JPS6136854B2 - - Google Patents
Info
- Publication number
- JPS6136854B2 JPS6136854B2 JP6955280A JP6955280A JPS6136854B2 JP S6136854 B2 JPS6136854 B2 JP S6136854B2 JP 6955280 A JP6955280 A JP 6955280A JP 6955280 A JP6955280 A JP 6955280A JP S6136854 B2 JPS6136854 B2 JP S6136854B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- weight
- component
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003822 epoxy resin Substances 0.000 claims description 30
- 229920000647 polyepoxide Polymers 0.000 claims description 30
- 150000001875 compounds Chemical class 0.000 claims description 27
- 239000000203 mixture Substances 0.000 claims description 22
- 239000004593 Epoxy Substances 0.000 claims description 18
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 14
- 229920000768 polyamine Polymers 0.000 claims description 14
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 12
- 239000007795 chemical reaction product Substances 0.000 claims description 8
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 8
- 239000011256 inorganic filler Substances 0.000 claims description 7
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 7
- 229920003986 novolac Polymers 0.000 claims description 5
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 3
- 150000004984 aromatic diamines Chemical class 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 239000000047 product Substances 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- -1 1,2 -Epoxyethyl Chemical group 0.000 description 8
- 230000009477 glass transition Effects 0.000 description 8
- 238000002156 mixing Methods 0.000 description 7
- 239000000376 reactant Substances 0.000 description 6
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 239000008188 pellet Substances 0.000 description 5
- 239000011342 resin composition Substances 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000005062 Polybutadiene Substances 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920002857 polybutadiene Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- JSYBAZQQYCNZJE-UHFFFAOYSA-N benzene-1,2,4-triamine Chemical compound NC1=CC=C(N)C(N)=C1 JSYBAZQQYCNZJE-UHFFFAOYSA-N 0.000 description 2
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- DDHYZBVBQZYMTO-UHFFFAOYSA-N 1-(dimethylamino)pentan-1-ol Chemical compound CCCCC(O)N(C)C DDHYZBVBQZYMTO-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- MCMFEZDRQOJKMN-UHFFFAOYSA-N 1-butylimidazole Chemical compound CCCCN1C=CN=C1 MCMFEZDRQOJKMN-UHFFFAOYSA-N 0.000 description 1
- AXFVIWBTKYFOCY-UHFFFAOYSA-N 1-n,1-n,3-n,3-n-tetramethylbutane-1,3-diamine Chemical compound CN(C)C(C)CCN(C)C AXFVIWBTKYFOCY-UHFFFAOYSA-N 0.000 description 1
- JOIOCLWIPAKKFA-UHFFFAOYSA-N 18-phenyloctadecylazanium;chloride Chemical compound [Cl-].[NH3+]CCCCCCCCCCCCCCCCCCC1=CC=CC=C1 JOIOCLWIPAKKFA-UHFFFAOYSA-N 0.000 description 1
- BPHYZRNTQNPLFI-UHFFFAOYSA-N 2,4,6-trihydroxytoluene Chemical compound CC1=C(O)C=C(O)C=C1O BPHYZRNTQNPLFI-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- NZHNJOJQMPJLFA-UHFFFAOYSA-N 2-[3,5-bis(oxiran-2-yl)phenyl]oxirane Chemical compound C1OC1C1=CC(C2OC2)=CC(C2OC2)=C1 NZHNJOJQMPJLFA-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- SIQHSJOKAUDDLN-UHFFFAOYSA-N 2-methyl-1-propylimidazole Chemical compound CCCN1C=CN=C1C SIQHSJOKAUDDLN-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- WMNWJTDAUWBXFJ-UHFFFAOYSA-N 3,3,4-trimethylheptane-2,2-diamine Chemical compound CCCC(C)C(C)(C)C(C)(N)N WMNWJTDAUWBXFJ-UHFFFAOYSA-N 0.000 description 1
