JPS621609B2 - - Google Patents
Info
- Publication number
- JPS621609B2 JPS621609B2 JP55077798A JP7779880A JPS621609B2 JP S621609 B2 JPS621609 B2 JP S621609B2 JP 55077798 A JP55077798 A JP 55077798A JP 7779880 A JP7779880 A JP 7779880A JP S621609 B2 JPS621609 B2 JP S621609B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy
- reaction product
- component
- resin
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004593 Epoxy Substances 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 15
- 150000001875 compounds Chemical class 0.000 claims description 13
- -1 polysiloxane Polymers 0.000 claims description 12
- 229920001296 polysiloxane Polymers 0.000 claims description 9
- 239000007795 chemical reaction product Substances 0.000 claims description 8
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 claims description 6
- 239000003822 epoxy resin Substances 0.000 claims description 6
- 229920000768 polyamine Polymers 0.000 claims description 6
- 229920000647 polyepoxide Polymers 0.000 claims description 6
- 239000011256 inorganic filler Substances 0.000 claims description 5
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 5
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 3
- 150000004984 aromatic diamines Chemical class 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000008188 pellet Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000001294 propane Substances 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000012778 molding material Substances 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- KAMGOKSXKBHPHL-UHFFFAOYSA-N benzene-1,2,3,4-tetramine Chemical compound NC1=CC=C(N)C(N)=C1N KAMGOKSXKBHPHL-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000002198 insoluble material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- KGSFMPRFQVLGTJ-UHFFFAOYSA-N 1,1,2-triphenylethylbenzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(C=1C=CC=CC=1)CC1=CC=CC=C1 KGSFMPRFQVLGTJ-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- DDHYZBVBQZYMTO-UHFFFAOYSA-N 1-(dimethylamino)pentan-1-ol Chemical compound CCCCC(O)N(C)C DDHYZBVBQZYMTO-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- MCMFEZDRQOJKMN-UHFFFAOYSA-N 1-butylimidazole Chemical compound CCCCN1C=CN=C1 MCMFEZDRQOJKMN-UHFFFAOYSA-N 0.000 description 1
- AXFVIWBTKYFOCY-UHFFFAOYSA-N 1-n,1-n,3-n,3-n-tetramethylbutane-1,3-diamine Chemical compound CN(C)C(C)CCN(C)C AXFVIWBTKYFOCY-UHFFFAOYSA-N 0.000 description 1
- JOIOCLWIPAKKFA-UHFFFAOYSA-N 18-phenyloctadecylazanium;chloride Chemical compound [Cl-].[NH3+]CCCCCCCCCCCCCCCCCCC1=CC=CC=C1 JOIOCLWIPAKKFA-UHFFFAOYSA-N 0.000 description 1
- BPHYZRNTQNPLFI-UHFFFAOYSA-N 2,4,6-trihydroxytoluene Chemical compound CC1=C(O)C=C(O)C=C1O BPHYZRNTQNPLFI-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- KLLPVNAKBNBWMY-UHFFFAOYSA-N 2-(4-phenylphenyl)oxirane Chemical group C1OC1C1=CC=C(C=2C=CC=CC=2)C=C1 KLLPVNAKBNBWMY-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- SIQHSJOKAUDDLN-UHFFFAOYSA-N 2-methyl-1-propylimidazole Chemical compound CCCN1C=CN=C1C SIQHSJOKAUDDLN-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- WMNWJTDAUWBXFJ-UHFFFAOYSA-N 3,3,4-trimethylheptane-2,2-diamine Chemical compound CCCC(C)C(C)(C)C(C)(N)N WMNWJTDAUWBXFJ-UHFFFAOYSA-N 0.000 description 1
- YJCSUBLMBRTUOX-UHFFFAOYSA-N 3,3,4-trimethylhexane-2,2-diamine Chemical compound CCC(C)C(C)(C)C(C)(N)N YJCSUBLMBRTUOX-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- HVMHLMJYHBAOPL-UHFFFAOYSA-N 4-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)propan-2-yl]-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2OC2CC1C(C)(C)C1CC2OC2CC1 HVMHLMJYHBAOPL-UHFFFAOYSA-N 0.000 description 1
