JPS62178973A - プリント配線板用のパタ−ン設計図の検査方法 - Google Patents

プリント配線板用のパタ−ン設計図の検査方法

Info

Publication number
JPS62178973A
JPS62178973A JP61021035A JP2103586A JPS62178973A JP S62178973 A JPS62178973 A JP S62178973A JP 61021035 A JP61021035 A JP 61021035A JP 2103586 A JP2103586 A JP 2103586A JP S62178973 A JPS62178973 A JP S62178973A
Authority
JP
Japan
Prior art keywords
connection information
pattern
design drawing
pattern design
circuit diagram
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61021035A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0515251B2 (enExample
Inventor
Mikio Mori
幹夫 森
Takeshi Yamada
武志 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP61021035A priority Critical patent/JPS62178973A/ja
Publication of JPS62178973A publication Critical patent/JPS62178973A/ja
Publication of JPH0515251B2 publication Critical patent/JPH0515251B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61021035A 1986-02-01 1986-02-01 プリント配線板用のパタ−ン設計図の検査方法 Granted JPS62178973A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61021035A JPS62178973A (ja) 1986-02-01 1986-02-01 プリント配線板用のパタ−ン設計図の検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61021035A JPS62178973A (ja) 1986-02-01 1986-02-01 プリント配線板用のパタ−ン設計図の検査方法

Publications (2)

Publication Number Publication Date
JPS62178973A true JPS62178973A (ja) 1987-08-06
JPH0515251B2 JPH0515251B2 (enExample) 1993-03-01

Family

ID=12043705

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61021035A Granted JPS62178973A (ja) 1986-02-01 1986-02-01 プリント配線板用のパタ−ン設計図の検査方法

Country Status (1)

Country Link
JP (1) JPS62178973A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03152542A (ja) * 1989-11-09 1991-06-28 Rohm Co Ltd マスクパターン検証方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57130425A (en) * 1981-02-04 1982-08-12 Sharp Corp Random logic testing for cmoslsi

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57130425A (en) * 1981-02-04 1982-08-12 Sharp Corp Random logic testing for cmoslsi

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03152542A (ja) * 1989-11-09 1991-06-28 Rohm Co Ltd マスクパターン検証方法

Also Published As

Publication number Publication date
JPH0515251B2 (enExample) 1993-03-01

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