- YJCSUBLMBRTUOX-UHFFFAOYSA-N 3,3,4-trimethylhexane-2,2-diamine Chemical compound CCC(C)C(C)(C)C(C)(N)N YJCSUBLMBRTUOX-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- WLDMPODMCFGWAA-UHFFFAOYSA-N 3a,4,5,6,7,7a-hexahydroisoindole-1,3-dione Chemical compound C1CCCC2C(=O)NC(=O)C21 WLDMPODMCFGWAA-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- HVMHLMJYHBAOPL-UHFFFAOYSA-N 4-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)propan-2-yl]-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2OC2CC1C(C)(C)C1CC2OC2CC1 HVMHLMJYHBAOPL-UHFFFAOYSA-N 0.000 description 1
- RIAHASMJDOMQER-UHFFFAOYSA-N 5-ethyl-2-methyl-1h-imidazole Chemical compound CCC1=CN=C(C)N1 RIAHASMJDOMQER-UHFFFAOYSA-N 0.000 description 1
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- ADAHGVUHKDNLEB-UHFFFAOYSA-N Bis(2,3-epoxycyclopentyl)ether Chemical compound C1CC2OC2C1OC1CCC2OC21 ADAHGVUHKDNLEB-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- ZFIVKAOQEXOYFY-UHFFFAOYSA-N Diepoxybutane Chemical compound C1OC1C1OC1 ZFIVKAOQEXOYFY-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- OWSZUKMVEBFJMZ-UHFFFAOYSA-N benzene-1,2,3,4,5,6-hexamine Chemical compound NC1=C(N)C(N)=C(N)C(N)=C1N OWSZUKMVEBFJMZ-UHFFFAOYSA-N 0.000 description 1
- YAEGJXCMJSSJQT-UHFFFAOYSA-N benzene-1,2,3,4,5-pentamine Chemical compound NC1=CC(N)=C(N)C(N)=C1N YAEGJXCMJSSJQT-UHFFFAOYSA-N 0.000 description 1
- KAMGOKSXKBHPHL-UHFFFAOYSA-N benzene-1,2,3,4-tetramine Chemical compound NC1=CC=C(N)C(N)=C1N KAMGOKSXKBHPHL-UHFFFAOYSA-N 0.000 description 1
- VVWINCXZUPKZBK-UHFFFAOYSA-N benzene-1,2,3,5-tetramine Chemical compound NC1=CC(N)=C(N)C(N)=C1 VVWINCXZUPKZBK-UHFFFAOYSA-N 0.000 description 1
- RUOKPLVTMFHRJE-UHFFFAOYSA-N benzene-1,2,3-triamine Chemical compound NC1=CC=CC(N)=C1N RUOKPLVTMFHRJE-UHFFFAOYSA-N 0.000 description 1
- ANUAIBBBDSEVKN-UHFFFAOYSA-N benzene-1,2,4,5-tetramine Chemical compound NC1=CC(N)=C(N)C=C1N ANUAIBBBDSEVKN-UHFFFAOYSA-N 0.000 description 1
- RPHKINMPYFJSCF-UHFFFAOYSA-N benzene-1,3,5-triamine Chemical compound NC1=CC(N)=CC(N)=C1 RPHKINMPYFJSCF-UHFFFAOYSA-N 0.000 description 1
- VZWMKHUMEIECPK-UHFFFAOYSA-M benzyl-dimethyl-octadecylazanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 VZWMKHUMEIECPK-UHFFFAOYSA-M 0.000 description 1
- AFBPHRMRBXPVPX-UHFFFAOYSA-M benzyl-dimethyl-tetradecylazanium;acetate Chemical compound CC([O-])=O.CCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 AFBPHRMRBXPVPX-UHFFFAOYSA-M 0.000 description 1
- OCBHHZMJRVXXQK-UHFFFAOYSA-M benzyl-dimethyl-tetradecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 OCBHHZMJRVXXQK-UHFFFAOYSA-M 0.000 description 1
- GLROGUSVUGSGPO-UHFFFAOYSA-N bis(3-methyl-7-oxabicyclo[4.1.0]heptan-4-yl) hexanedioate Chemical compound C1C2OC2CC(C)C1OC(=O)CCCCC(=O)OC1CC2OC2CC1C GLROGUSVUGSGPO-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- UORVGPXVDQYIDP-BJUDXGSMSA-N borane Chemical class [10BH3] UORVGPXVDQYIDP-BJUDXGSMSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000019241 carbon black Nutrition 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- YIFWXQBNRQNUON-UHFFFAOYSA-M dodecyl(trimethyl)azanium;iodide Chemical compound [I-].CCCCCCCCCCCC[N+](C)(C)C YIFWXQBNRQNUON-UHFFFAOYSA-M 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- LDLDYFCCDKENPD-UHFFFAOYSA-N ethenylcyclohexane Chemical compound C=CC1CCCCC1 LDLDYFCCDKENPD-UHFFFAOYSA-N 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 150000002611 lead compounds Chemical class 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 235000014380 magnesium carbonate Nutrition 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- OKBVMLGZPNDWJK-UHFFFAOYSA-N naphthalene-1,4-diamine Chemical compound C1=CC=C2C(N)=CC=C(N)C2=C1 OKBVMLGZPNDWJK-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- MDCWDBMBZLORER-UHFFFAOYSA-N triphenyl borate Chemical compound C=1C=CC=CC=1OB(OC=1C=CC=CC=1)OC1=CC=CC=C1 MDCWDBMBZLORER-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Description
