gd # Fe Sm + Co -
Gd, Co-TbrCo-D7+Co
-8m e or Fe-C.
−Ｔｂ 、 Ｆｅ Ｔｂ Ｇｄ三元合金等において
も同様に適用できることは言うまでもない。It goes without saying that the present invention can be similarly applied to -Tb, FeTbGd ternary alloys, etc.
第１表に実施例に用いた試料の組成および製造方法を示
す。Table 1 shows the composition and manufacturing method of the samples used in the examples.
第 １ 表
試料屋１〜３，６および８の粉末組成は目標組成５２．
５ｗｔ％Ｔｂ ４７．５ｗｔ％Ｆｅに対しＴｂ側共晶
点組成である８８ｗｔ％Ｔｂ −１２ｗｔ％Ｆｅ急冷粉
と残りのＦｅ粉を混合した。Ａ４は目標組成に対しＴｂ
側共晶点組成と残シのＦｅ粉およびＣｏ粉を混合した。Table 1 The powder compositions of samples 1 to 3, 6 and 8 are the target composition 52.
The 88 wt % Tb - 12 wt % Fe quenched powder, which has a Tb side eutectic point composition for 5 wt % Tb and 47.5 wt % Fe, was mixed with the remaining Fe powder. A4 is Tb for the target composition
The side eutectic point composition and the remaining Fe powder and Co powder were mixed.
屋５は目標組成に対しＧｄ側共晶点組成と残シのＦｅ粉
を混合した。試料扁７および９は目標組成と同じ粉末を
製造したがＡ７が急冷粉に対し扁９はＡｒ中でクラッシ
ャーにより粉砕して粉末とした。In case No. 5, the Gd side eutectic point composition and the remaining Fe powder were mixed with respect to the target composition. Sample flats 7 and 9 were made into powders having the same target composition, but while A7 was a quenched powder, flat plate 9 was crushed into powder using a crusher in Ar.
扁１０は目標組成に対しＴｂ側共晶点より Ｆｅ側にず
らした４３．９ｗｔ％Ｔｂ −５６、１ｗｔ％Ｆｅ合金
をＡｒ中でクラッシャー粉砕して粉末とし、残シのＦｅ
粉を混合した。焼結方法は屋４の試料はＨＩＰ法によっ
たが、屋４の試料以外はホットプレス法で焼結し、焼結
温度を８００℃〜１１００℃の範囲とした。The flat plate 10 is made by crushing a 43.9 wt% Tb-56, 1 wt% Fe alloy, which is shifted from the Tb side eutectic point to the Fe side with respect to the target composition, using a crusher in Ar, and crushing the remaining Fe.
Mixed the flour. As for the sintering method, the HIP method was used for the sample in House 4, but the hot press method was used for the samples other than House 4, and the sintering temperature was set in the range of 800°C to 1100°C.
さらに液相反応を用いた試料Ａ１〜６およびＡ１０につ
いては１ｓ、２ｘ以下の圧力により焼結したが、同相反
応を用いた試料屋７〜９については１３７Ｙｉの圧力に
よυ焼結した。ここで急冷粉あるいはクラッシャーで粉
砕する前の母合金はプラズマアーク溶解炉内で溶解した
。混合はボールミルによシ均一な混合粉末とした。次に
混合粉末は６″φの金型内に充てんし、３５０Ｖの圧力
で室温で圧粉成形した。圧粉成形体は前述の焼結条件で
焼結しろφＸ ３ ｗａ ｔの円板状の合金ターゲット
を得た。第２表に得られたターゲットの酸素量および密
度を示した。Further, samples A1 to A10 using liquid phase reaction were sintered at a pressure of 2x or less for 1 s, while samples A1 to 9 using in-phase reaction were sintered at a pressure of 137Yi. Here, the rapidly cooled powder or the master alloy before being crushed in a crusher was melted in a plasma arc melting furnace. The mixture was made into a uniform mixed powder using a ball mill. Next, the mixed powder was filled into a 6″φ mold and compacted at room temperature under a pressure of 350V.The compacted powder was sintered under the above-mentioned sintering conditions. An alloy target was obtained. Table 2 shows the oxygen content and density of the obtained target.
