JPS54111290A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS54111290A
JPS54111290A JP1888578A JP1888578A JPS54111290A JP S54111290 A JPS54111290 A JP S54111290A JP 1888578 A JP1888578 A JP 1888578A JP 1888578 A JP1888578 A JP 1888578A JP S54111290 A JPS54111290 A JP S54111290A
Authority
JP
Japan
Prior art keywords
layer
layers
reach
buried layer
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1888578A
Other languages
Japanese (ja)
Inventor
Koichiro Misaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP1888578A priority Critical patent/JPS54111290A/en
Publication of JPS54111290A publication Critical patent/JPS54111290A/en
Pending legal-status Critical Current

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  • Bipolar Integrated Circuits (AREA)

Abstract

PURPOSE: To produce a Zener diode which has a small resistance at a breakdown time by superposing plural P+ layers and causing them to reach a buried layer from the N epi-layer surface on the N-type buried layer of a P-type substrate and froming N layers and P layers in them.
CONSTITUTION: N-type buried layer 202 is provided in P-type substrate 201, and N epi-layer 203 is grown. Then, windows are provided in surface oxide film 204, and separation layer 206, bulk Zener layer 205, and bulk circumference layers 205' and 205" are formed by B diffusion. Layer 206 is caused to reach substrate 201 by oxidation burying, and layers 205, 205' and 205'' are caused to reach the buried layer by oxidation burying so that they may superpose to one another by approximately 5μm on the surface. Next, P base 207 and emitter 208 are formed, and Al electrodes 209 and 210 are provided. The B density and the sectional area of the base 207 part just under layer 208 are made large; and since the B density of layer 207 just under base electrode 209, the resistance from the breakdown part to electrode 209 is reduced, and a low-starting drift and low-noise breakdown region extends up to a high current level.
COPYRIGHT: (C)1979,JPO&Japio
JP1888578A 1978-02-20 1978-02-20 Semiconductor device Pending JPS54111290A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1888578A JPS54111290A (en) 1978-02-20 1978-02-20 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1888578A JPS54111290A (en) 1978-02-20 1978-02-20 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS54111290A true JPS54111290A (en) 1979-08-31

Family

ID=11984011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1888578A Pending JPS54111290A (en) 1978-02-20 1978-02-20 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS54111290A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60149152U (en) * 1984-03-15 1985-10-03 新日本無線株式会社 embedded zener diode
JPS62263678A (en) * 1986-05-05 1987-11-16 バ−・ブラウン・コ−ポレ−シヨン Subsurface zener diode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60149152U (en) * 1984-03-15 1985-10-03 新日本無線株式会社 embedded zener diode
JPH0346507Y2 (en) * 1984-03-15 1991-10-01
JPS62263678A (en) * 1986-05-05 1987-11-16 バ−・ブラウン・コ−ポレ−シヨン Subsurface zener diode

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