JPS622455B2 - - Google Patents
Info
- Publication number
- JPS622455B2 JPS622455B2 JP14429281A JP14429281A JPS622455B2 JP S622455 B2 JPS622455 B2 JP S622455B2 JP 14429281 A JP14429281 A JP 14429281A JP 14429281 A JP14429281 A JP 14429281A JP S622455 B2 JPS622455 B2 JP S622455B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- turntable
- side plate
- wafer
- cleaning container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 61
- 235000012431 wafers Nutrition 0.000 claims description 39
- 238000001035 drying Methods 0.000 claims description 20
- 239000007788 liquid Substances 0.000 claims description 12
- 238000003860 storage Methods 0.000 claims description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000011109 contamination Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 230000007717 exclusion Effects 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14429281A JPS5846642A (ja) | 1981-09-12 | 1981-09-12 | ウエ−ハ洗浄乾燥装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14429281A JPS5846642A (ja) | 1981-09-12 | 1981-09-12 | ウエ−ハ洗浄乾燥装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5846642A JPS5846642A (ja) | 1983-03-18 |
| JPS622455B2 true JPS622455B2 (enrdf_load_stackoverflow) | 1987-01-20 |
Family
ID=15358670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14429281A Granted JPS5846642A (ja) | 1981-09-12 | 1981-09-12 | ウエ−ハ洗浄乾燥装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5846642A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61162046U (enrdf_load_stackoverflow) * | 1985-03-27 | 1986-10-07 | ||
| JPH069497Y2 (ja) * | 1987-01-09 | 1994-03-09 | 沖電気工業株式会社 | 半導体材料乾燥装置 |
| US5486132A (en) * | 1993-06-14 | 1996-01-23 | International Business Machines Corporation | Mounting apparatus for cryogenic aerosol cleaning |
-
1981
- 1981-09-12 JP JP14429281A patent/JPS5846642A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5846642A (ja) | 1983-03-18 |
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