JPS62211657A - プリント基板の焼付け方法 - Google Patents

プリント基板の焼付け方法

Info

Publication number
JPS62211657A
JPS62211657A JP61055708A JP5570886A JPS62211657A JP S62211657 A JPS62211657 A JP S62211657A JP 61055708 A JP61055708 A JP 61055708A JP 5570886 A JP5570886 A JP 5570886A JP S62211657 A JPS62211657 A JP S62211657A
Authority
JP
Japan
Prior art keywords
printed circuit
circuit board
mask film
mask
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61055708A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0469939B2 (enrdf_load_html_response
Inventor
Naoshi Kozu
神津　尚士
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OAK SEISAKUSHO KK
Orc Manufacturing Co Ltd
Original Assignee
OAK SEISAKUSHO KK
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OAK SEISAKUSHO KK, Orc Manufacturing Co Ltd filed Critical OAK SEISAKUSHO KK
Priority to JP61055708A priority Critical patent/JPS62211657A/ja
Publication of JPS62211657A publication Critical patent/JPS62211657A/ja
Publication of JPH0469939B2 publication Critical patent/JPH0469939B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP61055708A 1986-03-13 1986-03-13 プリント基板の焼付け方法 Granted JPS62211657A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61055708A JPS62211657A (ja) 1986-03-13 1986-03-13 プリント基板の焼付け方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61055708A JPS62211657A (ja) 1986-03-13 1986-03-13 プリント基板の焼付け方法

Publications (2)

Publication Number Publication Date
JPS62211657A true JPS62211657A (ja) 1987-09-17
JPH0469939B2 JPH0469939B2 (enrdf_load_html_response) 1992-11-09

Family

ID=13006380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61055708A Granted JPS62211657A (ja) 1986-03-13 1986-03-13 プリント基板の焼付け方法

Country Status (1)

Country Link
JP (1) JPS62211657A (enrdf_load_html_response)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6321649A (ja) * 1986-07-15 1988-01-29 Sanee Giken Kk 露光装置
US5288729A (en) * 1989-10-07 1994-02-22 Kabushiki Kaisha Toshiba Exposing method and apparatus
EP0618505A1 (fr) * 1993-03-31 1994-10-05 Automa-Tech Installation d'exposition à la lumière d'une plaque de circuit imprimé double face à travers des clichés
US6215548B1 (en) 1999-03-11 2001-04-10 Olec Corporation Nested glass exposure tool registration device
JP2005197441A (ja) * 2004-01-07 2005-07-21 Dainippon Kaken:Kk 露光装置および露光方法
JP2005537656A (ja) * 2002-08-27 2005-12-08 オブデュキャット、アクチボラグ 対象物にパターンを転写するための装置
CN102938974A (zh) * 2012-11-23 2013-02-20 大连运明自动化技术有限公司 不良品取出机模块的主体装置
CN110196533A (zh) * 2019-04-12 2019-09-03 大族激光科技产业集团股份有限公司 一种对位曝光装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5080122A (enrdf_load_html_response) * 1973-11-14 1975-06-30
JPS53143877A (en) * 1977-05-21 1978-12-14 Mitsubishi Electric Corp Automatic positioning device of pattern

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5080122A (enrdf_load_html_response) * 1973-11-14 1975-06-30
JPS53143877A (en) * 1977-05-21 1978-12-14 Mitsubishi Electric Corp Automatic positioning device of pattern

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6321649A (ja) * 1986-07-15 1988-01-29 Sanee Giken Kk 露光装置
US5288729A (en) * 1989-10-07 1994-02-22 Kabushiki Kaisha Toshiba Exposing method and apparatus
EP0618505A1 (fr) * 1993-03-31 1994-10-05 Automa-Tech Installation d'exposition à la lumière d'une plaque de circuit imprimé double face à travers des clichés
FR2703558A1 (fr) * 1993-03-31 1994-10-07 Automa Tech Sa Installation d'exposition à la lumière d'une plaque de circuit imprimé double face à travers les clichés.
US6215548B1 (en) 1999-03-11 2001-04-10 Olec Corporation Nested glass exposure tool registration device
JP2005537656A (ja) * 2002-08-27 2005-12-08 オブデュキャット、アクチボラグ 対象物にパターンを転写するための装置
US7754131B2 (en) 2002-08-27 2010-07-13 Obducat Ab Device for transferring a pattern to an object
JP2005197441A (ja) * 2004-01-07 2005-07-21 Dainippon Kaken:Kk 露光装置および露光方法
CN102938974A (zh) * 2012-11-23 2013-02-20 大连运明自动化技术有限公司 不良品取出机模块的主体装置
CN110196533A (zh) * 2019-04-12 2019-09-03 大族激光科技产业集团股份有限公司 一种对位曝光装置
CN110196533B (zh) * 2019-04-12 2021-07-16 深圳市大族数控科技股份有限公司 一种对位曝光装置

Also Published As

Publication number Publication date
JPH0469939B2 (enrdf_load_html_response) 1992-11-09

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