JPS62161959A - インライン式成膜装置 - Google Patents
インライン式成膜装置Info
- Publication number
- JPS62161959A JPS62161959A JP221686A JP221686A JPS62161959A JP S62161959 A JPS62161959 A JP S62161959A JP 221686 A JP221686 A JP 221686A JP 221686 A JP221686 A JP 221686A JP S62161959 A JPS62161959 A JP S62161959A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- substrates
- degassing
- film forming
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 238000007872 degassing Methods 0.000 claims abstract description 44
- 238000002360 preparation method Methods 0.000 claims description 26
- 230000032258 transport Effects 0.000 claims description 12
- 238000004544 sputter deposition Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 238000005192 partition Methods 0.000 description 8
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP221686A JPS62161959A (ja) | 1986-01-10 | 1986-01-10 | インライン式成膜装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP221686A JPS62161959A (ja) | 1986-01-10 | 1986-01-10 | インライン式成膜装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62161959A true JPS62161959A (ja) | 1987-07-17 |
| JPH0419303B2 JPH0419303B2 (enExample) | 1992-03-30 |
Family
ID=11523160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP221686A Granted JPS62161959A (ja) | 1986-01-10 | 1986-01-10 | インライン式成膜装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62161959A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100945429B1 (ko) | 2007-10-05 | 2010-03-05 | 한국원자력연구원 | 대량의 기판 장착 및 탈착 시스템을 이용한 양산형박막증착 장치 |
| KR100945431B1 (ko) | 2007-10-05 | 2010-03-05 | 한국원자력연구원 | 다층기판홀더를 이용한 양산형 박막증착장치 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS506195A (enExample) * | 1972-11-21 | 1975-01-22 | ||
| JPS5814337A (ja) * | 1981-07-17 | 1983-01-27 | Pioneer Electronic Corp | デイスク等の被処理物の連続メタライジング装置 |
-
1986
- 1986-01-10 JP JP221686A patent/JPS62161959A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS506195A (enExample) * | 1972-11-21 | 1975-01-22 | ||
| JPS5814337A (ja) * | 1981-07-17 | 1983-01-27 | Pioneer Electronic Corp | デイスク等の被処理物の連続メタライジング装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100945429B1 (ko) | 2007-10-05 | 2010-03-05 | 한국원자력연구원 | 대량의 기판 장착 및 탈착 시스템을 이용한 양산형박막증착 장치 |
| KR100945431B1 (ko) | 2007-10-05 | 2010-03-05 | 한국원자력연구원 | 다층기판홀더를 이용한 양산형 박막증착장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0419303B2 (enExample) | 1992-03-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3584847A (en) | Advancing workpieces through a sputtering chamber | |
| JPS6052574A (ja) | 連続スパツタ装置 | |
| JP4369866B2 (ja) | 基板処理装置及び処理方法 | |
| JPS6386867A (ja) | ウェ−ハ処理装置 | |
| JP2001135704A (ja) | 基板処理装置及び基板搬送用トレイの搬送制御方法 | |
| JP6379322B1 (ja) | 成膜装置 | |
| JPS639586B2 (enExample) | ||
| JPS62161959A (ja) | インライン式成膜装置 | |
| JPH11293459A (ja) | 多層成膜装置 | |
| JPS62996B2 (enExample) | ||
| JPH0831506B2 (ja) | 基板搬送装置 | |
| JPS609103B2 (ja) | 連続スパッタ装置 | |
| JPH0366819B2 (enExample) | ||
| JPS6328863A (ja) | 真空処理装置 | |
| JPH0641630B2 (ja) | インライン式成膜装置に於ける基板搬送方法 | |
| JP3395180B2 (ja) | 基板処理装置 | |
| JPS61113766A (ja) | エンドステ−シヨン | |
| KR101231968B1 (ko) | 기판 이송 시스템 | |
| JPH0237742A (ja) | 半導体装置の製造装置 | |
| JPH0995783A (ja) | スパッタ装置 | |
| JP4392073B2 (ja) | 成膜装置 | |
| JPH0230759A (ja) | 真空処理装置 | |
| CN114086141A (zh) | 移动式物理溅射成膜设备及多层膜的制备工艺 | |
| JPS61104636A (ja) | エンドステ−シヨン | |
| JPS62104048A (ja) | ウエハハンドリング方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |