JPS62136859A - 半導体ウエハのメツキ装置 - Google Patents

半導体ウエハのメツキ装置

Info

Publication number
JPS62136859A
JPS62136859A JP60278562A JP27856285A JPS62136859A JP S62136859 A JPS62136859 A JP S62136859A JP 60278562 A JP60278562 A JP 60278562A JP 27856285 A JP27856285 A JP 27856285A JP S62136859 A JPS62136859 A JP S62136859A
Authority
JP
Japan
Prior art keywords
plating
wafer
contacts
contact
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60278562A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0251254B2 (enExample
Inventor
Nobumasa Ishida
石田　信正
Kichiji Abe
吉次 阿部
Motoki Ito
伊藤　基樹
Masakazu Terada
雅一 寺田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP60278562A priority Critical patent/JPS62136859A/ja
Publication of JPS62136859A publication Critical patent/JPS62136859A/ja
Publication of JPH0251254B2 publication Critical patent/JPH0251254B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W72/012—

Landscapes

  • Electroplating Methods And Accessories (AREA)
  • Physical Vapour Deposition (AREA)
JP60278562A 1985-12-10 1985-12-10 半導体ウエハのメツキ装置 Granted JPS62136859A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60278562A JPS62136859A (ja) 1985-12-10 1985-12-10 半導体ウエハのメツキ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60278562A JPS62136859A (ja) 1985-12-10 1985-12-10 半導体ウエハのメツキ装置

Publications (2)

Publication Number Publication Date
JPS62136859A true JPS62136859A (ja) 1987-06-19
JPH0251254B2 JPH0251254B2 (enExample) 1990-11-06

Family

ID=17598991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60278562A Granted JPS62136859A (ja) 1985-12-10 1985-12-10 半導体ウエハのメツキ装置

Country Status (1)

Country Link
JP (1) JPS62136859A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0215622A (ja) * 1988-07-01 1990-01-19 Fujitsu Ltd メッキ処理方法およびメッキ処理装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6288985B2 (ja) 2013-08-13 2018-03-07 キヤノン株式会社 リソグラフィ装置、および物品の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0215622A (ja) * 1988-07-01 1990-01-19 Fujitsu Ltd メッキ処理方法およびメッキ処理装置

Also Published As

Publication number Publication date
JPH0251254B2 (enExample) 1990-11-06

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term