JPS6225067A - Electrode forming method for thermal head - Google Patents

Electrode forming method for thermal head

Info

Publication number
JPS6225067A
JPS6225067A JP16527985A JP16527985A JPS6225067A JP S6225067 A JPS6225067 A JP S6225067A JP 16527985 A JP16527985 A JP 16527985A JP 16527985 A JP16527985 A JP 16527985A JP S6225067 A JPS6225067 A JP S6225067A
Authority
JP
Japan
Prior art keywords
substrate
heat
electrodes
back surface
ceramic substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16527985A
Other languages
Japanese (ja)
Inventor
Yasuhiko Takamatsu
恭彦 高松
Takayuki Yamaguchi
隆行 山口
Toshio Kawakami
俊夫 川上
Toshikazu Yoshimizu
吉水 敏和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP16527985A priority Critical patent/JPS6225067A/en
Publication of JPS6225067A publication Critical patent/JPS6225067A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/345Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads characterised by the arrangement of resistors or conductors

Abstract

PURPOSE:To narrow the area of a heat resistant substrate by forming patterned electrodes on the back surface through the side of a ceramic substrate, thereby effectively utilizing on the back surface. CONSTITUTION:Through holes 4 which penetrate from the front surface to the back surface along a line 6 are opened at a ceramic substrate 2 to form electrodes. Then, the substrate 2 is cut along the line 6 arranged with the holes 4. Further, the substrate is cut at the center along the longitudinal direction to form ceramic substrate 10 having heating resistance elements for one thermal head and electrodes. The substrate 10 is disposed on a supporting plate 12; the array of the resistance elements 18 and the electrodes connected with the elements are formed on the front surface, and a driving IC 22 for forming a driving circuit is bonded to the back surface to form a thermal head.

Description

【発明の詳細な説明】 (技術分野) 本発明はファクシミリなどに使用されるサーマルヘッド
において、その耐熱基板の表面から側面を経て裏面につ
ながる電極を形成する方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Technical Field) The present invention relates to a method of forming electrodes connected from the front surface of a heat-resistant substrate to the back surface via the side surface in a thermal head used for facsimiles and the like.

(従来技術) 従来のサーマルヘッドにおいては、発熱抵抗体素子及び
発熱抵抗体素子につながる電極は、すべて耐熱基板の一
表面上に形成されるのが一般である。そのため、セラミ
ック基板のような高価な耐熱基板に広い面積が必要とな
り、耐熱基板のコストがサーマルヘッド全体のコストを
引き上げる原因になっている。
(Prior Art) In a conventional thermal head, a heating resistor element and an electrode connected to the heating resistor element are generally all formed on one surface of a heat-resistant substrate. Therefore, a large area is required for an expensive heat-resistant substrate such as a ceramic substrate, and the cost of the heat-resistant substrate increases the cost of the entire thermal head.

そこで、発熱抵抗体素子に共通に接続される共通電極に
ついては耐熱基板の側面を通って裏面にまで形成したサ
ーマルヘッドが提案されている。
Therefore, a thermal head has been proposed in which a common electrode commonly connected to the heating resistor elements is formed through the side surface of the heat-resistant substrate to the back surface.

しかし、そのサーマルヘッドで耐熱基板の側面に形成さ
れているのはパターン化されない共通電極であり、例え
ば駆動回路と発熱抵抗体素子を接続する選択電極のよう
なパターン化を必要とする電極を耐熱基板の側面に形成
した例はこれまで報告されていない。
However, what is formed on the side surface of the heat-resistant substrate in this thermal head is a common electrode that is not patterned. No example of formation on the side surface of a substrate has been reported so far.

(目的) 本発明は、耐熱基板の面積を狭くして耐熱基板のコスト
を下げるために、耐熱基板の表面から裏面につながるパ
ターン化された電極を耐熱基板の側面に形成することに
より、耐熱基板の裏面をも有効に利用できるようにする
ことを目的とするものである。
(Purpose) In order to reduce the area of the heat-resistant substrate and reduce the cost of the heat-resistant substrate, the present invention provides a heat-resistant substrate by forming patterned electrodes connected from the front surface to the back surface of the heat-resistant substrate on the side surface of the heat-resistant substrate. The purpose of this is to make it possible to effectively utilize the back side of the paper.