- RIAHASMJDOMQER-UHFFFAOYSA-N 5-ethyl-2-methyl-1h-imidazole Chemical compound CCC1=CN=C(C)N1 RIAHASMJDOMQER-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- 238000006418 Brown reaction Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- 239000004381 Choline salt Substances 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- ZFIVKAOQEXOYFY-UHFFFAOYSA-N Diepoxybutane Chemical compound C1OC1C1OC1 ZFIVKAOQEXOYFY-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- WLLGXSLBOPFWQV-UHFFFAOYSA-N MGK 264 Chemical compound C1=CC2CC1C1C2C(=O)N(CC(CC)CCCC)C1=O WLLGXSLBOPFWQV-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- CEGOLXSVJUTHNZ-UHFFFAOYSA-K aluminium tristearate Chemical compound [Al+3].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CEGOLXSVJUTHNZ-UHFFFAOYSA-K 0.000 description 1
- 229940063655 aluminum stearate Drugs 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- OWSZUKMVEBFJMZ-UHFFFAOYSA-N benzene-1,2,3,4,5,6-hexamine Chemical compound NC1=C(N)C(N)=C(N)C(N)=C1N OWSZUKMVEBFJMZ-UHFFFAOYSA-N 0.000 description 1
- YAEGJXCMJSSJQT-UHFFFAOYSA-N benzene-1,2,3,4,5-pentamine Chemical compound NC1=CC(N)=C(N)C(N)=C1N YAEGJXCMJSSJQT-UHFFFAOYSA-N 0.000 description 1
- VVWINCXZUPKZBK-UHFFFAOYSA-N benzene-1,2,3,5-tetramine Chemical compound NC1=CC(N)=C(N)C(N)=C1 VVWINCXZUPKZBK-UHFFFAOYSA-N 0.000 description 1
- RUOKPLVTMFHRJE-UHFFFAOYSA-N benzene-1,2,3-triamine Chemical compound NC1=CC=CC(N)=C1N RUOKPLVTMFHRJE-UHFFFAOYSA-N 0.000 description 1
- RPHKINMPYFJSCF-UHFFFAOYSA-N benzene-1,3,5-triamine Chemical compound NC1=CC(N)=CC(N)=C1 RPHKINMPYFJSCF-UHFFFAOYSA-N 0.000 description 1
- VZWMKHUMEIECPK-UHFFFAOYSA-M benzyl-dimethyl-octadecylazanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 VZWMKHUMEIECPK-UHFFFAOYSA-M 0.000 description 1
- AFBPHRMRBXPVPX-UHFFFAOYSA-M benzyl-dimethyl-tetradecylazanium;acetate Chemical compound CC([O-])=O.CCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 AFBPHRMRBXPVPX-UHFFFAOYSA-M 0.000 description 1
- OCBHHZMJRVXXQK-UHFFFAOYSA-M benzyl-dimethyl-tetradecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 OCBHHZMJRVXXQK-UHFFFAOYSA-M 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- GLROGUSVUGSGPO-UHFFFAOYSA-N bis(3-methyl-7-oxabicyclo[4.1.0]heptan-4-yl) hexanedioate Chemical compound C1C2OC2CC(C)C1OC(=O)CCCCC(=O)OC1CC2OC2CC1C GLROGUSVUGSGPO-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- UORVGPXVDQYIDP-BJUDXGSMSA-N borane Chemical class [10BH3] UORVGPXVDQYIDP-BJUDXGSMSA-N 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 235000019241 carbon black Nutrition 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- NZNMSOFKMUBTKW-UHFFFAOYSA-M cyclohexanecarboxylate Chemical compound [O-]C(=O)C1CCCCC1 NZNMSOFKMUBTKW-UHFFFAOYSA-M 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- YIFWXQBNRQNUON-UHFFFAOYSA-M dodecyl(trimethyl)azanium;iodide Chemical compound [I-].CCCCCCCCCCCC[N+](C)(C)C YIFWXQBNRQNUON-UHFFFAOYSA-M 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- LDLDYFCCDKENPD-UHFFFAOYSA-N ethenylcyclohexane Chemical compound C=CC1CCCCC1 LDLDYFCCDKENPD-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000002611 lead compounds Chemical class 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 235000014380 magnesium carbonate Nutrition 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- OKBVMLGZPNDWJK-UHFFFAOYSA-N naphthalene-1,4-diamine Chemical compound C1=CC=C2C(N)=CC=C(N)C2=C1 OKBVMLGZPNDWJK-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Description
