JPS6223856U - - Google Patents

Info

Publication number
JPS6223856U
JPS6223856U JP11567785U JP11567785U JPS6223856U JP S6223856 U JPS6223856 U JP S6223856U JP 11567785 U JP11567785 U JP 11567785U JP 11567785 U JP11567785 U JP 11567785U JP S6223856 U JPS6223856 U JP S6223856U
Authority
JP
Japan
Prior art keywords
substrate
thin film
ejected
dispersion plate
gases
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11567785U
Other languages
English (en)
Other versions
JPH0714362Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985115677U priority Critical patent/JPH0714362Y2/ja
Publication of JPS6223856U publication Critical patent/JPS6223856U/ja
Application granted granted Critical
Publication of JPH0714362Y2 publication Critical patent/JPH0714362Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】
第１図は実施例の概略図、第２図は従来の薄膜
形成装置の概略図である。 １……真空室、２……分散板、４……基板、６
……パイプ、８……ヒータ。

Claims (1)

    【実用新案登録請求の範囲】
  1. 減圧した真空室内に導入した二種以上のガスを
    分散板の孔から、ヒータで加熱された基板に向け
    て噴出させ、前記基板の熱でもつて噴出ガスを化
    学反応させて基板上に薄膜を形成させる薄膜形成
    装置において、前記分散板を冷却する冷却装置を
    設けたことを特徴とする薄膜形成装置。
JP1985115677U 1985-07-27 1985-07-27 薄膜形成装置 Expired - Lifetime JPH0714362Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985115677U JPH0714362Y2 (ja) 1985-07-27 1985-07-27 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985115677U JPH0714362Y2 (ja) 1985-07-27 1985-07-27 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS6223856U true JPS6223856U (ja) 1987-02-13
JPH0714362Y2 JPH0714362Y2 (ja) 1995-04-05

Family

ID=30999554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985115677U Expired - Lifetime JPH0714362Y2 (ja) 1985-07-27 1985-07-27 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPH0714362Y2 (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55103262U (ja) * 1979-01-09 1980-07-18
JPS57104659A (en) * 1980-12-19 1982-06-29 Asahi Glass Co Ltd Discharger for cvd device
JPS5869705A (ja) * 1981-10-20 1983-04-26 Japan Metals & Chem Co Ltd 超硬高純度窒化珪素の製造装置とその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55103262U (ja) * 1979-01-09 1980-07-18
JPS57104659A (en) * 1980-12-19 1982-06-29 Asahi Glass Co Ltd Discharger for cvd device
JPS5869705A (ja) * 1981-10-20 1983-04-26 Japan Metals & Chem Co Ltd 超硬高純度窒化珪素の製造装置とその製造方法

Also Published As

Publication number Publication date
JPH0714362Y2 (ja) 1995-04-05

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