JPS62201414A - レ−ザ描画装置 - Google Patents
レ−ザ描画装置Info
- Publication number
- JPS62201414A JPS62201414A JP61043759A JP4375986A JPS62201414A JP S62201414 A JPS62201414 A JP S62201414A JP 61043759 A JP61043759 A JP 61043759A JP 4375986 A JP4375986 A JP 4375986A JP S62201414 A JPS62201414 A JP S62201414A
- Authority
- JP
- Japan
- Prior art keywords
- sample stage
- sample
- polygon mirror
- laser
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000009434 installation Methods 0.000 claims description 6
- 238000006073 displacement reaction Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 abstract description 3
- 102100023324 Golgi SNAP receptor complex member 1 Human genes 0.000 abstract 1
- 101000829933 Homo sapiens Golgi SNAP receptor complex member 1 Proteins 0.000 abstract 1
- 238000012937 correction Methods 0.000 description 31
- 238000000034 method Methods 0.000 description 19
- 238000010586 diagram Methods 0.000 description 12
- 238000001514 detection method Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 238000004364 calculation method Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Facsimile Scanning Arrangements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61043759A JPS62201414A (ja) | 1986-02-28 | 1986-02-28 | レ−ザ描画装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61043759A JPS62201414A (ja) | 1986-02-28 | 1986-02-28 | レ−ザ描画装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62201414A true JPS62201414A (ja) | 1987-09-05 |
| JPH0561613B2 JPH0561613B2 (enrdf_load_stackoverflow) | 1993-09-06 |
Family
ID=12672688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61043759A Granted JPS62201414A (ja) | 1986-02-28 | 1986-02-28 | レ−ザ描画装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62201414A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02173609A (ja) * | 1988-12-26 | 1990-07-05 | Nec Corp | レーザ描画装置 |
| JP2003515255A (ja) * | 1999-11-17 | 2003-04-22 | マイクロニック レーザー システムズ アクチボラゲット | マイクロリソグラフィ描画におけるビーム位置決め |
| JP2009122597A (ja) * | 2007-11-19 | 2009-06-04 | Hitachi Via Mechanics Ltd | レーザ直接描画装置 |
| JP2009128499A (ja) * | 2007-11-21 | 2009-06-11 | Hitachi Via Mechanics Ltd | レーザ直接描画方法およびレーザ直接描画装置 |
-
1986
- 1986-02-28 JP JP61043759A patent/JPS62201414A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02173609A (ja) * | 1988-12-26 | 1990-07-05 | Nec Corp | レーザ描画装置 |
| JP2003515255A (ja) * | 1999-11-17 | 2003-04-22 | マイクロニック レーザー システムズ アクチボラゲット | マイクロリソグラフィ描画におけるビーム位置決め |
| JP2011124586A (ja) * | 1999-11-17 | 2011-06-23 | Micronic Laser Systems Ab | マイクロリソグラフィ描画におけるビーム位置決め |
| JP2009122597A (ja) * | 2007-11-19 | 2009-06-04 | Hitachi Via Mechanics Ltd | レーザ直接描画装置 |
| JP2009128499A (ja) * | 2007-11-21 | 2009-06-11 | Hitachi Via Mechanics Ltd | レーザ直接描画方法およびレーザ直接描画装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0561613B2 (enrdf_load_stackoverflow) | 1993-09-06 |
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