本発明は、低弾性率で、しかも低膨張率、高ガ
ラス転移点の硬化物を提供するエポキシ樹脂組成
物に関する。
近年、電子部品の分野においては、小型軽量化
および高信頼性化に伴ない、半導体素子ペレツト
の大型化、能動素子、受動素子の複合などによる
多機能化が指向されている。そのため、半導体素
子のコート材料、モールド材料には、耐熱性、可
撓性(耐クラツク性)、耐湿性などの特性のバラ
ンスがとれた材料が要求されている。また、同時
に素子に直にモールドしてもインサートに対する
応力の小さい特性を有する材料が強く要求されて
いる。
従来、半導体などの電子部品や電気機器のモー
ルド用樹脂としては、エポキシ系、シリコーン
系、フエノール系、ジアリルフタレート系などの
材料が使用されてきた。
その中でも、フエノールノボラツク樹脂を硬化
剤として用いたエポキシ樹脂組成物が、インサー
トに対する接着性、電気特性などが比較的バラン
スされている点ですぐれ、モールド用樹脂の主流
となつている。
しかし、この系統の樹脂組成物には、素子ペレ
ツトに可撓性のすぐれた保護コートを施すことな
く直接に該樹脂でモールドすると、素子ペレツト
に割れ(クラツク)を生じたり、ボンデイング線
が切断されるなど、モールド樹脂のインサートに
対する応力に起因する障害がみられる。また、こ
の問題の対策として、該樹脂に可撓化剤などを添
加すると、半導体素子モールド材として要求され
る耐熱性、耐湿性の目標を満たすことが困難であ
つた。
すなわち、フエノール樹脂を硬化剤とするエポ
キシ樹脂組成物に、可撓化剤を添加すると、硬化
樹脂のガラス転移点が急激に降下し、それに伴な
つて高温領域での電気特性が低下するため、信頼
性の高い半導体モールド製品を得がたい。
一方、シリコーン系材料は低い弾性率と高いガ
ラス転移点を有し、これを用いて直接モールドし
ても素子ペレツトに割れ(クラツク)は生じな
い。しかし、該材料は、金属インサート(フレー
ム部など)との接着性が低いことや、透湿性が大
きいなどの問題があつて、該モールド品は耐湿性
の面で信頼性に欠ける。
本発明は、上述のような状況に鑑みてなされた
もので、その目的は、低弾性率で、しかも低線膨
張係数、高ガラス転移点、具体的にはそれぞれ、
2.0×105Kg/cm2(室温)、3.0×10-5(℃-1)、およ
び150℃以上の特性を有する樹脂に硬化する、耐
熱性、耐クラツク性、耐湿性のバランスのすぐれ
たエポキシ樹脂組成物を提供することである。
本発明の特徴とするところは、
〔A〕 多官能エポキシ化合物
〔B〕(a) エチレン型不飽和ジカルボン酸無水物
またはその官能性誘導体と、
(b) ポリアミンとの反応物、および
〔C〕 シリコーン系化合物、望ましくは、オル
ガノポリシロキサン化合物
〔D〕 無機質フイラを含有してなり、前記
〔D〕無機質フイラの含有容量%、100D/A+
B+C+Dが40〜75の範囲にあることである。
次に本発明において(B)多官能エポキシ化合物と
しては、例えばビスフエノールAのジグリシジル
エーテル、ブタジエンジエポキサイド、3・4−
エポキシシクロヘキシルメチル−(3・4−エポ
キシ)シクロヘキサンカルボキシレート、ビニル
シクロヘキサンジオキシド、4・4′−ジ(1・2
−エポキシエチル)ジフエニルエーテル、4・
4′−(1・2−エポキシエチル)ビフエニル、
2・2−ビス(3・4−エポキシシクロヘキシ
ル)プロパン、レゾルシンのグリシジルエーテ
ル、フロログルシンのジグリシジルエーテル、メ
チルフロログルシンのジグリシジルエーテル、ビ
ス−(2・3−エポキシシクロヘンチル)エーテ
ル、2−(3・4−エポキシ)シクロヘキサン−
5・5−スピロ(3・4−エポキシ)−シクロヘ
キサン−m−ジオキサン、ビス−(3・4−エポ
キシ−6−メチルシクロヘキシル)アジペート、
N・N′−m−フエニレンビス(4・5−エポキ
シ−1・2−シクロヘキサン)ジカルボキシイミ
ドなどの2官能のエポキシ化合物、パラアミノフ
エノールのトリグリシジルエーテル、ポリアリル
グリシジルエーテル、1・3・5−トリ(1・2
−エポキシエチル)ベンビン、2・2′・4・4′−
テトラグリシドキシベンゾフエノン、テトラグリ
シドキンテトラフエニルエタン、フエノールホル
ムアルデヒドノボラツクのポリグリシジルエーテ
ル、グリセリンのトリグリシジルエーテル、トリ
メチロールプロパンのトリグリシジルエーテルな
ど3官能以上のエポキシ化合物が用いられる。
本発明においては、エチレン型不飽和ジカルボ
ン酸無水物またはその官能性誘導体とポリアミン
との反応物が発生の目的を達成する上で重要な働
きをする。
エチレン型不飽和ジカルボン酸無水物、または
その官能性誘導体として、例えば無水マレイン
酸、各種のマレイン酸エステル、無水シトラコン
酸、無水イタコン酸、無水テトラヒドロフタル酸
などが用いられる。
また、本発明において、ポリアミンとしては、
例えば、メタフエニレンジアミン、パラフエニレ
ンジアミン、ジアニシジン、2・6−ジアミノピ
リジン、1・4−ナフチレンジアミン、1・5−
ナフチレンジアミン、2・6−ナフチレンジアミ
ン、4・4′−ジアミノジフエニルメタン、4・
4′−ジアミノジフエニルエーテル、4・4′−ジア
ミノジフエニルプロパン、4・4′−ジアミノジフ
エニルチオエーテル、4・4′−ジアミノジフエニ
ルケトン、2・2′−ビス〔4−(4−アミノフエ
ノキシ)フエニル〕プロパン、2・2′−ビス〔3
−メチル−4−(4−アミノフエノキシ)フエニ
ル〕プロパン、1・1・1・3・3・3−ヘキサ
フルオロ−2・2−ビス〔4−(4−アミノフエ
ノキシ)フエニル〕プロパン、1・1・1・3・
3・3−ヘキサフルオロ−2・2−ビス〔3・5
−ジブロモ−4−(4−アミノフエノキシ)フエ
ニル〕プロパン、及びこれらの芳香族核へのアル
キル化誘導体などが挙げられる。
また、シクロヘキシレン環を含むアミン化合物
の例としては、次の一般式
〔式中、Rは−CH2−、−CH(CH3)−、−C
(CH3)2−、−S−、−O−などを表わす〕で表わ
されるジアミンが挙げられる。このようなジアミ
ン化合物の具体例としては、4・4′−ジアミノジ
シクロヘキシルメタン、4・4′−ジアミノジシク
ロヘキシルプロパン、4・4′−ジアミノジシクロ
ヘキシルエーテル、などがある。
また、1・2・3−トリアミノベンゼン、1・
2・4−トリアミノベンゼン、1・3・5−トリ
アミノベンゼン、1・2・3・4−テトラアミノ
ベンゼン、1・2・3・5−テトラアミノベンゼ
ン、1・2・4・5−テトラアミノベンゼン、ペ
ンタアミノベンゼン、ヘキサアミノベンゼンなど
がある。
上記ポリアミンの中でも芳香族ジアミンを主成
分とすることが、本発明の効果である耐熱性と可
撓性のバランスにすぐれた硬化物を得る上で好ま
しい。
本発明の目的を達成する上で重要な働きをする
溶融反応物は、前記のアミン系化合物とエチレン
型不飽和ジカルボン酸無水物とを、前者1モルに
対し、後者0.6モル未満の範囲で配合し、90〜250
℃で10〜60分間溶融反応させることによつて得ら
れる。エチレン型不飽和ジカルボン酸無水物の配
合量が上記より多いと溶融反応物は融点が比較的
高く、作業性、この溶融反応物を素材として用い
た組成物の流動性の点で不利となり、また、少な
くすることは、本発明の硬化物の耐熱性付与の観
点から好ましくない。
上述の、〔A〕多官能エポキシ化合物、〔B〕エ
チレン型不飽和ジカルボン酸無水物とポリアミン
との反応物、〔C〕シリコーン系化合物、3成分
の配合割合については、〔A〕成分100重量部に対
して、〔B〕成分20〜70重量部、〔C〕成分1〜60
重量部の範囲で適宜変えて使用すればよい。
〔A〕成分に対する〔C〕成分の添加割合が60重
