JPS6223862B2 - - Google Patents

Info

Publication number
JPS6223862B2
JPS6223862B2 JP4449279A JP4449279A JPS6223862B2 JP S6223862 B2 JPS6223862 B2 JP S6223862B2 JP 4449279 A JP4449279 A JP 4449279A JP 4449279 A JP4449279 A JP 4449279A JP S6223862 B2 JPS6223862 B2 JP S6223862B2
Authority
JP
Japan
Prior art keywords
chip
pattern
mask
name
scribe line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4449279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55135837A (en
Inventor
Takao Shida
Takashi Ariga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4449279A priority Critical patent/JPS55135837A/ja
Publication of JPS55135837A publication Critical patent/JPS55135837A/ja
Publication of JPS6223862B2 publication Critical patent/JPS6223862B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP4449279A 1979-04-12 1979-04-12 Manufacture of photomask Granted JPS55135837A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4449279A JPS55135837A (en) 1979-04-12 1979-04-12 Manufacture of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4449279A JPS55135837A (en) 1979-04-12 1979-04-12 Manufacture of photomask

Publications (2)

Publication Number Publication Date
JPS55135837A JPS55135837A (en) 1980-10-23
JPS6223862B2 true JPS6223862B2 (de) 1987-05-26

Family

ID=12693043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4449279A Granted JPS55135837A (en) 1979-04-12 1979-04-12 Manufacture of photomask

Country Status (1)

Country Link
JP (1) JPS55135837A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02133949A (ja) * 1988-11-14 1990-05-23 Hitachi Cable Ltd リードフレームのスポットめっき方法
JPH0734930Y2 (ja) * 1990-06-26 1995-08-09 富士プラント工業株式会社 アイランド部にもメッキが必要なリードフレーム用の部分メッキ用マスク材

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0277744A (ja) * 1988-09-13 1990-03-16 Fujitsu Ltd フォトマスクの製造方法
JP3638778B2 (ja) 1997-03-31 2005-04-13 株式会社ルネサステクノロジ 半導体集積回路装置およびその製造方法
JP4014708B2 (ja) 1997-08-21 2007-11-28 株式会社ルネサステクノロジ 半導体集積回路装置の設計方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5311958B2 (de) * 1974-02-08 1978-04-25

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50150259U (de) * 1974-05-30 1975-12-13
JPS5311958U (de) * 1976-07-13 1978-01-31

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5311958B2 (de) * 1974-02-08 1978-04-25

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02133949A (ja) * 1988-11-14 1990-05-23 Hitachi Cable Ltd リードフレームのスポットめっき方法
JPH0734930Y2 (ja) * 1990-06-26 1995-08-09 富士プラント工業株式会社 アイランド部にもメッキが必要なリードフレーム用の部分メッキ用マスク材

Also Published As

Publication number Publication date
JPS55135837A (en) 1980-10-23

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