JPS62227929A - レジスト材料 - Google Patents

レジスト材料

Info

Publication number
JPS62227929A
JPS62227929A JP61071262A JP7126286A JPS62227929A JP S62227929 A JPS62227929 A JP S62227929A JP 61071262 A JP61071262 A JP 61071262A JP 7126286 A JP7126286 A JP 7126286A JP S62227929 A JPS62227929 A JP S62227929A
Authority
JP
Japan
Prior art keywords
formula
resist material
organopolysiloxane
resist
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61071262A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6346094B2 (https=
Inventor
Yasuhiro Yoneda
泰博 米田
Kazumasa Saito
斎藤　和正
Yoko Kawasaki
陽子 川崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP61071262A priority Critical patent/JPS62227929A/ja
Publication of JPS62227929A publication Critical patent/JPS62227929A/ja
Publication of JPS6346094B2 publication Critical patent/JPS6346094B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP61071262A 1986-03-31 1986-03-31 レジスト材料 Granted JPS62227929A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61071262A JPS62227929A (ja) 1986-03-31 1986-03-31 レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61071262A JPS62227929A (ja) 1986-03-31 1986-03-31 レジスト材料

Publications (2)

Publication Number Publication Date
JPS62227929A true JPS62227929A (ja) 1987-10-06
JPS6346094B2 JPS6346094B2 (https=) 1988-09-13

Family

ID=13455632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61071262A Granted JPS62227929A (ja) 1986-03-31 1986-03-31 レジスト材料

Country Status (1)

Country Link
JP (1) JPS62227929A (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01123229A (ja) * 1987-11-09 1989-05-16 Toray Silicone Co Ltd パターン形成用材料およびパターン形成方法
JPH01221384A (ja) * 1988-02-29 1989-09-04 Fujitsu Ltd シリコーン化合物
JPH02163744A (ja) * 1988-12-19 1990-06-25 Fujitsu Ltd レジストパターンの形成方法
JPH0873593A (ja) * 1994-09-08 1996-03-19 Showa Denko Kk ポリオルガノシロキサン及びその製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5859222A (ja) * 1981-10-03 1983-04-08 Japan Synthetic Rubber Co Ltd オルガノポリシルセスキオキサン及びその製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5859222A (ja) * 1981-10-03 1983-04-08 Japan Synthetic Rubber Co Ltd オルガノポリシルセスキオキサン及びその製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01123229A (ja) * 1987-11-09 1989-05-16 Toray Silicone Co Ltd パターン形成用材料およびパターン形成方法
JPH01221384A (ja) * 1988-02-29 1989-09-04 Fujitsu Ltd シリコーン化合物
JPH02163744A (ja) * 1988-12-19 1990-06-25 Fujitsu Ltd レジストパターンの形成方法
JPH0873593A (ja) * 1994-09-08 1996-03-19 Showa Denko Kk ポリオルガノシロキサン及びその製造方法

Also Published As

Publication number Publication date
JPS6346094B2 (https=) 1988-09-13

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