JPS6213569A - ＴｅまたはＴｅ合金製スパツタリング用焼結タ−ゲツト - Google Patents

ＴｅまたはＴｅ合金製スパツタリング用焼結タ−ゲツト

Info

Publication number
JPS6213569A
JPS6213569A JP15160385A JP15160385A JPS6213569A JP S6213569 A JPS6213569 A JP S6213569A JP 15160385 A JP15160385 A JP 15160385A JP 15160385 A JP15160385 A JP 15160385A JP S6213569 A JPS6213569 A JP S6213569A
Authority
JP
Japan
Prior art keywords
sputtering
alloy
target
sintered
strength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15160385A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6328987B2 (enExample
Inventor
Masatoshi Fukushima
正俊 福島
Kosaburo Suehiro
末広　幸三郎
Soichi Fukui
福井　総一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP15160385A priority Critical patent/JPS6213569A/ja
Publication of JPS6213569A publication Critical patent/JPS6213569A/ja
Publication of JPS6328987B2 publication Critical patent/JPS6328987B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP15160385A 1985-07-10 1985-07-10 ＴｅまたはＴｅ合金製スパツタリング用焼結タ−ゲツト Granted JPS6213569A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15160385A JPS6213569A (ja) 1985-07-10 1985-07-10 ＴｅまたはＴｅ合金製スパツタリング用焼結タ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15160385A JPS6213569A (ja) 1985-07-10 1985-07-10 ＴｅまたはＴｅ合金製スパツタリング用焼結タ−ゲツト

Publications (2)

Publication Number Publication Date
JPS6213569A true JPS6213569A (ja) 1987-01-22
JPS6328987B2 JPS6328987B2 (enExample) 1988-06-10

Family

ID=15522138

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15160385A Granted JPS6213569A (ja) 1985-07-10 1985-07-10 ＴｅまたはＴｅ合金製スパツタリング用焼結タ−ゲツト

Country Status (1)

Country Link
JP (1) JPS6213569A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01106748U (enExample) * 1988-01-05 1989-07-18
WO2009107498A1 (ja) * 2008-02-26 2009-09-03 日鉱金属株式会社 焼結用Ｓｂ－Ｔｅ系合金粉末及び同粉末の製造方法並びに焼結体ターゲット
WO2013035695A1 (ja) * 2011-09-08 2013-03-14 Jx日鉱日石金属株式会社 Ｃｕ－Ｔｅ合金系焼結体スパッタリングターゲット

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0399291U (enExample) * 1990-01-31 1991-10-16
JPH0536195U (ja) * 1991-10-21 1993-05-18 株式会社クボタ 管継手部の防食用コア

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60131963A (ja) * 1983-12-21 1985-07-13 Nippon Mining Co Ltd スパツタリング用タ−ゲツト板

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60131963A (ja) * 1983-12-21 1985-07-13 Nippon Mining Co Ltd スパツタリング用タ−ゲツト板

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01106748U (enExample) * 1988-01-05 1989-07-18
WO2009107498A1 (ja) * 2008-02-26 2009-09-03 日鉱金属株式会社 焼結用Ｓｂ－Ｔｅ系合金粉末及び同粉末の製造方法並びに焼結体ターゲット
WO2013035695A1 (ja) * 2011-09-08 2013-03-14 Jx日鉱日石金属株式会社 Ｃｕ－Ｔｅ合金系焼結体スパッタリングターゲット
JP2014029026A (ja) * 2011-09-08 2014-02-13 Jx Nippon Mining & Metals Corp Ｃｕ−Ｔｅ合金系焼結体スパッタリングターゲット

Also Published As

Publication number Publication date
JPS6328987B2 (enExample) 1988-06-10

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Legal Events

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LAPS Cancellation because of no payment of annual fees