(構成) 本発明において耐熱基板の表面から側面を経て裏面につ
ながる電極は、耐熱基板に表面から裏面に貫通するスル
ーホールを直線上に配列して形成し、それらのスルーホ
ール内をメッキにより導電処理し、耐熱基板の表面上に
は発熱抵抗体素子及び発熱抵抗体素子とスルーホールの
導体層とを接続する電極その他の必要な電極を形成し、
耐熱基板の裏面」二にはスルーホールの導体層につなが
る電極その他の必要な電極を形成した後、スルーホール
が配列されている直線に沿ってこの耐熱基板を切断する
ことにより形成される。
(Structure) In the present invention, the electrode that connects from the front surface of the heat-resistant substrate to the back surface via the side surface is formed by linearly arranging through holes penetrating the heat-resistant substrate from the front surface to the back surface, and the insides of these through holes are plated to conduct electricity. forming a heating resistor element, an electrode connecting the heating resistor element and the conductor layer of the through hole, and other necessary electrodes on the surface of the heat-resistant substrate;
It is formed by forming electrodes connected to the conductor layer of the through holes and other necessary electrodes on the back side of the heat resistant substrate, and then cutting the heat resistant substrate along the straight line in which the through holes are arranged.

以下、一実施例について具体的に説明する。An example will be specifically described below.

第1図ないし第3図は一実施例を工程順に表わしたもの
である。
FIGS. 1 to 3 show one embodiment in the order of steps.

第1図において、2は広い面積をもつ耐熱基板としての
セラミック基板である。このセラミック基板2の表面は
シリコン酸化物を主成分とするグレーズ層で被われてい
る。まず、このセラミック基板2に、直線6に沿って表
面から裏面に貫通するスルーホール4をあける。このス
ルーホール4は後にセラミック基板の側面の電極が形成
される位置であり、例えば1mmの間隔で形成する。
In FIG. 1, reference numeral 2 denotes a ceramic substrate as a heat-resistant substrate having a large area. The surface of this ceramic substrate 2 is covered with a glaze layer containing silicon oxide as a main component. First, a through hole 4 is formed in this ceramic substrate 2 along a straight line 6 from the front surface to the back surface. The through holes 4 are positions where electrodes on the side surfaces of the ceramic substrate will be formed later, and are formed at intervals of, for example, 1 mm.

次にこれらのスルーホール4の壁面にメッキにより導電
処理を施す。この導電処理は例えば無電界銅メッキによ
り行なうことができる。
Next, the walls of these through holes 4 are subjected to conductive treatment by plating. This conductive treatment can be performed, for example, by electroless copper plating.

その後1通常の方法により発熱抵抗体素子と電極とを形
成する。発熱抵抗体素子はセラミック基板2の一表面上
に列状に配列して形成され、電極はセラミック基板2の
表面だけでなく裏面にも形成される。電極にはスルーホ
ール4と発熱抵抗体素子を接続するものもあるし、スル
ーホール4又は発熱抵抗体素子のみにつながるもの、あ
るいはそのいずれにもつながらないものもある。発熱抵
抗体素子と電極の形成時にはホトリソグラフィ技法によ
るエツチングが行なわれるので、その際スルーホール4
の導電膜がエツチングされないように、スルーホール4
をレジストで埋めておく。
Thereafter, a heating resistor element and electrodes are formed by a conventional method. The heating resistor elements are arranged in rows on one surface of the ceramic substrate 2, and electrodes are formed not only on the front surface but also on the back surface of the ceramic substrate 2. Some of the electrodes connect the through hole 4 and the heat generating resistor element, some electrodes connect only to the through hole 4 or the heat generating resistor element, or some electrodes connect to neither of them. When forming the heating resistor element and electrodes, etching is performed using photolithography, so the through holes 4
Through holes 4 are provided to prevent the conductive film from being etched.
Fill it with resist.

次にセラミック基板2をスルーホール4が配列されてい
る直線6に沿って切断する。
Next, the ceramic substrate 2 is cut along the straight line 6 along which the through holes 4 are arranged.