本発明はエポキシ樹脂組成物に関し、特に、低
弾性率でしかも低膨張率かつ高ガラス転移点を有
する硬化物を生成しうるエポキシ樹脂組成物に関
する。
近年、電子部品の分野においては、小型軽量化
及び高信頼性化に伴い、半導体素子ベレツトの大
型化ならびに能動素子及び受動素子の複合等によ
る多機能化が指向されている。そのため、各種素
子モールド用樹脂材料としては、直接モールドし
てもインサートに対する応力の影響が小さいとい
う特性が強く要求されている。
従来、半導体等の電子部品及び電気機器のモー
ルド用樹脂としては、エポキシ系、シリコーン
系、フエノール系及びジアリルフタレート系等の
材料が使用されてきた。
その中でも、フエノールノボラツク樹脂を硬化
剤として用いたエポキシ樹脂組成物が、インサー
トに対する接着性及び電気特性等が調和されてい
る点で優れ、これがモールド用樹脂の主流となつ
ている。
しかし、この系統の樹脂組成物には、素子ペレ
ツトに可撓性保護コートを施すことなく直接該樹
脂でモールドすると、素子ペレツトに割れを生じ
たリボンデイング線が切断される等、モールド樹
脂のインサートに対する応力に起因する障害がみ
られる。その対策として、インサートに及ぼす応
力を低減させることが重要であつて、低弾性率で
低膨張率及び高ガラス転移点を有するモールド樹
脂の開発が必要である。
モールド用樹脂を低弾性率化する手段の一つと
して可撓化剤の添加が考えられる。しかし、フエ
ノール樹脂を硬化剤とするエポキシ樹脂組成物に
この方法を採用すると、硬化樹脂のガラス転移点
が急激に降下し、それに伴つて高温領域における
電気特性が低下するため、信頼性の高いモールド
製品を得ることが困難である。
一方、シリコーン系材料は低い弾性率及び高い
ガラス転移点を有し、これを用いて直接モールド
しても素子ペレツトに割れは生じない。しかし、
この材料は、インサートの接着性が低い及び透質
性が大きい等の問題があり、そのモールド製品は
耐湿性の面で信頼性に欠ける。
本発明はこのような現状に鑑みてなされたもの
であり、その目的は、従来技術の欠点を解消し、
低弾性率、低膨張率及び高ガラス転移点を有する
硬化物を生成しうるエポキシ樹脂組成物を提供す
ることである。
本発明につき概説すれば、本発明のエポキシ樹
脂組成物は、(a)多官能性エポキシ化合物、(b)ブタ
ジエン系低分子量重合体、(c)エチレン性不飽和ジ
カルボン酸又はその反応性誘導体とポリアミン化
合物との反応物及び(d)無機充填剤を含有し、かつ
該無機充填剤の含有量が上記4成分の合計容量に
対し約40〜70容量%であることを特徴とするもの
である。
本発明における多官能性エポキシ化合物(a)とし
ては、例えばビスフエノールAのグリシジルエー
テル、ブタジエンジエポキサイド、3,4―エポ
キシシクロヘキシルメチル―(3,4―エポキ
シ)シクロヘキサンカルボキシレート、ビニルシ
クロヘキサンジオキサイド、4,4′―ジ(1,2
―エポキシエチル)ジフエニルエーテル、2,2
―ビス―(3,4―エポキシシクロヘキシル)プ
ロパン、レゾルシンのグリシジルエーテル、フロ
ログルシンのジグリシジルエーテル、メチルフロ
ログルシンのジグリシジルエーテル、ビス―
(2,3―エポキシシクロペンチル)エーテル、
2―(3,4―エポキシ)シクロヘキサン―5,
5―スピロ(3,4―エポキシ)シクロヘキサン
―m―ジオキサン、ビス―(3,4―エポキシ―
6―メチルシクロヘキシル)アジペート及びN,
N′―m―フエニレンビス―(4.5―エポキシ―1.2
―シクロヘキサンジカルボキシイミド等の二官能
性エポキシ化合物、パラアミノフエノールのトリ
グリシジルエーテル、ポリアリルグリシジルエー
テル、1,3,5―トリー(1,2―エポキシエ
チル)ベンゼン、2,2′4,4′―テトラグリシド
キシベンゾフエノン、テトラグリシドキシテトラ
フエニルエタン、フエノールホルムアルデヒドノ
ポラツクのポリグリシジルエーテル、グリセリン
のトリグリシジルエーテル及びトリメチロールプ
ロパンのトリグリシジルエーテル等の三官能以上
の多官能性エポキシ化合物及びこれらの2種以上
の混合物を適用することができる。
又、本発明におけるブタジエン系低分子量重合
体bとしては、分子量約300〜10000の1.2―ポリ
ブタジエン、1,3―ポリブタジエン及び1,4
―ポリブタジエン並びにブタジエン―スチレン共
重合体及びブタジエン―アクリロニトリル共重合
体、そして更に未端に反応性基としてカルポキシ
ル基、水酸基、アミノ基及びビニル基等を有する
それらの重合体等を挙げることができ、これら
は、日本曹達社、宇部興産社及び三井ポリケミカ
ル社等より市販されている。
本発明においては、エチレン性不飽和ジカルボ
ン酸又はその反応性誘導体とポリアミン化合物と
の反応物cが、本発明の目的達成のため重要な働
きをする。
本発明におけるエチレン性不飽和ジカルボン酸
又はその反応性誘導体としては、例えば無水マレ
イン酸、各種のマレイン酸エステル、無水シトラ
コン酸、無水イタコン酸及び無水テトラヒドロフ
タル酸等を適用することができる。
又、本発明におけるポリアミン化合物として
は、芳香族又は脂環式ポリアミン化合物が使用さ
れる。芳香族ポリアミン化合物としては、例えば
メタフエニレンジアミン、パラフエニレンジアミ
ン、ジアニシジン、2,6―ジアミノピリジン、
1,4―ナフチレンジアミン、1,5―ナフチレ
ンジアミン、2,6―ナフチレンジアミン、4,
4′―ジアミノジフエニルメタン、4,4′―ジアミ
ノジフエニルエーテル、4,4′―ジアミノジフエ
ニルプロパン、4,4′―ジアミノジフエニルチオ
エーテル及び4,4′―ジアミノジフエニルケトン
等を適用することができ、又、これらの化合物の
芳香族核へのアルキル置換誘導体等を使用するこ
ともできる。更に又、1,2,3―トリアミノベ
ンゼン、1,2,4―トリアミノベンゼン、1,
3,5―トリアミノベンゼン、1,2,3,4―
テトラアミノベンゼン、1,2,3,5―テトラ
アミノベンゼン、1,2,4,5―テトラアミノ
ベンゼン、ペンタアミノベンゼン及びヘキサアミ
ノベンゼン等のような芳香族ポリアミン化合物も
使用することができる。これらのポリアミン化合
物のうち、芳香族ジアミンを主成分とする化合物
が、耐熱性の優れた硬化物を得る上で特に望まし
い。
又、脂環式ポリアミン化合物例えばシクロヘキ
シル環を含むポリアミン化合物としては、例えば
一般式
(式中、Rは―CH2―、―CH(CH3)2、―C
(CH3)2―、―S―及び―O―等の基を示す)で
表わされるジアミン刈合物を適用することがで
き、その具体例として、4,4′―ジアミノシクロ
ヘキシルメタン、4,4′―ジアミノジシクロヘキ
シルプロパン及び4,4′―ジアミノジシクロヘキ
シルエーテル等を挙げることができる。
本発明における上記ポリアミン化合物とエチレ
ン性不飽和ジカルボン酸又はその反応性誘導体と
の反応物は、前者のアミノ基1個に対し後者のカ
ルボキシル基約0.05〜0.5個の範囲内の割合で配
合し、約90〜200℃で約10〜60分間溶融反応させ
ることによつて得られる。エチレン性不飽和ジカ
ルボン酸の量がこの範囲を越えると反応物は融点
が比較的高くなつて作業性及び樹脂組成物の流動
性の点で不利となり、又、上記範囲未満では硬化
物の特性が低下して望ましくない。
前記多官能性エポキシ化合物(a)、ブタジエン系
低分子量重合体b及びエチレン性不飽和ジカルボ
ン酸又はその反応性誘導体とポリアミン化合物と
の溶融反応物(c)の3成分の配合割合は、(a)成分
100重量部に対して(b)成分約1〜50重量部、(c)成
