JPS62232924A - 反射型投影露光機のアライメント光学装置 - Google Patents

反射型投影露光機のアライメント光学装置

Info

Publication number
JPS62232924A
JPS62232924A JP61077144A JP7714486A JPS62232924A JP S62232924 A JPS62232924 A JP S62232924A JP 61077144 A JP61077144 A JP 61077144A JP 7714486 A JP7714486 A JP 7714486A JP S62232924 A JPS62232924 A JP S62232924A
Authority
JP
Japan
Prior art keywords
alignment
optical device
substrate
mask
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61077144A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0528892B2 (enExample
Inventor
Masaki Suzuki
正樹 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP61077144A priority Critical patent/JPS62232924A/ja
Publication of JPS62232924A publication Critical patent/JPS62232924A/ja
Publication of JPH0528892B2 publication Critical patent/JPH0528892B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP61077144A 1986-04-03 1986-04-03 反射型投影露光機のアライメント光学装置 Granted JPS62232924A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61077144A JPS62232924A (ja) 1986-04-03 1986-04-03 反射型投影露光機のアライメント光学装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61077144A JPS62232924A (ja) 1986-04-03 1986-04-03 反射型投影露光機のアライメント光学装置

Publications (2)

Publication Number Publication Date
JPS62232924A true JPS62232924A (ja) 1987-10-13
JPH0528892B2 JPH0528892B2 (enExample) 1993-04-27

Family

ID=13625602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61077144A Granted JPS62232924A (ja) 1986-04-03 1986-04-03 反射型投影露光機のアライメント光学装置

Country Status (1)

Country Link
JP (1) JPS62232924A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6927861B2 (en) * 2001-06-29 2005-08-09 Xanoptix, Inc. Simple deterministic method for array based optical component packaging

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6927861B2 (en) * 2001-06-29 2005-08-09 Xanoptix, Inc. Simple deterministic method for array based optical component packaging

Also Published As

Publication number Publication date
JPH0528892B2 (enExample) 1993-04-27

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