JPS6214937B2 - - Google Patents

Info

Publication number
JPS6214937B2
JPS6214937B2 JP53127050A JP12705078A JPS6214937B2 JP S6214937 B2 JPS6214937 B2 JP S6214937B2 JP 53127050 A JP53127050 A JP 53127050A JP 12705078 A JP12705078 A JP 12705078A JP S6214937 B2 JPS6214937 B2 JP S6214937B2
Authority
JP
Japan
Prior art keywords
plasma
ions
etching
gas
cyclotron resonance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53127050A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5553422A (en
Inventor
Haruhiko Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP12705078A priority Critical patent/JPS5553422A/ja
Publication of JPS5553422A publication Critical patent/JPS5553422A/ja
Publication of JPS6214937B2 publication Critical patent/JPS6214937B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP12705078A 1978-10-16 1978-10-16 Plasma reactor Granted JPS5553422A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12705078A JPS5553422A (en) 1978-10-16 1978-10-16 Plasma reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12705078A JPS5553422A (en) 1978-10-16 1978-10-16 Plasma reactor

Publications (2)

Publication Number Publication Date
JPS5553422A JPS5553422A (en) 1980-04-18
JPS6214937B2 true JPS6214937B2 (OSRAM) 1987-04-04

Family

ID=14950356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12705078A Granted JPS5553422A (en) 1978-10-16 1978-10-16 Plasma reactor

Country Status (1)

Country Link
JP (1) JPS5553422A (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2808586B2 (ja) * 1987-03-27 1998-10-08 日本電気株式会社 プラズマ生成反応装置
US5279669A (en) * 1991-12-13 1994-01-18 International Business Machines Corporation Plasma reactor for processing substrates comprising means for inducing electron cyclotron resonance (ECR) and ion cyclotron resonance (ICR) conditions
JPH06241854A (ja) * 1993-02-22 1994-09-02 Mitsubishi Electric Corp 渦流量計
EP1182685A1 (en) * 2000-08-09 2002-02-27 Toyo Technologies, Inc. Plasma polisher with grazing angle ion collision(GAPP)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5344795B2 (OSRAM) * 1974-12-18 1978-12-01
JPS5467377A (en) * 1977-11-09 1979-05-30 Hitachi Ltd Plasma processing apparatus
JPS5483376A (en) * 1977-12-16 1979-07-03 Fujitsu Ltd Plasma treatment equipment

Also Published As

Publication number Publication date
JPS5553422A (en) 1980-04-18

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