分約20〜70重量部の範囲内とすることが適当であ
る。(a)成分に対する(b)成分の配合割合が約50重量
部を縁えると、樹脂組成物の硬化性が失なわれ、
又、硬化としても目的とする良好な耐熱性を付与
することが困難となる。又、それが約1重量部以
下は、低弾性率化の効果は殆んどなくなる。
又、(a)、(b)成分の配合割合については、例えば
(a)成分としてノボラツク型エポキシ樹脂とビスフ
エノールA型エポキシ樹脂を混合して用いる場
合、(a)成分であるノボラツク型エポキシ樹脂約20
〜90重量部、同じくビスフエノールA型エポキシ
樹脂約5〜40重量部及び(b)成分約5〜40重量部の
配合割合とすることが適当である。
一方、(a)成分に対する(c)成分の配合割合は、(a)
成分であるエポキシ化合物のエポキシ基1個に対
し、(c)成分であるポリアミン化合物のアミノ基の
プロトン1個が当量となるように適宜変化させる
ことができ、通常の場合、(a)成分100重量部に対
し約20〜70重量部の範囲内とすることが適当であ
るが、この量に特に限定されるものではない。
本発明における必須成分である無機質充填剤(d)
としては、例えば酸化ジルコン、シリカ、溶融石
英ガラス、クレー、アルミナ、水酸化アルミニウ
ム、炭酸カルシウム、石英ガラス、ガラス、アス
ベスト、ホイスカ、石コウ、マグネサイト、マイ
カ、カオリン、タルク、黒鉛、セメント、鉄カル
ボニル、フエライト、二酸化鉛のような鉛化合
物、二硫化モリブデン、亜鉛華、チタン白、カー
ボンブラツク、珪砂及びウオラストナイト等があ
り、これらは2種以上併用することができる。
この(d)成分は、上記(a)、(b)、(c)及び(d)の4成分
の合計容量に対し約40〜70容量%の割合で配合さ
れる。これが約40容量%未満であると線膨張率が
大となつてレジンクラツク及びペレツトクラツク
発生の原因となる。又、これが約75容量%を越
えると、樹脂組成物の流動性が著しく低下し、素
子及びインサート等のモールドが因難となる。
又、本発明においては、多官能性エポキシ化合
物の硬化反応を促進する目的で各種の触媒を添加
することができ、この触媒としては、例えばトリ
エタノールアミン、テトラメチルプタンジアミ
ン、テトラメチルペンタンジアミン、テトラメチ
ルヘキサンジアミン、トリエチレンジアミン及び
ジメチルアニリン等の第3級アミン、ジメチルア
ミノエタノール及びジメチルアミノペンタノール
等のオキシアルキルアミンならびにトリス(ジメ
チルアミノメチル)フエノール及びメチルモルホ
リン等のアミン類を適用することができる。
又、同じ目的で、触媒として、例えばセチルト
リメチルアンモニウムプロマイド、セチルトリメ
チルアンモニウムクロライド、ドデシルトリメチ
ルアンモニウムアイオダイド、トリメチルドデシ
ルアンモニウムクロライド、ベンジルジメチルテ
トラデシルアンモニウムクロライド、ベンジルメ
チルパルミチルアンモニウムクロライド、アリル
ドデシルトリメチルアンモニウムプロマイド、ベ
ンジルジメチルステアリルアンモニウムブロマイ
ド、ステアリルトリメチルアンモニウムクロライ
ド及びベンジルジメチルテトラデシルアンモニウ
ムアセテート等の第4級アンモニウム塩を適用す
ることができ、更には、2―ウンデシルイミダゾ
ール、2―メチルイミダゾール、2―エチルイミ
ダゾール、2―ヘプタデシルイミダゾール、2―
メチル―4―エチルイミダゾール、1―ブチルイ
ミダゾール、1―プロピル―2―メチルイミダゾ
ール、1―ベンジル―2―メチルイミダゾール、
1―シアノエチル―2―メチルイミダゾール、1
―シアノエチル―2―ウンデシルイミダゾール、
1―シアノエチル―2―フエニルイミダゾール、
1―アジン―2―メチルイミダゾール及び1―ア
ジン―2―ウンデシルイミダゾール等のイミダゾ
ール化合物あるいは又、トリフエニルホスフイン
テトラフエニルボレート、トリエチルアミンテト
ラフエニルボレート、N―メチルモルホリンテト
ラフエニルボレート、ピリジンテトラフエニルボ
レート2―エチル―4―メチルイミダゾールテト
ラフエニルボレート及び2―エチル―1.4ジメチ
ルイミダゾールテトラフエニルボレート等のテト
ラフエニルボロン塩等が有用である。
上記の触媒はその2種以上を併用することがで
きる。
又、本発明においては、その用途、使用目的に
応じて、脂肪酸及びワツクス類等の離型剤、エポ
キシシラン、ビニルシラン、ボラン系化合物及び
アルコキシチタネート系化合物等の既知のカツプ
リング剤、そして更には、アンチモン、リン化合
物及びハロゲンならびにハロゲン含有化合物等の
既知の難燃剤を使用することができる。
上記各成分は、ロール、ニーダー、コニーダー
及びヘンシエルミキサー等を用いて加熱(70〜80
℃)混練することにより配合される。又、各成分
がすべて固体である場合には、微粉化した後混合
するドライブレンド法を採用してもよい。
本発明のエポキシ樹脂組成物は、その硬化によ
り、低曲げ弾性率(室温で約2.0×105Kg/cm2以
下)、低線膨張率(約3.0×1.0-5℃-1以下)、高ガ
ラス転移点(約150℃以上)の特性を有する樹脂
硬化物を提供することができる。
以下、本発明及びその効果を実施例により説明
するが、本発明はこれらによりなんら限定される
ものではない。
実施例1〜13及び比較例1〜4
(i) 前記(c)成分の調製
4,4′―ジアミノジフエニルメタン(以下
DDMと略称する)の所定量を100〜130℃で加
熱溶融し、これに下記第1表に示す割合(モル
比)で無水マレイン酸(以下MAと略称する)
をそれぞれ添加し、撹拌下に反応させた。間も
なく発泡が始まり、反応系の温度は160〜200℃
に達した。30分余り反応させ、発泡が実質的に
終つたところで放冷し、4種類のDDM―MA溶
融反応物を得た。なお、得られた反応物はいず
れも透明であつた。反応物の性状を下記第1表
に示す。
The present invention relates to an epoxy resin composition, and particularly to an epoxy resin composition capable of producing a cured product having a low modulus of elasticity, a low coefficient of expansion, and a high glass transition point. In recent years, in the field of electronic components, as the size and weight of electronic components have been reduced and reliability has increased, there has been a trend toward larger semiconductor element pellets and multifunctionality by combining active and passive elements. Therefore, there is a strong demand for resin materials for various device molds to have the property that the effect of stress on the insert is small even when directly molded. Conventionally, epoxy-based, silicone-based, phenol-based, diallyl phthalate-based materials, and the like have been used as molding resins for electronic components such as semiconductors and electrical equipment. Among these, epoxy resin compositions using phenol novolac resin as a curing agent are