JPS62263678A - 表面下ツエナ−・ダイオ−ド - Google Patents

表面下ツエナ−・ダイオ−ド

Info

Publication number
JPS62263678A
JPS62263678A JP62026184A JP2618487A JPS62263678A JP S62263678 A JPS62263678 A JP S62263678A JP 62026184 A JP62026184 A JP 62026184A JP 2618487 A JP2618487 A JP 2618487A JP S62263678 A JPS62263678 A JP S62263678A
Authority
JP
Japan
Prior art keywords
region
type
peripheral portion
lightly doped
type region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62026184A
Other languages
English (en)
Japanese (ja)
Inventor
スティーブン・アール・バーンハム
ウィリアム・ジェイ・リリス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Tucson Corp
Original Assignee
Burr Brown Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Burr Brown Corp filed Critical Burr Brown Corp
Publication of JPS62263678A publication Critical patent/JPS62263678A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H01L29/866—Zener diodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/983—Zener diodes

Landscapes

  • Microelectronics & Electronic Packaging (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Element Separation (AREA)
  • Soft Magnetic Materials (AREA)
  • Glass Compositions (AREA)
  • Led Device Packages (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP62026184A 1986-05-05 1987-02-06 表面下ツエナ−・ダイオ−ド Pending JPS62263678A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US859454 1986-05-05
US06/859,454 US4683483A (en) 1986-05-05 1986-05-05 Subsurface zener diode and method of making

Publications (1)

Publication Number Publication Date
JPS62263678A true JPS62263678A (ja) 1987-11-16

Family

ID=25330971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62026184A Pending JPS62263678A (ja) 1986-05-05 1987-02-06 表面下ツエナ−・ダイオ−ド

Country Status (5)

Country Link
US (1) US4683483A (fr)
JP (1) JPS62263678A (fr)
DE (1) DE3714790A1 (fr)
FR (1) FR2598259B1 (fr)
GB (1) GB2191038B (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4742021A (en) * 1985-05-05 1988-05-03 Burr-Brown Corporation Subsurface zener diode and method of making
EP0314399A3 (fr) * 1987-10-30 1989-08-30 Precision Monolithics Inc. Diode zener enterrée et procédé pour sa fabrication
US4910158A (en) * 1987-11-23 1990-03-20 Hughes Aircraft Company Zener diode emulation and method of forming the same
JP2570022B2 (ja) * 1991-09-20 1997-01-08 株式会社日立製作所 定電圧ダイオード及びそれを用いた電力変換装置並びに定電圧ダイオードの製造方法
US5929502A (en) * 1992-01-16 1999-07-27 Harris Corporation Level shifter stage with punch through diode
FR2702308B1 (fr) * 1993-03-01 1995-05-24 Sgs Thomson Microelectronics Diode à avalanche dans un circuit intégré bipolaire.
US5756387A (en) * 1994-12-30 1998-05-26 Sgs-Thomson Microelectronics S.R.L. Method for forming zener diode with high time stability and low noise
US5883414A (en) * 1996-02-06 1999-03-16 Harris Corporation Electrostatic discharge protection device
US6365951B1 (en) * 1998-08-13 2002-04-02 Eugene Robert Worley Methods on constructing an avalanche light emitting diode
US6417527B1 (en) * 1999-10-12 2002-07-09 Matsushita Electric Industrial Co., Ltd. Diode, method for fabricating the diode, and coplanar waveguide
EP1191598B1 (fr) * 2000-01-18 2007-12-19 Siemens Schweiz AG Procédé de fabrication d'un photodétecteur à semiconducteur
DE10159498A1 (de) * 2001-12-04 2003-06-12 Bosch Gmbh Robert Halbleiteranordnung mit einem pn-Übergang und Verfahren zur Herstellung einer Halbleiteranordnung
US6605859B1 (en) 2002-06-27 2003-08-12 Texas Instruments Incorporated Buried Zener diode structure and method of manufacture
KR101146972B1 (ko) * 2005-03-16 2012-05-22 페어차일드코리아반도체 주식회사 고내압 다이오드를 갖는 고전압 집적회로 장치
JP2006352039A (ja) * 2005-06-20 2006-12-28 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
US20070200136A1 (en) * 2006-02-28 2007-08-30 Ronghua Zhu Isolated zener diodes
US7626243B2 (en) * 2006-08-04 2009-12-01 Advanced Analogic Technologies, Inc. ESD protection for bipolar-CMOS-DMOS integrated circuit devices
US7666751B2 (en) * 2007-09-21 2010-02-23 Semiconductor Components Industries, Llc Method of forming a high capacitance diode and structure therefor
US8274301B2 (en) * 2009-11-02 2012-09-25 International Business Machines Corporation On-chip accelerated failure indicator
FR2953062B1 (fr) * 2009-11-24 2011-12-16 St Microelectronics Tours Sas Diode de protection bidirectionnelle basse tension
US8198703B2 (en) * 2010-01-18 2012-06-12 Freescale Semiconductor, Inc. Zener diode with reduced substrate current

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221874A (en) * 1975-08-11 1977-02-18 Hewlett Packard Yokogawa Group delay measuring device
JPS549473A (en) * 1977-06-22 1979-01-24 Shin Meiwa Ind Co Ltd Device for storing refuse
JPS54111290A (en) * 1978-02-20 1979-08-31 Nec Corp Semiconductor device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3881179A (en) * 1972-08-23 1975-04-29 Motorola Inc Zener diode structure having three terminals
DE2257823A1 (de) * 1972-11-25 1974-06-06 Philips Patentverwaltung Halbleiterbauelement mit einer zenerdiode und verfahren zu seiner herstellung
US4127859A (en) * 1977-02-25 1978-11-28 National Semiconductor Corporation Integrated circuit subsurface zener diode
US4136349A (en) * 1977-05-27 1979-01-23 Analog Devices, Inc. Ic chip with buried zener diode
US4213806A (en) * 1978-10-05 1980-07-22 Analog Devices, Incorporated Forming an IC chip with buried zener diode
US4441114A (en) * 1981-12-22 1984-04-03 International Business Machines Corporation CMOS Subsurface breakdown zener diode
JPS5988871A (ja) * 1982-11-12 1984-05-22 バ−・ブラウン・コ−ポレ−ション 高安定低電圧集積回路表面下降状ダイオ−ド構造体及びその製造方法
US4833509A (en) * 1983-10-31 1989-05-23 Burr-Brown Corporation Integrated circuit reference diode and fabrication method therefor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221874A (en) * 1975-08-11 1977-02-18 Hewlett Packard Yokogawa Group delay measuring device
JPS549473A (en) * 1977-06-22 1979-01-24 Shin Meiwa Ind Co Ltd Device for storing refuse
JPS54111290A (en) * 1978-02-20 1979-08-31 Nec Corp Semiconductor device

Also Published As

Publication number Publication date
FR2598259B1 (fr) 1989-06-09
FR2598259A1 (fr) 1987-11-06
US4683483A (en) 1987-07-28
GB8710551D0 (en) 1987-06-10
DE3714790A1 (de) 1987-11-12
GB2191038A (en) 1987-12-02
GB2191038B (en) 1990-06-20

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