JPS57196124A - Load cell - Google Patents
Load cellInfo
- Publication number
- JPS57196124A JPS57196124A JP8060281A JP8060281A JPS57196124A JP S57196124 A JPS57196124 A JP S57196124A JP 8060281 A JP8060281 A JP 8060281A JP 8060281 A JP8060281 A JP 8060281A JP S57196124 A JPS57196124 A JP S57196124A
- Authority
- JP
- Japan
- Prior art keywords
- metal layer
- strain gauge
- pattern
- temperature compensation
- formed directly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2206—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports
- G01L1/2243—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports the supports being parallelogram-shaped
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measurement Of Force In General (AREA)
Abstract
PURPOSE:To obtain a high-precise measuring device which is easy to manufacture, and has a high mass productivity, by a method wherein an insulating film is formed directly on a surface of a beam body, a metal layer for strain gauge resistance is directly formed thereon, and said layer is further covered with a metal layer for temperature compensation and a metal layer for lead pattern. CONSTITUTION:A metal layer 12 for strain gauge resistance is formed directly on an insulating film 11 formed directly on a surface of a beam body 1 for bringing a load to be measured into an operation. Other part than a plural number of strain gauge resistor patterns R1-R4, consisting of the metal layer 12 for strain gauge resistance, bridge balance compensating resistor patterns R01, R03, and a span temperature characteristic non-rectilinear compensating resistance pattern Rc, which are all left uncovered, is coverd thereon with a metal layer 13 for temperature compensation. Other part than bridge balance temperature compensating resistor patterns RT1, RT3 and a span resistor pattern R5 for temperature compensation, which are left uncovered, is covered thereon with a metal layer 14 for load pattern.
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8060281A JPS57196124A (en) | 1981-05-27 | 1981-05-27 | Load cell |
EP81109813A EP0053337B1 (en) | 1980-11-29 | 1981-11-21 | Load cell and method of manufacturing the same |
DE8181109813T DE3176209D1 (en) | 1980-11-29 | 1981-11-21 | Load cell and method of manufacturing the same |
US06/323,726 US4432247A (en) | 1980-11-29 | 1981-11-23 | Load cell having thin film strain gauges |
AU77880/81A AU528989B2 (en) | 1980-11-29 | 1981-11-25 | Load cell and method of manufacturing |
DK524881A DK161215C (en) | 1980-11-29 | 1981-11-26 | LOAD CELL AND PROCEDURE FOR PREPARING IT |
CA000391106A CA1176075A (en) | 1980-11-29 | 1981-11-27 | Load cell and method of manufacturing the same |
HK988/88A HK98888A (en) | 1980-11-29 | 1988-12-08 | Load cell and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8060281A JPS57196124A (en) | 1981-05-27 | 1981-05-27 | Load cell |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57196124A true JPS57196124A (en) | 1982-12-02 |
JPS6225977B2 JPS6225977B2 (en) | 1987-06-05 |
Family
ID=13722873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8060281A Granted JPS57196124A (en) | 1980-11-29 | 1981-05-27 | Load cell |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57196124A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59230131A (en) * | 1983-06-13 | 1984-12-24 | Tokyo Electric Co Ltd | Load cell |
JPS60179943U (en) * | 1984-05-10 | 1985-11-29 | 東芝テック株式会社 | load cell |
JP2016507742A (en) * | 2013-01-03 | 2016-03-10 | ヴィシャイ プレシジョン グループ, インコーポレイテッドVishay Precision Group, Inc. | Electrical resistance strain gauge with discrete electrical resistance trimming function |
JP2022017531A (en) * | 2017-10-17 | 2022-01-25 | ミネベアミツミ株式会社 | Strain gauge |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2741951B1 (en) * | 1995-12-04 | 1998-02-20 | Europ Propulsion | WHEATSTONE BRIDGE WITH GRADIENT TEMPERATURE COMPENSATION BETWEEN MAIN BRIDGE RESISTORS AND APPLICATION TO A PRESSURE SENSOR WITH EXTENSOMETRIC GAUGES |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5797420A (en) * | 1980-11-26 | 1982-06-17 | Gould Inc | Thin film strain gauge having temperature compensation resistance not subjected to pressure deformation |
-
1981
- 1981-05-27 JP JP8060281A patent/JPS57196124A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5797420A (en) * | 1980-11-26 | 1982-06-17 | Gould Inc | Thin film strain gauge having temperature compensation resistance not subjected to pressure deformation |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59230131A (en) * | 1983-06-13 | 1984-12-24 | Tokyo Electric Co Ltd | Load cell |
JPH0565807B2 (en) * | 1983-06-13 | 1993-09-20 | Tokyo Electric Co Ltd | |
JPS60179943U (en) * | 1984-05-10 | 1985-11-29 | 東芝テック株式会社 | load cell |
JP2016507742A (en) * | 2013-01-03 | 2016-03-10 | ヴィシャイ プレシジョン グループ, インコーポレイテッドVishay Precision Group, Inc. | Electrical resistance strain gauge with discrete electrical resistance trimming function |
JP2022017531A (en) * | 2017-10-17 | 2022-01-25 | ミネベアミツミ株式会社 | Strain gauge |
Also Published As
Publication number | Publication date |
---|---|
JPS6225977B2 (en) | 1987-06-05 |
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