superior in that they have well-balanced adhesion to inserts, electrical properties, etc., and have become the mainstream resin for molding. However, if this type of resin composition is directly molded with the resin without applying a flexible protective coat to the element pellet, the ribbon cutting line that causes cracks in the element pellet will be cut, etc. Failures caused by stress are observed. As a countermeasure, it is important to reduce the stress exerted on the insert, and it is necessary to develop a molding resin that has a low modulus of elasticity, a low coefficient of expansion, and a high glass transition temperature. Addition of a flexibilizing agent may be considered as one means of lowering the modulus of elasticity of the molding resin. However, if this method is applied to epoxy resin compositions that use phenolic resin as a curing agent, the glass transition point of the cured resin will drop rapidly, and the electrical properties in high-temperature regions will decrease accordingly, resulting in a highly reliable mold. It is difficult to obtain the product. On the other hand, silicone-based materials have a low elastic modulus and a high glass transition temperature, and even when directly molded using silicone-based materials, no cracks occur in the element pellets. but,
This material has problems such as low insert adhesion and high transparency, and its molded products are unreliable in terms of moisture resistance. The present invention has been made in view of the current situation, and its purpose is to eliminate the drawbacks of the prior art,
An object of the present invention is to provide an epoxy resin composition capable of producing a cured product having a low modulus of elasticity, a low coefficient of expansion, and a high glass transition point. To summarize the present invention, the epoxy resin composition of the present invention comprises (a) a polyfunctional epoxy compound, (b) a butadiene-based low molecular weight polymer, and (c) an ethylenically unsaturated dicarboxylic acid or a reactive derivative thereof. It contains a reactant with a polyamine compound and (d) an inorganic filler, and the content of the inorganic filler is about 40 to 70% by volume based on the total volume of the above four components. . Examples of the polyfunctional epoxy compound (a) in the present invention include glycidyl ether of bisphenol A, butadiene diepoxide, 3,4-epoxycyclohexylmethyl-(3,4-epoxy)cyclohexanecarboxylate, vinylcyclohexane dioxide, 4,4′-di(1,2
-Epoxyethyl) diphenyl ether, 2,2
-Bis-(3,4-epoxycyclohexyl)propane, glycidyl ether of resorcinol, diglycidyl ether of phloroglucin, diglycidyl ether of methylphloroglucin, bis-
(2,3-epoxycyclopentyl)ether,
2-(3,4-epoxy)cyclohexane-5,
5-spiro(3,4-epoxy)cyclohexane-m-dioxane, bis-(3,4-epoxy-
6-methylcyclohexyl) adipate and N,
N′-m-phenylene bis-(4.5-epoxy-1.2
-Difunctional epoxy compounds such as cyclohexanedicarboximide, triglycidyl ether of para-aminophenol, polyallyl glycidyl ether, 1,3,5-tri(1,2-epoxyethyl)benzene, 2,2'4,4' - Tri- or higher-functional polyfunctional epoxy compounds such as tetraglycidoxybenzophenone, tetraglycidoxytetraphenylethane, polyglycidyl ether of phenol formaldehyde nopolac, triglycidyl ether of glycerin, and triglycidyl ether of trimethylolpropane. And mixtures of two or more of these can be applied. In addition, as the butadiene-based low molecular weight polymer b in the present invention, 1,2-polybutadiene, 1,3-polybutadiene and 1,4-polybutadiene having a molecular weight of about 300 to 10,000 are used.