量部を越える場合には、組成物は硬化不能になつ
たり、硬化しても目的の耐熱性を付与することが
困難となる。また、1重量部以下の添加の場合に
は低弾性率化の効果は殆んどない。
一方、〔A〕成分に対する〔B〕成分の添加量
は、エポキシ化合物のエポキシ基1ケに対して、
上記溶融反応物のアミノ基のプロトン1ケが当量
となるよう、目的と用途に応じて適宜変えること
ができ、通常の場合、20〜70重量部の範囲内であ
るが、そのときと場合により特に限定されるもの
ではない。
また、本発明の必須成分であるシリコーン系化
合物としては、例えば、ケイ素原子1個に対し、
これと結合している有機基との比R/Si(ただ
し、Rは置換もしくは非置換の1価炭化水素基)
が1.0〜1.7であり、ケイ素原子に結合した水酸基
の含有量が少なくとも0.2重量%であるオルガノ
ポリシロキサン樹脂であり、このシロキサン樹脂
を構成するシロキサン単位としては、
CH3SiO15、C2H5SiO15、C6H5SiO15、
C8H7SiO15、Cl2C6H3SiO15、
CF3CH2CH2CH2SiO15などが例示されるが、R/
Si比が1.0〜1.7の範囲にある限り、その成分中
に、(CH3)2SiO、(C2H5)2SiO、(C6H5)2SiO、
CH3(CH2=CH)SiO、CH3(C6H5)SiO、C6H5
(CH2=CH)SiO、C6H5(C2H5)SiO、CH3
(CF3CH2CH2H2)SiOで例示される構成単位を含
んでいてよい。さらにケイ素原子に結合したメト
キシ基、エトキシ基、プロポキシ基、ブトキシ基
などのアルコキシ基を含んでいてもよい。
このような構成単位を有するオルガノポリシロ
キサン樹脂は相当するオルガノハロシラン、アル
コキシシランを、前記したR/Si比が1.0〜1.7と
なるように選択配合して加水分解、縮合反応させ
ることにより、若干量のケイ素原子に縮合した水
酸基を有するものとして得られる。
ケイ素原子に結合した水酸基の含有量が少なす
ぎると、硬化が不十分となるので、水酸基量で少
なくとも0.2重量%含有していることが必要とさ
れる。
使用するオルガノポリシロキサン樹脂は1種に
限定する理由はなく、2種以上を混合して使用し
てもよい。
ところで、本発明の目的を達成する上で、重要
な働きをする無機質フイラ〔D〕としては、例え
ばジルコン、シリカ、溶融石英ガラス、クレー、
アルミナ、炭酸カルシウム、石英ガラス、ガラ
ス、アスベスト、ホイスカ、石コウ、マグネサイ
ト、マイカ、カオリン、タルク、黒鉛、セメン
ト、カーボニルアイアン、フエライト、鉛化合
物、二硫化モリブデン、亜鉛華、チタン白、カー
ボンブラツク、珪砂、ウオラストナイト、ガラス
繊維、ガラスビーズ、水和アルミナ、胡粉、ケイ
酸アルミニウム、酸化チタンなどがあり、これら
の1種以上を併用して用いることも出来る。
前記〔D〕成分は、本発明の組成物中で、
100×〔D〕/〔A〕+〔B〕+〔C〕+〔D〕が40
〜
75容量%配合される。40容量%より小さい場合に
は、線膨張率(α)が大きくなり、金属インサー
トとのαの差が大きくなり、レジンクラツク、素
子ペレツトクラツクの原因の一つとなる。また、
75容量%より多い場合には、材料の流動性が著る
しく低下し、素子、インサートなどのモールドが
困難となる。
また、本発明の樹脂組成物には、硬化反応を促
進する目的で触媒を添加することが出来る。その
ような触媒としては、例えば、トリエタノールア
ミン、テトラメチルブタンジアミン、テトラメチ
ルペンタンジアミン、テトラメチルヘキサンジア
ミン、トリエチレンジアミン、ジメチルアニリン
などの3級アミン、ジメチルアミノエタノール、
ジメチルアミノペンタノールなどのオキシアルキ
ルアミンやトリス(ジメチルアミノメチル)フエ
ノール、N−メチルモルホリンなどのアミン類が
ある。
また、セチルトリメチルアンモニユウムブロマ
イド、セチルトリメチルアンモニユウクロライ
ド、ドデシルトリメチルアンモニウムアイオダイ
ド、トリメチルドデシルアンモニウムクロライ
ド、ベンジルジメチルテトラデシルアンモニウム
クロライド、ベンジルメチルパルミチルアンモニ
ウムクロライド、アリルドデシルトリメチルアン
モニウムブロマイド、ベンジルジメチルステアリ
ルアンモニウムブロマイド、ステアリルトリメチ
ルアンモニウムクロライド、ベンジルジメチルテ
トラデシルアンモニウムアセテートなどの第4級
アンモニウム塩がある。
更に、2−ウンデシルイミダゾール、2−メチ
ルイミダゾール、2−エチルイミダゾール、2−
ヘプタデシルイミダゾール、2−メチル−4−エ
チルイミダゾール、1−ブチルイミダゾール、1
−プロピル−2−メチルイミダゾール、1−ベン
ジル−2−メチルイミダゾール、1−シアノエチ
ル−2−メチルイミダゾール、1−シアノエチル
−2−ウンデシルイミダゾール、1−シアノエチ
ル−2−フエニルイミダゾール、1−アジン−2
−メチルイミダゾール、1−アジン−2−ウンデ
シルイミダゾールなどのイミダゾール類がある。
また、トリフエニルホスフインテトラフエニル
ボレート、トリエチルアミンテトラフエニルボレ
ート、N−メチルモルホリンテトラフエニルボレ
ート、ピリジンテトラフエニルボレート、2−エ
チル−4−メチルイミダゾールテトラフエニルボ
レート、2−エチル−1・4−ジメチルイミダゾ
ールテトラフエニルボレートなどのカリボール塩
が有用である。上述の触媒の1種以上を併用して
使用することも出来る。
また、必要に応じて、本発明の〔C〕成分と共
用する形で、公知の可撓化剤、例えば、ポリブタ
ジエン、アクリロニトリルゴム、ブタジエン−ア
クリロニトリル共重合体、スチレンゴム、ポリビ
ニルアセタール類、フエノキシ樹脂、ダイマー酸
のジグリシジルエーテルなどを用いることができ
る。
また、その用途、目的に応じて、ステアリン
酸、ステアリン酸カルシウム、ステアリン酸亜
鉛、ステアリン酸アルミニウムなどの脂肪酸類や
ワツクス類、シリコーンオイルなどの離型剤、エ
ポキシシラン、ビニルシラン、ボラン系化合物、
アルコキシチタネート系化合物など、既に公知の
カツプリング剤、更に、アンチモン、燐化合物、
ハロゲン並びにハロゲン含有化合物など公知の難
燃化剤を用いることができる。
実施例 1〜9
4・4′−ジアミノジフエニルメタン(以下
DDMと略称する)100重量部を、6個の反応容器
にそれぞれ別個に採取し、90〜130℃に加熱し溶
融した。この中に、第1表に示すモル比の無水マ
レイン酸(以下MAと略称する)をそれぞれ撹拌
しながら添加した。直ぐに黄色の反応不溶物が生
成したが、更に130〜200℃で30分程度加熱を続け
るところ、不溶物は徐々に溶解し透明な茶褐色反
応物が得られた。
次に、これらの反応物の所定量を用い、エポキ
シノボラツク(チバガイギー社製、ECN1273、
エポキシ当量225;以下ECN1273と略称する)、
ビスフエノールA型エポキシ(シエル社製、EP
1001、エポキシ当量475;以下E1001と略称す
る)、シリコーン系化合物離型剤(ヘキスト社
製、Hexist Wax.E、以下Hexist Wax Eと略称
する)、カツプリング剤(信越化学社製、エポキ
シシランKBM403、以下KBM403と略称する)、
充填剤(溶融石英ガラス粉)及び着色剤(カーボ
ンブラツク)の、第2表に示す所定量を配合した
後、外径8インチの2本ロールを用い、70〜80℃
で5分間混合し、成形材料組成物を作つた。