第 ２ 表
密度は焼結前の混合粉末の密度に対する相対密度として
示した。第２表から明らかなように急冷粉を用いずＡｒ
中でクラッシャーで粉砕した扁９および１０の粉末を用
いて焼結した、合金ターゲットの酸素量は２１００〜３
０３０と非常に高いことがわかる。また試料Ａ７は従来
法によるものであるが酸素量は１３００ｐｐｍのレベル
である。本発明による試料ノに１〜５は焼結温度範囲を
共晶点（８４７℃）より１５６℃高い範囲で焼結したも
のであるが、いずれも６９０〜８４３ｐｐｍと酸素量が
低く、かつ相対密度も９５％と高密度の合金ターゲット
が得られた。Table 2 Densities are shown as relative densities to the density of the mixed powder before sintering. As is clear from Table 2, Ar
The oxygen content of the alloy target, which was sintered using the powders of flats 9 and 10 crushed by a crusher, was 2100 to 3.
It can be seen that the value is very high at 030. Sample A7 was prepared using the conventional method, but the oxygen content was at a level of 1300 ppm. Samples 1 to 5 according to the present invention were sintered at a sintering temperature range of 156°C higher than the eutectic point (847°C), but all had a low oxygen content of 690 to 843 ppm and a relative density. An alloy target with a high density of 95% was obtained.
以上述べてきたように本発明では希土類−遷移金属合金
ターゲットの製造において、希土類金属側共晶点組成か
らなる急冷合金粉末と目標組成に対し残りの急冷粉末を
混合（７、圧粉成形後希土類金属側共晶点よυも２００
℃高い温度範囲で加圧液相焼結することによυ、従来方
法では得られなかった合金ターゲットの酸素量は１１０
００ｐｐ以下が得られたことと同時に９５％以上の高密
度の合金ターゲットを製造することができた。さらに得
られたターゲットはターゲット中に含１れる酸素量が少
ないのでスパッタリングにおいて、表面酸化物を除去す
るためのプレスパツタ時間の短縮が可能なこと、またス
パッタ成膜中の酸素富化による希土類金属の減少いわゆ
る組成ズレも少なくなることが期待される。As described above, in the present invention, in the production of a rare earth-transition metal alloy target, the quenched alloy powder having the eutectic point composition on the rare earth metal side is mixed with the remaining quenched powder for the target composition (7. The eutectic point on the metal side is also 200
By pressurized liquid phase sintering in a high temperature range of ℃, the amount of oxygen in the alloy target, which could not be obtained by conventional methods, has been increased to 110℃.
At the same time, it was possible to produce an alloy target with a high density of 95% or more. Furthermore, since the obtained target contains a small amount of oxygen in the target, it is possible to shorten the pre-sputtering time for removing surface oxides during sputtering. It is expected that the so-called compositional deviation will also be reduced.
Claims (2)
冷処理した粉末と、目標組成に対し残りの遷移金属の急
冷処理した粉末とを混合して、圧粉成形後希土類金属側
共晶点以上の温度でかつ該共晶点よりも２００℃高い温
度以下の温度範囲で加圧液相焼結する工程を有し、かつ
前記の全工程を真空中又は不活性ガス雰囲気中で行なう
ことを特徴とする希土類−遷移金属合金ターゲットの製
造方法。(1) A powder obtained by rapidly cooling a molten alloy having a eutectic point composition on the rare earth metal side is mixed with a powder obtained by rapidly cooling the remaining transition metal with the target composition, and after compacting, a step of pressurized liquid phase sintering at a temperature above the eutectic point and below a temperature 200°C higher than the eutectic point, and all of the above steps are carried out in vacuum or in an inert gas atmosphere. A method for producing a rare earth-transition metal alloy target, characterized by:
００ＰＰｍ以下であり、かつ粉末の密度との相対密度が
９５％以上であることを特徴とする特許請求の範囲第１
項に記載の希土類−遷移金属合金ターゲットの製造方法
。(2) The amount of oxygen in the liquid phase sintered alloy target is 10
00PPm or less, and the relative density with respect to the density of the powder is 95% or more.