-Polybutadiene, butadiene-styrene copolymers, butadiene-acrylonitrile copolymers, and furthermore, their polymers having carpoxyl groups, hydroxyl groups, amino groups, vinyl groups, etc. as reactive groups, etc. These are commercially available from Nippon Soda Co., Ltd., Ube Industries Co., Ltd., Mitsui Polychemical Co., Ltd., and others. In the present invention, the reaction product c of an ethylenically unsaturated dicarboxylic acid or its reactive derivative and a polyamine compound plays an important role in achieving the object of the present invention. As the ethylenically unsaturated dicarboxylic acid or its reactive derivative in the present invention, for example, maleic anhydride, various maleic acid esters, citraconic anhydride, itaconic anhydride, tetrahydrophthalic anhydride, etc. can be applied. Further, as the polyamine compound in the present invention, an aromatic or alicyclic polyamine compound is used. Examples of aromatic polyamine compounds include metaphenylenediamine, paraphenylenediamine, dianisidine, 2,6-diaminopyridine,
1,4-naphthylene diamine, 1,5-naphthylene diamine, 2,6-naphthylene diamine, 4,
4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl thioether, 4,4'-diaminodiphenyl ketone, etc. are applied. It is also possible to use derivatives of these compounds in which the aromatic nucleus is substituted with alkyl. Furthermore, 1,2,3-triaminobenzene, 1,2,4-triaminobenzene, 1,
3,5-triaminobenzene, 1,2,3,4-
Aromatic polyamine compounds such as tetraaminobenzene, 1,2,3,5-tetraaminobenzene, 1,2,4,5-tetraaminobenzene, pentaaminobenzene, hexaaminobenzene, and the like can also be used. Among these polyamine compounds, compounds containing aromatic diamine as a main component are particularly desirable in terms of obtaining a cured product with excellent heat resistance. In addition, as alicyclic polyamine compounds such as polyamine compounds containing a cyclohexyl ring, for example, the general formula (In the formula, R is -CH 2 -, -CH(CH 3 ) 2 , -C
(CH 3 ) 2 -, -S-, -O-, etc.) can be applied, and specific examples thereof include 4,4'-diaminocyclohexylmethane, 4, Examples include 4'-diaminodicyclohexylpropane and 4,4'-diaminodicyclohexyl ether. In the present invention, the reaction product of the polyamine compound and the ethylenically unsaturated dicarboxylic acid or its reactive derivative is blended in a ratio within the range of about 0.05 to 0.5 carboxyl group of the latter to one amino group of the former, It is obtained by a melt reaction at about 90 to 200°C for about 10 to 60 minutes. If the amount of ethylenically unsaturated dicarboxylic acid exceeds this range, the melting point of the reactant will be relatively high, which will be disadvantageous in terms of workability and fluidity of the resin composition, and if it is less than the above range, the properties of the cured product will deteriorate. Degraded and undesirable. The blending ratio of the three components, the polyfunctional epoxy compound (a), the butadiene-based low molecular weight polymer b, and the melt reaction product (c) of the ethylenically unsaturated dicarboxylic acid or its reactive derivative and the polyamine compound, is (a) )component
It is appropriate that the amount of component (b) is about 1 to 50 parts by weight and the amount of component (c) is about 20 to 70 parts by weight per 100 parts by weight. When the blending ratio of component (b) to component (a) exceeds about 50 parts by weight, the curability of the resin composition is lost;
Moreover, even when curing, it becomes difficult to impart the desired good heat resistance. Moreover, if it is less than about 1 part by weight, the effect of lowering the elastic modulus is almost lost. Also, regarding the blending ratio of components (a) and (b), for example,
When using a mixture of novolac type epoxy resin and bisphenol A type epoxy resin as component (a), approximately 20% of the novolac type epoxy resin as component (a) is used.
It is suitable that the blending ratio is about 90 parts by weight, about 5 to 40 parts by weight of the bisphenol A type epoxy resin, and about 5 to 40 parts by weight of component (b). On the other hand, the blending ratio of component (c) to component (a) is (a)
The amount can be changed appropriately so that one proton of the amino group of the polyamine compound (c) is equivalent to one epoxy group of the epoxy compound (component), and in normal cases, the amount of component (a) 100 It is suitable to range from about 20 to 70 parts by weight, but there is no particular limitation to this amount. Inorganic filler (d) which is an essential component in the present invention
Examples include zircon oxide, silica, fused silica glass, clay, alumina, aluminum hydroxide, calcium carbonate, quartz glass, glass, asbestos, whisker, gypsum, magnesite, mica, kaolin, talc, graphite, cement, iron. Examples include carbonyl, ferrite, lead compounds such as lead dioxide, molybdenum disulfide, zinc white, titanium white, carbon black, silica sand, and wollastonite, and two or more of these can be used in combination. Component (d) is blended in a proportion of about 40 to 70% by volume based on the total volume of the four components (a), (b), (c) and (d). If this is less than about 40% by volume, the coefficient of linear expansion becomes large, causing resin cracks and pellet cracks. If it exceeds about 75% by volume, the fluidity of the resin composition will be significantly reduced, causing problems in molding elements, inserts, etc. Further, in the present invention, various catalysts can be added for the purpose of promoting the curing reaction of the polyfunctional epoxy compound, and examples of the catalyst include triethanolamine, tetramethylbutanediamine, tetramethylpentanediamine, Tertiary amines such as tetramethylhexanediamine, triethylenediamine and dimethylaniline, oxyalkylamines such as dimethylaminoethanol and dimethylaminopentanol, and amines such as tris(dimethylaminomethyl)phenol and methylmorpholine can be applied. can. For the same purpose, as a catalyst, for example, cetyltrimethylammonium bromide, cetyltrimethylammonium chloride, dodecyltrimethylammonium iodide, trimethyldodecylammonium chloride, benzyldimethyltetradecylammonium chloride, benzylmethylpalmitylammonium chloride, allyldodecyltrimethylammonium bromide , benzyldimethylstearylammonium bromide, stearyltrimethylammonium chloride and benzyldimethyltetradecylammonium acetate, and further quaternary ammonium salts such as 2-undecylimidazole, 2-methylimidazole, 2-ethylimidazole can be applied. , 2-heptadecylimidazole, 2-
Methyl-4-ethylimidazole, 1-butylimidazole, 1-propyl-2-methylimidazole, 1-benzyl-2-methylimidazole,
1-cyanoethyl-2-methylimidazole, 1
-cyanoethyl-2-undecylimidazole,
1-cyanoethyl-2-phenylimidazole,
Imidazole compounds such as 1-azine-2-methylimidazole and 1-azine-2-undecylimidazole, or triphenylphosphine tetraphenylborate, triethylaminetetraphenylborate, N-methylmorpholinetetraphenylborate, pyridinetetra Tetraphenylboron salts such as phenylborate, 2-ethyl-4-methylimidazole tetraphenylborate, and 2-ethyl-1.4dimethylimidazole tetraphenylborate are useful. Two or more of the above catalysts can be used in combination. In addition, in the present invention, depending on the use and purpose of use, mold release agents such as fatty acids and waxes, known coupling agents such as epoxysilane, vinylsilane, borane compounds and alkoxy titanate compounds, and further, Known flame retardants such as antimony, phosphorus compounds and halogens and halogen-containing compounds can be used. Each of the above ingredients is heated (70 to 80
°C) It is blended by kneading. Furthermore, if all the components are solid, a dry blending method may be employed in which the components are pulverized and then mixed. The epoxy resin composition of the present invention has a low flexural modulus (approximately 2.0 × 10 5 Kg/cm 2 or less at room temperature), a low linear expansion coefficient (approximately 3.0 × 1.0 -5 °C or less), and a high A cured resin product having a glass transition point (approximately 150° C. or higher) can be provided. EXAMPLES Hereinafter, the present invention and its effects will be explained with reference to Examples, but the present invention is not limited to these in any way. Examples 1 to 13 and Comparative Examples 1 to 4 (i) Preparation of component (c) 4,4'-diaminodiphenylmethane (hereinafter referred to as
A predetermined amount of DDM (abbreviated as DDM) is heated and melted at 100 to 130°C, and maleic anhydride (hereinafter abbreviated as MA) is added to this in the proportion (molar ratio) shown in Table 1 below.