The present invention relates to an epoxy resin composition that provides a cured product having a low modulus of elasticity, a low coefficient of expansion, and a high glass transition point. In recent years, in the field of electronic components, as the size and weight of electronic components have been reduced and reliability has increased, there has been a trend towards increasing the size of semiconductor element pellets and increasing their functionality by combining active and passive elements. Therefore, coating materials and molding materials for semiconductor devices are required to have well-balanced properties such as heat resistance, flexibility (crack resistance), and moisture resistance. At the same time, there is a strong demand for a material that causes less stress on the insert even when directly molded onto an element. Conventionally, materials such as epoxy-based, silicone-based, phenol-based, and diallyl phthalate-based materials have been used as molding resins for electronic components such as semiconductors and electrical equipment. Among these, epoxy resin compositions using phenol novolac resin as a curing agent are superior in that adhesiveness to inserts, electrical properties, etc. are relatively balanced, and have become the mainstream resin for molding. However, if this type of resin composition is directly molded with the resin without applying a highly flexible protective coat to the element pellet, the element pellet may crack or the bonding wires may be cut. Failures caused by stress on the mold resin inserts are observed. Furthermore, when a flexibilizing agent or the like is added to the resin as a countermeasure to this problem, it is difficult to meet the targets of heat resistance and moisture resistance required for a semiconductor element molding material. That is, when a flexibilizing agent is added to an epoxy resin composition using a phenol resin as a curing agent, the glass transition point of the cured resin drops rapidly, and the electrical properties in a high temperature region are accordingly reduced. It is difficult to obtain highly reliable semiconductor molded products. On the other hand, silicone-based materials have a low elastic modulus and a high glass transition temperature, and even if they are directly molded, no cracks will occur in the element pellets. However, this material has problems such as low adhesion to metal inserts (frame parts, etc.) and high moisture permeability, and the molded product lacks reliability in terms of moisture resistance. The present invention was made in view of the above-mentioned circumstances, and its objectives are to provide a material with a low elastic modulus, a low coefficient of linear expansion, and a high glass transition point, specifically,
2.0×10 5 Kg/cm 2 (room temperature), 3.0×10 -5 (℃ -1 ), and cures to a resin with properties of 150℃ or higher, with an excellent balance of heat resistance, crack resistance, and moisture resistance. An object of the present invention is to provide an epoxy resin composition. The features of the present invention are as follows: [A] A polyfunctional epoxy compound [B] (a) A reaction product of an ethylenically unsaturated dicarboxylic acid anhydride or its functional derivative, (b) a polyamine, and [C] A silicone compound, preferably an organopolysiloxane compound [D] contains an inorganic filler, the content volume % of the inorganic filler [D] is 100D/A+
B+C+D is in the range of 40-75. Next, in the present invention, as the polyfunctional epoxy compound (B), for example, diglycidyl ether of bisphenol A, butadiene diepoxide, 3-4-
Epoxycyclohexylmethyl-(3,4-epoxy)cyclohexanecarboxylate, vinylcyclohexane dioxide, 4,4'-di(1,2
-epoxyethyl)diphenyl ether, 4.