このように切断されたものの一つが第2図に示されるも
のであるつこれは第1図の記号Aで示される範囲のもの
である。第2図に示されるセラミック基板では長手方向
に沿った両側面にスルーホール4の切断によって形成さ
れた凹部8が形成されており、この四部8に形成されて
いるR電層がセラミック基板の側面の電極となる。第2
図のセラミック基板には2個分のサーマルヘッドの発熱
抵抗体素子と電極が形成されているので、これを長手方
向に沿って中央で切断すると第3図に示されるように1
個分のサーマルヘッドの発熱抵抗体素子と電極をもつセ
ラミック基板10が形成される、その後、発熱抵抗体素
子を保護する耐摩耗層が形成され、N、極のボンディン
グ部分には金メッキが施される。
One such cut is shown in FIG. 2, and is in the area indicated by the symbol A in FIG. In the ceramic substrate shown in FIG. 2, concave portions 8 are formed by cutting the through holes 4 on both sides along the longitudinal direction, and the R conductive layer formed in these four portions 8 is formed on the side surfaces of the ceramic substrate. It becomes an electrode. Second
The heating resistor elements and electrodes of two thermal heads are formed on the ceramic substrate shown in the figure, so if this is cut at the center along the longitudinal direction, it will become 1 as shown in Figure 3.
A ceramic substrate 10 having heating resistor elements and electrodes of individual thermal heads is formed. After that, a wear-resistant layer is formed to protect the heating resistor elements, and the bonding parts of the N and poles are plated with gold. Ru.

側面に電極をもつこのセラミック基板10を用いたサー
マルヘッドの例を第4図及び第5図に示す。第5図は第
4図のA−B線断面図である。
An example of a thermal head using this ceramic substrate 10 having electrodes on its side surfaces is shown in FIGS. 4 and 5. FIG. 5 is a sectional view taken along the line AB in FIG. 4.

12は支持板であり、支持板12上にはセラミック基板
10と複数個のダイオードアレイ14とプリント配線基
板16が接着されている。
Reference numeral 12 denotes a support plate, on which a ceramic substrate 10, a plurality of diode arrays 14, and a printed wiring board 16 are bonded.

セラミック基板10の表面には発熱抵抗体素子18の配
列とそれにつながる電極が形成されている。セラミック
基板10の側面の凹部の@極8が選択電極となり、電極
8と発熱抵抗体素子18との間の電極20により、1個
の@極8が例えば8個というような複数個の発熱抵抗体
素子18に接続されている。
On the surface of the ceramic substrate 10, an array of heating resistor elements 18 and electrodes connected thereto are formed. The @pole 8 in the recess on the side surface of the ceramic substrate 10 serves as a selection electrode, and the electrode 20 between the electrode 8 and the heating resistor element 18 allows one @pole 8 to be connected to a plurality of heating resistors, such as eight, for example. is connected to the body element 18 .

第5図に示されるように、セラミック基板10の裏面に
おいては、駆動回路を構成する駆動用IC22が接着さ
れており、セラミック基板10の側面の電極8につなが
る裏面の電極23には、この駆動用IC22との間にワ
イヤーボンディングが施されており、駆動用IC22は
また、セラミック基板lOの裏面に形成されて入力端子
に接続される導体配線24にワイヤボンディングされて
いる。
As shown in FIG. 5, a driving IC 22 constituting a driving circuit is bonded to the back surface of the ceramic substrate 10, and an electrode 23 on the back surface connected to the electrode 8 on the side surface of the ceramic substrate 10 is attached to the driving IC 22. Wire bonding is performed between the drive IC 22 and the drive IC 22, and the drive IC 22 is also wire bonded to a conductor wiring 24 formed on the back surface of the ceramic substrate IO and connected to an input terminal.

ダイオードアレイ14は例えばシリコン基板にダイオー
ドが形成されたものであり、セラミック基板10上の発
熱抵抗体素子18につながる個別の電極25との間にワ
イヤーボンディングによる接続が施されている。
The diode array 14 has diodes formed on a silicon substrate, for example, and is connected to individual electrodes 25 connected to the heating resistor elements 18 on the ceramic substrate 10 by wire bonding.

プリント配線基板16はガラスエポキシベース上に複数
の導体配線が形成されたものであり、それらの導体配線
とダイオードアレイ14の間にはワイヤーボンディング
による接続が施されている。
The printed wiring board 16 has a plurality of conductor wirings formed on a glass epoxy base, and connections are made between these conductor wirings and the diode array 14 by wire bonding.

プリントの配線基板16の導体配線は発熱抵抗体素子1
8に電源を供給する。
The conductor wiring of the printed wiring board 16 is connected to the heating resistor element 1
8.