were added and reacted with stirring. Foaming begins soon, and the temperature of the reaction system is 160-200℃.
reached. The reaction was allowed to proceed for more than 30 minutes, and when foaming was substantially completed, the mixture was allowed to cool to obtain four types of DDM-MA molten reaction products. Note that all of the obtained reaction products were transparent. The properties of the reactants are shown in Table 1 below.
【表】
(ii) エポキシ樹脂組成物の調製
前記(a)成分のエポキシ樹脂として、ノボラツ
ク型エポキシ樹脂(チバ社製、ECN 1273、エ
ポキシ当量:179及びダウケミカル社製、DEN
438、エポキシ当量:179)ならびにビスフエノ
ールA型エポキシ樹脂(シエル社製、EP
1002、エポキシ当量:650)、前記(b)成分のブタ
ジエン系低分子量重合体として、ブタジエン―
アクリロニトリル共重合体(B.F・Goodrich
社製、CTBN1800×8,粘度1250ポイズ、分子
量3500)そして前記(d)成分の無機充填剤とし
て、石英ガラス粉を下記第2表に示す所定の割
合で配合した。これらに、更に離型剤として高
級脂肪酸エステル(ヘキストジヤパン社製、ヘ
キストワツクス―E)1重量部、エポキシシラ
ン系カツプリング剤(信越化学社製、KBM―
403)1重量部、着色剤カーボンブラツク 1
重量部をそれぞれ添加し、これに(c)成分として
上記DDM―MA溶融反応物A〜Dを下記第2表
に示す所定の割合でそれぞれの系に添加した。
これらの配合物をそれぞれ70〜80℃で10分間混
練した後、粉砕して17種のエポキシ樹脂組成物
(この中4種は本発明の範疇外の組成のもの
で、これらを比較例1〜4とした)を調製し
た。
(iii) 硬化物の作成及びその特性試験
上記各エポキシ樹脂組成物を、180℃、70
Kg/cm2、2〜3分の条件でトランスフア成形し
て硬化物(試験片)を作成し、それらの諸特性
の試験を行なつた。得られた結果を下記第2表
に示す。[Table] (ii) Preparation of epoxy resin composition As the epoxy resin for the component (a), novolak type epoxy resin (manufactured by Ciba Corporation, ECN 1273, epoxy equivalent: 179 and DEN, manufactured by Dow Chemical Company) were used.
438, epoxy equivalent: 179) and bisphenol A type epoxy resin (manufactured by Ciel, EP
1002, epoxy equivalent: 650), as the butadiene-based low molecular weight polymer of component (b), butadiene-
Acrylonitrile copolymer (BF/Goodrich
Co., Ltd., CTBN 1800×8, viscosity 1250 poise, molecular weight 3500), and as the inorganic filler of component (d), quartz glass powder was blended in a predetermined ratio shown in Table 2 below. In addition to these, 1 part by weight of a higher fatty acid ester (manufactured by Hoechst Japan Co., Ltd., Hoechst Wax-E) as a mold release agent, and an epoxy silane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., KBM-
403) 1 part by weight, colorant carbon black 1
Parts by weight were added to each system, and the DDM-MA melt reactants A to D as component (c) were added to each system at predetermined ratios shown in Table 2 below.
These formulations were kneaded for 10 minutes at 70 to 80°C, and then ground to obtain 17 types of epoxy resin compositions (4 of these were compositions outside the scope of the present invention, and these were used in Comparative Examples 1 to 1). 4) was prepared. (iii) Preparation of cured product and its characteristic test Each of the above epoxy resin compositions was cured at 180°C and 70°C.
Cured products (test pieces) were prepared by transfer molding at Kg/cm 2 for 2 to 3 minutes, and their various properties were tested. The results obtained are shown in Table 2 below.
【表】【table】
【表】
第2表から明らかなように、本発明のエポキ
シ樹脂組成物より得られる硬化物はいずれも良
好な特性を有しているが、本発明による配合割
合の範疇外のエポキシ樹脂組成物より得れらる
硬化物の特性はいずれも不満足なものであつ
た。
実施例 14〜25
(a)成分のエポキシ樹脂として、前記実施例1の
ECN1273の他に、ビスフエノールA型エポキシ
樹脂(シエル社製、EP 1001、エポキシ当量
475)及びヒダントイン型エポキシ樹脂(チバ・
ガイギー社製、XB―2818、エポキシ当量163)を
使用し、(b)成分のブタジエン系低分子量重合体と
して、下記第3表に示す各種の化合物を使用し、
又、(c)成分の反応物として前記実施例1のDDM
―MA溶融反応物Bを使用し、更に(d)成分の無機
充填剤として溶融石英粉及びシリカ粉を使用し、
下記第3表に示す割合で配合した。なお、これら
には更に離型剤としてステアリン酸2重量部、エ
ポキシシラン系カツプリング剤(信越化学社製、
KBM―403)1重量部及び着色剤としてカーボン
ブラツク1重量部をそれぞれ添加した。これらの
配合物を実施例1と同様にして混練、粉砕して12
種のエポキシ樹脂物を調製し、硬化して試験片を
作成し、諸特性の試験を行なつた。得られた結果
を下記第3表に示す。[Table] As is clear from Table 2, all of the cured products obtained from the epoxy resin composition of the present invention have good properties, but the epoxy resin compositions that are outside the range of the blending ratio according to the present invention The properties of the cured products obtained were unsatisfactory. Examples 14-25 As the epoxy resin of component (a), the epoxy resin of Example 1 above was used.