4′-(1,2-epoxyethyl)biphenyl,
2,2-bis(3,4-epoxycyclohexyl)propane, glycidyl ether of resorcin, diglycidyl ether of phloroglucin, diglycidyl ether of methylphloroglucin, bis-(2,3-epoxycyclohentyl) ether, 2 -(3,4-epoxy)cyclohexane-
5,5-spiro(3,4-epoxy)-cyclohexane-m-dioxane, bis-(3,4-epoxy-6-methylcyclohexyl)adipate,
Bifunctional epoxy compounds such as N・N'-m-phenylenebis(4,5-epoxy-1,2-cyclohexane)dicarboximide, triglycidyl ether of para-aminophenol, polyallyl glycidyl ether, 1,3,5- Tori (1・2
-epoxyethyl)benvin, 2, 2', 4, 4'-
Tri- or higher functional epoxy compounds are used, such as tetraglycidoxybenzophenone, tetraglycidquin tetraphenylethane, polyglycidyl ether of phenol formaldehyde novolac, triglycidyl ether of glycerin, and triglycidyl ether of trimethylolpropane. In the present invention, the reaction product of ethylenically unsaturated dicarboxylic acid anhydride or its functional derivative and polyamine plays an important role in achieving the purpose of generation. Examples of the ethylenically unsaturated dicarboxylic anhydride or its functional derivative include maleic anhydride, various maleic esters, citraconic anhydride, itaconic anhydride, and tetrahydrophthalic anhydride. In addition, in the present invention, the polyamine includes:
For example, metaphenylenediamine, paraphenylenediamine, dianisidine, 2,6-diaminopyridine, 1,4-naphthylenediamine, 1,5-
Naphthylene diamine, 2,6-naphthylene diamine, 4,4'-diaminodiphenylmethane, 4.
4'-diaminodiphenyl ether, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl thioether, 4,4'-diaminodiphenyl ketone, 2,2'-bis[4-(4- aminophenoxy)phenyl]propane, 2,2'-bis[3
-Methyl-4-(4-aminophenoxy)phenyl]propane, 1.1.1.3.3.3-hexafluoro-2.2-bis[4-(4-aminophenoxy)phenyl]propane, 1.1. 1・3・
3,3-hexafluoro-2,2-bis[3,5
Examples thereof include -dibromo-4-(4-aminophenoxy)phenyl]propane and derivatives thereof alkylated to an aromatic nucleus. In addition, as an example of an amine compound containing a cyclohexylene ring, the following general formula [Wherein, R is -CH2- , -CH( CH3 )-, -C
(CH 3 ) 2 -, -S-, -O-, etc.). Specific examples of such diamine compounds include 4,4'-diaminodicyclohexylmethane, 4,4'-diaminodicyclohexylpropane, and 4,4'-diaminodicyclohexyl ether. Also, 1,2,3-triaminobenzene, 1.
2,4-triaminobenzene, 1,3,5-triaminobenzene, 1,2,3,4-tetraaminobenzene, 1,2,3,5-tetraaminobenzene, 1,2,4,5- Examples include tetraaminobenzene, pentaaminobenzene, and hexaaminobenzene. Among the above-mentioned polyamines, it is preferable to use aromatic diamine as the main component in order to obtain a cured product with an excellent balance between heat resistance and flexibility, which are the effects of the present invention. The molten reactant, which plays an important role in achieving the object of the present invention, is a mixture of the above-mentioned amine compound and ethylenically unsaturated dicarboxylic acid anhydride in an amount of less than 0.6 mole of the latter per 1 mole of the former. 90~250
Obtained by melt reaction at ℃ for 10-60 minutes. If the amount of the ethylenically unsaturated dicarboxylic acid anhydride is larger than the above, the melted reaction product will have a relatively high melting point, which will be disadvantageous in terms of workability and fluidity of compositions using this melted reaction product as a raw material. , is not preferable from the viewpoint of imparting heat resistance to the cured product of the present invention. Regarding the blending ratio of the three components described above, [A] polyfunctional epoxy compound, [B] reaction product of ethylenically unsaturated dicarboxylic acid anhydride and polyamine, and [C] silicone compound, 100 weight of component [A] parts, [B] component 20 to 70 parts by weight, [C] component 1 to 60 parts by weight.
It may be used by changing the weight part as appropriate.