A method for producing a rare earth-transition metal alloy target as described in 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11818486A JPS62274033A (en) | 1986-05-22 | 1986-05-22 | Manufacture of rare earth-transition metal alloy target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11818486A JPS62274033A (en) | 1986-05-22 | 1986-05-22 | Manufacture of rare earth-transition metal alloy target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62274033A true JPS62274033A (en) | 1987-11-28 |
Family
ID=14730223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11818486A Pending JPS62274033A (en) | 1986-05-22 | 1986-05-22 | Manufacture of rare earth-transition metal alloy target |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62274033A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63118028A (en) * | 1986-11-06 | 1988-05-23 | Hitachi Metals Ltd | Rare earth element-transition metal element target and its production |
| JPS63143255A (en) * | 1986-12-04 | 1988-06-15 | Mitsubishi Kasei Corp | Alloy target material |
| JPS63143228A (en) * | 1986-12-04 | 1988-06-15 | Mitsubishi Kasei Corp | Manufacture of multicomponent metallic sintered body |
| EP0288010A2 (en) * | 1987-04-20 | 1988-10-26 | Hitachi Metals, Ltd. | Rare earth metal-iron group metal target, alloy powder therefor and method of producing same |
| JPS648243A (en) * | 1987-06-30 | 1989-01-12 | Mitsui Shipbuilding Eng | Rare earth metal-transition metal alloy and its production |
| JPH01298155A (en) * | 1988-05-27 | 1989-12-01 | Seiko Epson Corp | Magneto-optical recording medium, sputtering target, and manufacture of sputtering target |
| US5607780A (en) * | 1993-07-30 | 1997-03-04 | Hitachi Metals, Ltd. | Target for magneto-optical recording medium and process for production thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60230903A (en) * | 1984-05-01 | 1985-11-16 | Daido Steel Co Ltd | Production of alloy target |
-
1986
- 1986-05-22 JP JP11818486A patent/JPS62274033A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60230903A (en) * | 1984-05-01 | 1985-11-16 | Daido Steel Co Ltd | Production of alloy target |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63118028A (en) * | 1986-11-06 | 1988-05-23 | Hitachi Metals Ltd | Rare earth element-transition metal element target and its production |
| JPS63143255A (en) * | 1986-12-04 | 1988-06-15 | Mitsubishi Kasei Corp | Alloy target material |
| JPS63143228A (en) * | 1986-12-04 | 1988-06-15 | Mitsubishi Kasei Corp | Manufacture of multicomponent metallic sintered body |
| EP0288010A2 (en) * | 1987-04-20 | 1988-10-26 | Hitachi Metals, Ltd. | Rare earth metal-iron group metal target, alloy powder therefor and method of producing same |
| US4957549A (en) * | 1987-04-20 | 1990-09-18 | Hitachi Metals, Ltd. | Rare earth metal-iron group metal target, alloy powder therefor and method of producing same |
| US5062885A (en) * | 1987-04-20 | 1991-11-05 | Hitachi Metals, Ltd. | Rare earth metal-iron group metal target, alloy powder therefor and method of producing same |
| US5098649A (en) * | 1987-04-20 | 1992-03-24 | Hitachi Metals, Ltd. | Rare earth metal-iron group metal target, alloy powder therefor and method of producing same |
| JPS648243A (en) * | 1987-06-30 | 1989-01-12 | Mitsui Shipbuilding Eng | Rare earth metal-transition metal alloy and its production |
| JPH01298155A (en) * | 1988-05-27 | 1989-12-01 | Seiko Epson Corp | Magneto-optical recording medium, sputtering target, and manufacture of sputtering target |
| JP2692139B2 (en) * | 1988-05-27 | 1997-12-17 | セイコーエプソン株式会社 | Manufacturing method of sputtering target |
| US5607780A (en) * | 1993-07-30 | 1997-03-04 | Hitachi Metals, Ltd. | Target for magneto-optical recording medium and process for production thereof |
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