JPS62167885A - 炭素被膜を有する複合体の作製方法 - Google Patents
炭素被膜を有する複合体の作製方法Info
- Publication number
- JPS62167885A JPS62167885A JP27751786A JP27751786A JPS62167885A JP S62167885 A JPS62167885 A JP S62167885A JP 27751786 A JP27751786 A JP 27751786A JP 27751786 A JP27751786 A JP 27751786A JP S62167885 A JPS62167885 A JP S62167885A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- carbon film
- film
- present
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 36
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 33
- 239000002131 composite material Substances 0.000 title claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 8
- 239000010432 diamond Substances 0.000 claims abstract description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims abstract description 6
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims abstract description 5
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 abstract description 13
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 4
- 229930195733 hydrocarbon Natural products 0.000 abstract description 4
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 4
- 239000007795 chemical reaction product Substances 0.000 abstract description 2
- 229910021385 hard carbon Inorganic materials 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 150000001721 carbon Chemical class 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- -1 graphite Chemical compound 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27751786A JPS62167885A (ja) | 1986-11-19 | 1986-11-19 | 炭素被膜を有する複合体の作製方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27751786A JPS62167885A (ja) | 1986-11-19 | 1986-11-19 | 炭素被膜を有する複合体の作製方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56146930A Division JPS5848428A (ja) | 1981-09-17 | 1981-09-17 | 炭素被膜を有する複合体およびその作製方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62167885A true JPS62167885A (ja) | 1987-07-24 |
JPH0427690B2 JPH0427690B2 (enrdf_load_stackoverflow) | 1992-05-12 |
Family
ID=17584698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27751786A Granted JPS62167885A (ja) | 1986-11-19 | 1986-11-19 | 炭素被膜を有する複合体の作製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62167885A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07161646A (ja) * | 1993-12-13 | 1995-06-23 | Nec Corp | 多結晶膜作成方法 |
JPH07242493A (ja) * | 1993-01-07 | 1995-09-19 | Internatl Business Mach Corp <Ibm> | 基板上にダイアモンド状カーボン・フィルムを付着する方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5328576A (en) * | 1976-08-13 | 1978-03-16 | Nat Res Dev | Surface coating process with cargonaceous material and apparatus therefor |
JPS5578524A (en) * | 1978-12-10 | 1980-06-13 | Shunpei Yamazaki | Manufacture of semiconductor device |
-
1986
- 1986-11-19 JP JP27751786A patent/JPS62167885A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5328576A (en) * | 1976-08-13 | 1978-03-16 | Nat Res Dev | Surface coating process with cargonaceous material and apparatus therefor |
JPS5578524A (en) * | 1978-12-10 | 1980-06-13 | Shunpei Yamazaki | Manufacture of semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07242493A (ja) * | 1993-01-07 | 1995-09-19 | Internatl Business Mach Corp <Ibm> | 基板上にダイアモンド状カーボン・フィルムを付着する方法 |
JPH07161646A (ja) * | 1993-12-13 | 1995-06-23 | Nec Corp | 多結晶膜作成方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0427690B2 (enrdf_load_stackoverflow) | 1992-05-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Hash et al. | Model based comparison of thermal and plasma chemical vapor deposition of carbon nanotubes | |
KR900007668B1 (ko) | 다이어몬드의 합성방법 및 그 장치 | |
EP0288065A2 (en) | Method for synthesis of diamond | |
JPH05109625A (ja) | 半導体の単結晶をエピタキシヤル成長させるための多結晶質cvdダイヤモンド基体 | |
US4292343A (en) | Method of manufacturing semiconductor bodies composed of amorphous silicon | |
JPH08225395A (ja) | ホウ素ドープされたダイヤモンドの製造方法 | |
JPS5848428A (ja) | 炭素被膜を有する複合体およびその作製方法 | |
JPS62202897A (ja) | ダイヤモンドの製造方法 | |
JPS62167886A (ja) | 炭素被膜を有する複合体 | |
JPS62167885A (ja) | 炭素被膜を有する複合体の作製方法 | |
JPS62162366A (ja) | 炭素被膜を有する複合体 | |
JPS62167884A (ja) | 炭素被膜を有する複合体 | |
JPH0366280B2 (enrdf_load_stackoverflow) | ||
JPS62161960A (ja) | 炭素被膜を有する複合体の作成方法 | |
JPH03158468A (ja) | 炭素を主成分とする被膜 | |
JPH0237087B2 (enrdf_load_stackoverflow) | ||
JPH01152621A (ja) | ダイヤモンド構造を有する炭素被膜の作製方法 | |
JPS62162367A (ja) | 炭素被膜を有する複合体 | |
JPS60137898A (ja) | ダイヤモンド薄膜の製造方法 | |
JPH02244045A (ja) | フォトマスク | |
JPS60112699A (ja) | ダイヤモンドの製造方法 | |
KR100367455B1 (ko) | 탄소나노튜브 합성용 다중 진공챔버 플라즈마화학기상증착장치 및 이 장치를 이용한 탄소나노튜브 합성방법 | |
JPH0419197B2 (enrdf_load_stackoverflow) | ||
JP2619888B2 (ja) | 窒化アルミニウムの製造方法 | |
JPS6353159B2 (enrdf_load_stackoverflow) |