If the ratio of component [C] to component [A] exceeds 60 parts by weight, the composition may become uncurable, or even if it is cured, it will be difficult to impart the desired heat resistance. Furthermore, if it is added in an amount of 1 part by weight or less, there is almost no effect of lowering the elastic modulus. On the other hand, the amount of component [B] added to component [A] is as follows:
The amount can be changed as appropriate depending on the purpose and use so that one proton of the amino group of the above-mentioned molten reactant is equivalent, and in normal cases, it is within the range of 20 to 70 parts by weight, but depending on the time and case. It is not particularly limited. In addition, as the silicone compound which is an essential component of the present invention, for example, for one silicon atom,
The ratio of this to the organic group bonded to it is R/Si (where R is a substituted or unsubstituted monovalent hydrocarbon group)
is 1.0 to 1.7, and the content of hydroxyl groups bonded to silicon atoms is at least 0.2% by weight, and the siloxane units constituting this siloxane resin are:
CH3SiO15 , C2H5SiO15 , C6H5SiO15 , _ _
C 8 H 7 SiO 15 , Cl 2 C 6 H 3 SiO 15 ,
Examples include CF 3 CH 2 CH 2 CH 2 SiO 15 , but R/
As long as the Si ratio is in the range of 1.0 to 1.7, its components include ( CH3 ) 2SiO , ( C2H5 ) 2SiO , ( C6H5 ) 2SiO ,
CH 3 (CH 2 =CH)SiO, CH 3 (C 6 H 5 )SiO, C 6 H 5
( CH2 =CH)SiO, C6H5 ( C2H5 ) SiO , CH3
(CF 3 CH 2 CH 2 H 2 ) May contain a structural unit exemplified by SiO. Furthermore, it may contain an alkoxy group such as a methoxy group, an ethoxy group, a propoxy group, a butoxy group, etc. bonded to a silicon atom. Organopolysiloxane resins having such structural units can be produced by selectively blending the corresponding organohalosilanes and alkoxysilanes so that the R/Si ratio is 1.0 to 1.7, and subjecting them to hydrolysis and condensation reactions. It is obtained as having hydroxyl groups fused to a certain amount of silicon atoms. If the content of hydroxyl groups bonded to silicon atoms is too small, curing will be insufficient, so it is necessary to contain at least 0.2% by weight of hydroxyl groups. There is no reason to limit the number of organopolysiloxane resins used to one type, and a mixture of two or more types may be used. By the way, examples of the inorganic filler [D] that plays an important role in achieving the object of the present invention include zircon, silica, fused silica glass, clay,
Alumina, calcium carbonate, quartz glass, glass, asbestos, whiskers, gypsum, magnesite, mica, kaolin, talc, graphite, cement, carbonyl iron, ferrite, lead compounds, molybdenum disulfide, zinc white, titanium white, carbon black , silica sand, wollastonite, glass fiber, glass beads, hydrated alumina, chalk powder, aluminum silicate, titanium oxide, etc., and one or more of these can be used in combination. In the composition of the present invention, the [D] component has the following formula: 100×[D]/[A]+[B]+[C]+[D]=40
~
Contains 75% by volume. If it is less than 40% by volume, the coefficient of linear expansion (α) becomes large and the difference in α from the metal insert becomes large, which is one of the causes of resin cracks and element pellet cracks. Also,
When the amount is more than 75% by volume, the fluidity of the material decreases significantly, making it difficult to mold elements, inserts, etc. Further, a catalyst can be added to the resin composition of the present invention for the purpose of promoting the curing reaction. Such catalysts include, for example, tertiary amines such as triethanolamine, tetramethylbutanediamine, tetramethylpentanediamine, tetramethylhexanediamine, triethylenediamine, dimethylaniline, dimethylaminoethanol,
Examples include oxyalkylamines such as dimethylaminopentanol, amines such as tris(dimethylaminomethyl)phenol, and N-methylmorpholine. Also, cetyltrimethylammonium bromide, cetyltrimethylammonium chloride, dodecyltrimethylammonium iodide, trimethyldodecylammonium chloride, benzyldimethyltetradecylammonium chloride, benzylmethylpalmitylammonium chloride, allyldodecyltrimethylammonium bromide, benzyldimethylstearylammonium bromide , stearyltrimethylammonium chloride, benzyldimethyltetradecylammonium acetate, and other quaternary ammonium salts. Furthermore, 2-undecylimidazole, 2-methylimidazole, 2-ethylimidazole, 2-
Heptadecylimidazole, 2-methyl-4-ethylimidazole, 1-butylimidazole, 1
-Propyl-2-methylimidazole, 1-benzyl-2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-azine- 2
There are imidazoles such as -methylimidazole and 1-azine-2-undecylimidazole. Also, triphenylphosphine tetraphenylborate, triethylamine tetraphenylborate, N-methylmorpholinetetraphenylborate, pyridinetetraphenylborate, 2-ethyl-4-methylimidazoletetraphenylborate, 2-ethyl-1. Kalibol salts such as 4-dimethylimidazole tetraphenylborate are useful. One or more of the above-mentioned catalysts can also be used in combination. In addition, if necessary, known flexibilizers, such as polybutadiene, acrylonitrile rubber, butadiene-acrylonitrile copolymers, styrene rubber, polyvinyl acetals, phenoxy resins, may be used in combination with component [C] of the present invention. , diglycidyl ether of dimer acid, etc. can be used. In addition, depending on the use and purpose, fatty acids such as stearic acid, calcium stearate, zinc stearate, and aluminum stearate, waxes, mold release agents such as silicone oil, epoxy silane, vinyl silane, borane compounds,
Already known coupling agents such as alkoxy titanate compounds, antimony, phosphorus compounds,
Known flame retardants such as halogens and halogen-containing compounds can be used. Examples 1 to 9 4,4'-diaminodiphenylmethane (hereinafter
100 parts by weight of DDM (abbreviated as DDM) were separately collected into six reaction vessels, and heated to 90 to 130°C to melt. Maleic anhydride (hereinafter abbreviated as MA) having the molar ratio shown in Table 1 was added to this mixture while stirring. A yellow reaction insoluble material was immediately produced, but when heating was continued for about 30 minutes at 130 to 200°C, the insoluble material gradually dissolved and a transparent brown reaction material was obtained. Next, using predetermined amounts of these reactants, epoxy novolac (manufactured by Ciba Geigy, ECN1273,
Epoxy equivalent 225; hereinafter abbreviated as ECN1273),
Bisphenol A type epoxy (manufactured by Ciel, E P
1001, epoxy equivalent 475; hereinafter abbreviated as E1001), silicone compound mold release agent (manufactured by Hoechst, Hexist Wax.E, hereinafter abbreviated as Hexist Wax E), coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., epoxy silane KBM403, (hereinafter abbreviated as KBM403),
After blending the filler (fused silica glass powder) and colorant (carbon black) in the prescribed amounts shown in Table 2, the mixture was heated at 70 to 80°C using two rolls with an outer diameter of 8 inches.
