JPS6225977B2 - - Google Patents
Info
- Publication number
- JPS6225977B2 JPS6225977B2 JP56080602A JP8060281A JPS6225977B2 JP S6225977 B2 JPS6225977 B2 JP S6225977B2 JP 56080602 A JP56080602 A JP 56080602A JP 8060281 A JP8060281 A JP 8060281A JP S6225977 B2 JPS6225977 B2 JP S6225977B2
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- metal layer
- pattern
- temperature
- resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 claims description 51
- 239000002184 metal Substances 0.000 claims description 51
- 239000000463 material Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- 229910001120 nichrome Inorganic materials 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 229910052719 titanium Inorganic materials 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910000737 Duralumin Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 238000004886 process control Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- -1 amide-imide Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2206—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports
- G01L1/2243—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports the supports being parallelogram-shaped
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measurement Of Force In General (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8060281A JPS57196124A (en) | 1981-05-27 | 1981-05-27 | Load cell |
| EP81109813A EP0053337B1 (de) | 1980-11-29 | 1981-11-21 | Lastmessvorrichtung und ihr Herstellungsverfahren |
| DE8181109813T DE3176209D1 (en) | 1980-11-29 | 1981-11-21 | Load cell and method of manufacturing the same |
| US06/323,726 US4432247A (en) | 1980-11-29 | 1981-11-23 | Load cell having thin film strain gauges |
| AU77880/81A AU528989B2 (en) | 1980-11-29 | 1981-11-25 | Load cell and method of manufacturing |
| DK524881A DK161215C (da) | 1980-11-29 | 1981-11-26 | Belastningscelle og fremgangsmaade til fremstilling heraf |
| CA000391106A CA1176075A (en) | 1980-11-29 | 1981-11-27 | Load cell and method of manufacturing the same |
| HK988/88A HK98888A (en) | 1980-11-29 | 1988-12-08 | Load cell and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8060281A JPS57196124A (en) | 1981-05-27 | 1981-05-27 | Load cell |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57196124A JPS57196124A (en) | 1982-12-02 |
| JPS6225977B2 true JPS6225977B2 (de) | 1987-06-05 |
Family
ID=13722873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8060281A Granted JPS57196124A (en) | 1980-11-29 | 1981-05-27 | Load cell |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57196124A (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000515623A (ja) * | 1995-12-04 | 2000-11-21 | ソシエテ・ナシオナル・デテユード・エ・ドウ・コンストリユクシオン・ドウ・モトール・ダヴイアシオン、“エス．エヌ．ウ．セ．エム．アー．” | ブリッジの主抵抗間の温度勾配を補正するホイーストンブリッジ及びひずみゲージを有する圧力センサにおけるその適用 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59230131A (ja) * | 1983-06-13 | 1984-12-24 | Tokyo Electric Co Ltd | ロ−ドセル |
| JPS60179943U (ja) * | 1984-05-10 | 1985-11-29 | 東芝テック株式会社 | ロ−ドセル |
| WO2014107597A1 (en) * | 2013-01-03 | 2014-07-10 | Vishay Precision Group | Strain gages with discrete electrical resistance trimming |
| JP7053215B2 (ja) * | 2017-10-17 | 2022-04-12 | ミネベアミツミ株式会社 | ひずみゲージ |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5797420A (en) * | 1980-11-26 | 1982-06-17 | Gould Inc | Thin film strain gauge having temperature compensation resistance not subjected to pressure deformation |
-
1981
- 1981-05-27 JP JP8060281A patent/JPS57196124A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5797420A (en) * | 1980-11-26 | 1982-06-17 | Gould Inc | Thin film strain gauge having temperature compensation resistance not subjected to pressure deformation |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000515623A (ja) * | 1995-12-04 | 2000-11-21 | ソシエテ・ナシオナル・デテユード・エ・ドウ・コンストリユクシオン・ドウ・モトール・ダヴイアシオン、“エス．エヌ．ウ．セ．エム．アー．” | ブリッジの主抵抗間の温度勾配を補正するホイーストンブリッジ及びひずみゲージを有する圧力センサにおけるその適用 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57196124A (en) | 1982-12-02 |
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