(効果) 本発明によればセラミック基板の側面を通って裏面にも
パターン化された電極を形成することができるので、裏
面も有効に利用することができるようになる。そのため
、高価な耐熱基板の面積を狭くすることができ、サーマ
ルヘッドのコストを低下させることができる。
(Effects) According to the present invention, patterned electrodes can be formed on the back surface as well through the side surfaces of the ceramic substrate, so that the back surface can also be effectively utilized. Therefore, the area of the expensive heat-resistant substrate can be reduced, and the cost of the thermal head can be reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図ないし第3図は本発明の一実施例を工程順に示す
斜視図、第4図は同実施例により形成された電極を有す
るセラミック基板を使用したサーマルヘッドを示す斜視
図、第5図は第4図のA−B線断面図である。 2・・・・・・セラミック基板、 4 ・・・・・・スルーホール 6・・・・・・スルーホールを配列する直線、8・・・
・・・セラミック基板側面の電極。
1 to 3 are perspective views showing an embodiment of the present invention in the order of steps, FIG. 4 is a perspective view showing a thermal head using a ceramic substrate having electrodes formed according to the embodiment, and FIG. 5 4 is a sectional view taken along the line A-B in FIG. 4. 2...Ceramic substrate, 4...Through holes 6...Line line for arranging through holes, 8...
...Electrode on the side of the ceramic substrate.

Claims (1)

【特許請求の範囲】[Claims] (1)耐熱基板に表面から裏面に貫通するスルーホール
を直線上に配列して形成し、 それらのスルーホール内をメッキにより導電処理し、 前記耐熱基板の表面上には発熱抵抗体素子及び発熱抵抗
体素子と前記スルーホールの導体層とを接続する電極そ
の他の必要な電極を形成し、前記耐熱基板の裏面上には
前記スルーホールの導体層につながる電極その他の必要
な電極を形成した後、前記スルーホールが配列されてい
る直線に沿ってこの耐熱基板を切断することを特徴とす
るサーマルヘッドの耐熱基板への電極形成方法。
(1) Through holes penetrating the heat-resistant substrate from the front surface to the back surface are arranged in a straight line, and the insides of these through-holes are conductive treated by plating, and heat-generating resistor elements and heat-generating elements are formed on the surface of the heat-resistant substrate. After forming an electrode that connects the resistor element and the conductor layer of the through hole and other necessary electrodes, and forming an electrode that connects to the conductor layer of the through hole and other necessary electrodes on the back surface of the heat-resistant substrate. . A method for forming electrodes on a heat-resistant substrate of a thermal head, characterized in that the heat-resistant substrate is cut along a straight line in which the through holes are arranged.
JP16527985A 1985-07-25 1985-07-25 Electrode forming method for thermal head Pending JPS6225067A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16527985A JPS6225067A (en) 1985-07-25 1985-07-25 Electrode forming method for thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16527985A JPS6225067A (en) 1985-07-25 1985-07-25 Electrode forming method for thermal head

Publications (1)

Publication Number Publication Date
JPS6225067A true JPS6225067A (en) 1987-02-03

Family

ID=15809308

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16527985A Pending JPS6225067A (en) 1985-07-25 1985-07-25 Electrode forming method for thermal head

Country Status (1)

Country Link
JP (1) JPS6225067A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0256638U (en) * 1988-10-14 1990-04-24
JPH02128863A (en) * 1988-11-09 1990-05-17 Graphtec Corp Thermal head array
WO1995015052A1 (en) * 1993-11-23 1995-06-01 Schneider Elektronik Rundfunkwerk Gmbh Process and device for compensating pyramidal errors
WO1996041722A1 (en) * 1995-06-13 1996-12-27 Rohm Co., Ltd. Method of forming auxiliary electrode layer for common electrode pattern in thermal head
EP1080924A1 (en) * 1999-08-02 2001-03-07 Seiko Instruments Inc. Thermal head

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0256638U (en) * 1988-10-14 1990-04-24
JPH02128863A (en) * 1988-11-09 1990-05-17 Graphtec Corp Thermal head array
WO1995015052A1 (en) * 1993-11-23 1995-06-01 Schneider Elektronik Rundfunkwerk Gmbh Process and device for compensating pyramidal errors
WO1996041722A1 (en) * 1995-06-13 1996-12-27 Rohm Co., Ltd. Method of forming auxiliary electrode layer for common electrode pattern in thermal head
US5979040A (en) * 1995-06-13 1999-11-09 Rohm Co., Ltd. Method of making auxiliary electrode layer for common electrode pattern in thermal printhead
CN1070113C (en) * 1995-06-13 2001-08-29 罗姆股份有限公司 Method of forming auxiliary electrode layer for common electrode pattern in thermal head
EP1080924A1 (en) * 1999-08-02 2001-03-07 Seiko Instruments Inc. Thermal head

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