The mixture was mixed for 5 minutes to prepare a molding material composition.
【表】【table】
【表】【table】
Claims (1)
またはその官能性誘導体と、 (b) ポリアミンとの反応物、および 〔C〕 オリガノポリシロキサン化合物、 〔D〕 無機質フイラを含有してなり、前記
〔D〕無機質フイラの含有容量%、100D/A+
B+C+Dが40〜75の範囲にあることを特徴と
するエポキシ樹脂組成物。 2 前記成分〔B〕が、芳香族ジアミン1モルに
対し、無水マレイン酸0.6モル未満の比率で両者
を加熱反応させてなる反応物である特許請求の範
囲第1項記載のエポキシ樹脂組成物。[Scope of Claims] 1 [A] Polyfunctional epoxy compound [B] (a) A reaction product of an ethylenically unsaturated dicarboxylic acid anhydride or its functional derivative, (b) a polyamine, and [C] Origano A polysiloxane compound, [D] contains an inorganic filler, the content volume % of the [D] inorganic filler, 100D/A+
An epoxy resin composition characterized in that B+C+D is in the range of 40 to 75. 2. The epoxy resin composition according to claim 1, wherein the component [ B ] is a reaction product obtained by subjecting 1 mol of aromatic diamine to a reaction product of maleic anhydride in a ratio of less than 0.6 mol by heating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7779880A JPS573821A (en) | 1980-06-11 | 1980-06-11 | Epoxy resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7779880A JPS573821A (en) | 1980-06-11 | 1980-06-11 | Epoxy resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS573821A JPS573821A (en) | 1982-01-09 |
JPS621609B2 true JPS621609B2 (en) | 1987-01-14 |
Family
ID=13644010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7779880A Granted JPS573821A (en) | 1980-06-11 | 1980-06-11 | Epoxy resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS573821A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02200601A (en) * | 1989-01-30 | 1990-08-08 | Nozawagumi:Kk | Freezer of zygote, sperm or the like |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5876455A (en) * | 1981-11-02 | 1983-05-09 | Matsushita Electric Works Ltd | Thermosetting resin molding material for sealing and molded electronic parts using the same |
JP2707029B2 (en) * | 1992-08-04 | 1998-01-28 | 信越化学工業株式会社 | Room temperature curable organopolysiloxane composition |
JPH0770408A (en) * | 1994-03-16 | 1995-03-14 | Nitto Denko Corp | Semiconductor device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5364266A (en) * | 1976-11-22 | 1978-06-08 | Shin Etsu Chem Co Ltd | Epoxy-silicone resin compositions |
JPS553412A (en) * | 1978-06-21 | 1980-01-11 | Hitachi Ltd | Epoxy resin composition |
JPS5512124A (en) * | 1978-07-12 | 1980-01-28 | Hitachi Ltd | Thermosetting resin composition |
-
1980
- 1980-06-11 JP JP7779880A patent/JPS573821A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5364266A (en) * | 1976-11-22 | 1978-06-08 | Shin Etsu Chem Co Ltd | Epoxy-silicone resin compositions |
JPS553412A (en) * | 1978-06-21 | 1980-01-11 | Hitachi Ltd | Epoxy resin composition |
JPS5512124A (en) * | 1978-07-12 | 1980-01-28 | Hitachi Ltd | Thermosetting resin composition |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02200601A (en) * | 1989-01-30 | 1990-08-08 | Nozawagumi:Kk | Freezer of zygote, sperm or the like |
Also Published As
Publication number | Publication date |
---|---|
JPS573821A (en) | 1982-01-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH08134179A (en) | Epoxy resin molding material for sealing electronic component and semiconductor device sealed therewith | |
JPS6148544B2 (en) | ||
JPH10298405A (en) | Epoxy resin composition and cured product composite | |
JPS621609B2 (en) | ||
JPS6136854B2 (en) | ||
JP2000248151A (en) | Semiconductor-sealing resin composition and resin-sealed type semiconductor device | |
JPS59197421A (en) | Curable epoxy resin composition | |
JPH09255812A (en) | Resin composition | |
JPH07242799A (en) | Epoxy resin composition for semiconductor sealing | |
JPS62280215A (en) | Epoxy resin composition | |
JPS63226951A (en) | Resin sealed semiconductor device | |
JPS62187721A (en) | Epoxy resin composition | |
JPS62184012A (en) | Heat-resistant resin composition | |
JPH06256364A (en) | Organic silicon compound, its production and resin composition containing the same | |
JP2560469B2 (en) | Epoxy resin composition | |
JPH06102750B2 (en) | Epoxy resin composition and cured product thereof | |
JPS5887121A (en) | Epoxy resin composition | |
JPS62132916A (en) | Thermosetting resin composition | |
JP3353847B2 (en) | Resin sealing resin composition and resin sealing type semiconductor device | |
JPH03119049A (en) | Resin composition | |
JPS614721A (en) | Epoxy resin composition | |
JPS6369255A (en) | Semiconductor device | |
JPS6159328B2 (en) | ||
JPH02302426A (en) | Epoxy resin composition | |
JPH0528243B2 (en) |