In addition to ECN1273, bisphenol A type epoxy resin (manufactured by Ciel, E P 1001, epoxy equivalent
475) and hydantoin type epoxy resin (Ciba・
Using XB-2818 (manufactured by Geigy, epoxy equivalent: 163), and using various compounds shown in Table 3 below as the butadiene-based low molecular weight polymer of component (b),
In addition, as the reactant of component (c), DDM of Example 1
-Using MA molten reactant B, and further using fused quartz powder and silica powder as the inorganic filler of component (d),
They were blended in the proportions shown in Table 3 below. Additionally, 2 parts by weight of stearic acid and an epoxysilane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd.,
1 part by weight of KBM-403) and 1 part by weight of carbon black as a coloring agent were added. These blends were kneaded and ground in the same manner as in Example 1 to give 12
A variety of epoxy resin products were prepared and cured to prepare test pieces, and various properties were tested. The results obtained are shown in Table 3 below.
【表】
第3表から明らかなように、本発明の樹脂組成
物より作成した成形品(硬化物)はいずれも良好
な特性を有し、ガラス転移点、曲げ弾性率及びバ
コール硬度共に、それぞれの標準値である150℃
以上、0.8×105Kg/cm2以下及び35以上を十分満足
する値を示している。
以上説明したように、本発明によれば、低弾性
率でしかも低膨張率かつ高ガラス転移点を有する
硬化物を生成しうるエポキシ樹脂組成物を提供す
ることができる。[Table] As is clear from Table 3, all of the molded products (cured products) made from the resin composition of the present invention have good properties, including glass transition point, flexural modulus, and Bacall hardness. The standard value of 150℃
The above shows values that fully satisfy 0.8×10 5 Kg/cm 2 or less and 35 or more. As explained above, according to the present invention, it is possible to provide an epoxy resin composition capable of producing a cured product having a low elastic modulus, a low expansion coefficient, and a high glass transition point.
Claims (1)
低分子量重合体、(c)エチレン性不飽和ジカルボン
酸又はその反応性誘導体とポリアミン化合物との
反応物及び(d)無機質充填剤を含有し、かつ該無機
質充填剤の含有量が上記4成分の合計容量に対し
約40〜75容量%であることを特徴とするエポキシ
樹脂組成物。 2 多官能性エポキシ化合物(a)としてノボラツク
型エポキシ樹脂約20〜90重量部及びビスフエノー
ルA型エポキシ樹脂約5〜40重量部ならびにブタ
ジエン系低分子量重合体(b)約5〜40重量部より構
成された特許請求の範囲第1項記載のエポキシ樹
脂組成物。 3 エチレン性不飽和ジカルボン酸又はその反応
性誘導体とポリアミン化合物との反応物(c)が芳香
族ジアミン1モルに対し無水マレイン酸約0.05〜
0.5モルの割合で両者を溶融反応させた反応物で
ある特許請求の範囲第1項又は第2項記載のエポ
キシ樹脂組成物。[Scope of Claims] 1 (a) a polyfunctional epoxy compound, (b) a butadiene-based low molecular weight polymer, (c) a reaction product of an ethylenically unsaturated dicarboxylic acid or a reactive derivative thereof and a polyamine compound, and (d) ) An epoxy resin composition containing an inorganic filler, wherein the content of the inorganic filler is about 40 to 75% by volume based on the total volume of the four components. 2 From about 20 to 90 parts by weight of a novolak type epoxy resin, about 5 to 40 parts by weight of a bisphenol A type epoxy resin, and about 5 to 40 parts by weight of a butadiene-based low molecular weight polymer (b) as a polyfunctional epoxy compound (a). An epoxy resin composition as claimed in claim 1. 3 The reaction product (c) of ethylenically unsaturated dicarboxylic acid or its reactive derivative and polyamine compound is about 0.05 to 100% maleic anhydride per mole of aromatic diamine.
The epoxy resin composition according to claim 1 or 2, which is a reaction product obtained by melting and reacting both in a ratio of 0.5 mole.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6955280A JPS56166225A (en) | 1980-05-27 | 1980-05-27 | Epoxy resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6955280A JPS56166225A (en) | 1980-05-27 | 1980-05-27 | Epoxy resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56166225A JPS56166225A (en) | 1981-12-21 |
JPS6136854B2 true JPS6136854B2 (en) | 1986-08-20 |
Family
ID=13406000
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6955280A Granted JPS56166225A (en) | 1980-05-27 | 1980-05-27 | Epoxy resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56166225A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03119849U (en) * | 1990-03-19 | 1991-12-10 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61260658A (en) * | 1985-05-15 | 1986-11-18 | Toshiba Chem Corp | Resin sealed type semiconductor device |
JPS63128018A (en) * | 1986-11-19 | 1988-05-31 | Sunstar Giken Kk | Epoxy resin composition |
JPS63207816A (en) * | 1987-02-23 | 1988-08-29 | Ube Ind Ltd | Epoxy resin composition for sealing semiconductor |
US4963640A (en) * | 1989-02-13 | 1990-10-16 | Mobay Corporation | Process and compositions for production of moldings |
US4937366A (en) * | 1989-02-13 | 1990-06-26 | Mobay Corporation | Process and compositions for production of moldings |
JPH03236105A (en) * | 1990-02-09 | 1991-10-22 | Kazuyoshi Uematsu | Sealing agent for insulation and rust prevention of conductor |
-
1980
- 1980-05-27 JP JP6955280A patent/JPS56166225A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03119849U (en) * | 1990-03-19 | 1991-12-10 |
Also Published As
Publication number | Publication date |
---|---|
JPS56166225A (en) | 1981-12-21 |
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