JPS62167884A - 炭素被膜を有する複合体 - Google Patents
炭素被膜を有する複合体Info
- Publication number
- JPS62167884A JPS62167884A JP61277516A JP27751686A JPS62167884A JP S62167884 A JPS62167884 A JP S62167884A JP 61277516 A JP61277516 A JP 61277516A JP 27751686 A JP27751686 A JP 27751686A JP S62167884 A JPS62167884 A JP S62167884A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- substrate
- present
- film
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61277516A JPS62167884A (ja) | 1986-11-19 | 1986-11-19 | 炭素被膜を有する複合体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61277516A JPS62167884A (ja) | 1986-11-19 | 1986-11-19 | 炭素被膜を有する複合体 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56146930A Division JPS5848428A (ja) | 1981-09-17 | 1981-09-17 | 炭素被膜を有する複合体およびその作製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62167884A true JPS62167884A (ja) | 1987-07-24 |
| JPH0530906B2 JPH0530906B2 (enExample) | 1993-05-11 |
Family
ID=17584686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61277516A Granted JPS62167884A (ja) | 1986-11-19 | 1986-11-19 | 炭素被膜を有する複合体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62167884A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02104665A (ja) * | 1988-10-11 | 1990-04-17 | Semiconductor Energy Lab Co Ltd | 炭素膜で覆われた部材 |
| JP2003534223A (ja) * | 2000-05-24 | 2003-11-18 | ガーディアン・インダストリーズ・コーポレーション | 支持体のdlc含有親水性被覆 |
| US6925439B1 (en) | 1994-06-20 | 2005-08-02 | C-Sam, Inc. | Device, system and methods of conducting paperless transactions |
-
1986
- 1986-11-19 JP JP61277516A patent/JPS62167884A/ja active Granted
Non-Patent Citations (1)
| Title |
|---|
| SOLID STATE COMMUN * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02104665A (ja) * | 1988-10-11 | 1990-04-17 | Semiconductor Energy Lab Co Ltd | 炭素膜で覆われた部材 |
| US6925439B1 (en) | 1994-06-20 | 2005-08-02 | C-Sam, Inc. | Device, system and methods of conducting paperless transactions |
| JP2003534223A (ja) * | 2000-05-24 | 2003-11-18 | ガーディアン・インダストリーズ・コーポレーション | 支持体のdlc含有親水性被覆 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0530906B2 (enExample) | 1993-05-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0946959B1 (en) | Diamond fim deposition method | |
| US6221154B1 (en) | Method for growing beta-silicon carbide nanorods, and preparation of patterned field-emitters by chemical vapor depositon (CVD) | |
| KR910001367B1 (ko) | 기상 합성 다이아몬드막 및 그 합성방법 | |
| EP1149932A2 (en) | Thermal chemical vapor deposition apparatus and method of synthesizing carbon nanotubes using the same | |
| JP4441607B2 (ja) | 半導体基板を不動態化する方法 | |
| JPH05109625A (ja) | 半導体の単結晶をエピタキシヤル成長させるための多結晶質cvdダイヤモンド基体 | |
| JPH0752718B2 (ja) | 薄膜形成方法 | |
| US4292343A (en) | Method of manufacturing semiconductor bodies composed of amorphous silicon | |
| JPS5848428A (ja) | 炭素被膜を有する複合体およびその作製方法 | |
| JPS62167886A (ja) | 炭素被膜を有する複合体 | |
| JPS62162366A (ja) | 炭素被膜を有する複合体 | |
| JPS62202897A (ja) | ダイヤモンドの製造方法 | |
| JPS6164124A (ja) | 薄膜作成装置 | |
| JPH0427690B2 (enExample) | ||
| WO1987000346A1 (fr) | Procede de formage d'un film mince | |
| JPH01152621A (ja) | ダイヤモンド構造を有する炭素被膜の作製方法 | |
| JPS62161960A (ja) | 炭素被膜を有する複合体の作成方法 | |
| JPS62162367A (ja) | 炭素被膜を有する複合体 | |
| JPH02244045A (ja) | フォトマスク | |
| JPH0237087B2 (enExample) | ||
| JPH0530906B2 (enExample) | ||
| JPH0543393A (ja) | 炭素材料作製方法 | |
| JPS60137898A (ja) | ダイヤモンド薄膜の製造方法 | |
| JPH0692761A (ja) | CVD−SiCコートSi含浸SiC製品およびその製造方法 | |
| JPH0361369A (ja) | ダイヤモンド状炭素膜の製造方法 |