JPS62125690A - Electric circuit forming substrate - Google Patents

Electric circuit forming substrate

Info

Publication number
JPS62125690A
JPS62125690A JP26571985A JP26571985A JPS62125690A JP S62125690 A JPS62125690 A JP S62125690A JP 26571985 A JP26571985 A JP 26571985A JP 26571985 A JP26571985 A JP 26571985A JP S62125690 A JPS62125690 A JP S62125690A
Authority
JP
Japan
Prior art keywords
electric circuit
substrate
insulating layer
film
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26571985A
Other languages
Japanese (ja)
Inventor
浩 川合
伸一 真鍋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP26571985A priority Critical patent/JPS62125690A/en
Publication of JPS62125690A publication Critical patent/JPS62125690A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [産業−1−の利用分野1 本発明は電気回路形成用基盤に関し、さらに詳しくは、
絶縁層と金属基板との接着強度が優れた金属箔・絶縁層
・金属基板よりなる電気回路形成用基盤に関する。
[Detailed Description of the Invention] [Field of Application of Industry-1-1] The present invention relates to a base for forming an electric circuit, and more specifically,
The present invention relates to a base for forming an electric circuit comprising a metal foil, an insulating layer, and a metal substrate that have excellent adhesive strength between the insulating layer and the metal substrate.

1従米技術1 従来においても、電気回路形成用基盤は、金属基板と絶
縁層および金属箔とは接着剤により接着されているが、
金属基板と絶縁層とがはがれを起し、また、自然剥離を
起して他の回路や部品と短絡したり、または、絶縁層が
金属基板がら全面剥離を起して分離し、使用不可能にな
ることがあっまた、金属基板は防錆および塗料の密着性
のためにクロメート処理、燐酸クロメート処理および燐
燐酸塩処理が施されている。
1 Conventional technology 1 Conventionally, the metal substrate, the insulating layer, and the metal foil are bonded together with an adhesive in the base for forming an electric circuit.
The metal substrate and the insulating layer may peel off or spontaneously peel off, resulting in a short circuit with other circuits or components, or the insulating layer may completely peel off from the metal substrate and separate, making it unusable. In addition, metal substrates are subjected to chromate treatment, phosphoric acid chromate treatment, and phosphorus phosphate treatment for rust prevention and paint adhesion.

しかして、電気回路形成用基盤に金属基板、例えば、鉄
、アルミニウム基扱が使用される場合に、一般の環境概
念としては耐熱性、耐寒性、耐湿性があるが、特に耐湿
性が問題となる。即ち、金属基板が絶縁層を透過する湿
分と反応し、無処理であれば錆を生じ、この脆い錆は破
壊、剥離を起す。
Therefore, when a metal substrate such as iron or aluminum is used as a base for forming an electric circuit, general environmental concepts include heat resistance, cold resistance, and moisture resistance, but moisture resistance in particular is a problem. Become. That is, the metal substrate reacts with moisture that passes through the insulating layer, causing rust if no treatment is performed, and this brittle rust causes breakage and peeling.

一般に塗装下地処理としてはクロメート処理、燐酸クロ
メート処理、燐酸塩処理があるが、塗装においては塗料
だけが密着していればよく、何れの処理でもよいが、電
気回路形成用基盤には、種々の部品を塔載するするため
、例えば、モーター等の基盤であれば銅コイルを塔載し
、このコイルの電磁力線により永久磁石を回転させると
いう力が加えられる場合がある。従って、上記に説明し
たようなことから、特に湿度環境において金属基板から
絶縁層が剥離する可能性がある。
In general, chromate treatment, phosphoric acid chromate treatment, and phosphate treatment are used as base treatments for painting, but in painting, it is only necessary that the paint adheres, and any treatment may be used. In order to mount parts, for example, in the case of a base such as a motor, a copper coil is mounted on the mount, and the electromagnetic lines of force of this coil may apply force to rotate a permanent magnet. Therefore, as explained above, there is a possibility that the insulating layer will peel off from the metal substrate, especially in a humid environment.

[発明が解決しようとする問題点1 本発明は1−記に説明したように、従来における金属箔
・絶縁層・金属基板よりなる電気回路形成用基盤におけ
る金属基板と絶縁層の剥離する点に鑑み、本発明者の鋭
意研究の結果、電気回路形成用基盤においで、どのよう
な湿度環境においても金属基板から絶縁層が剥離しない
表面処理層を見出し、この知見に基いて耐剥離性に優れ
た金属箔・絶縁層・金属基板よりなる電気回路形成用基
盤を開発したのである。
[Problem to be Solved by the Invention 1] As explained in 1-, the present invention solves the problem of peeling of the metal substrate and the insulating layer in the conventional electric circuit forming base made of metal foil, insulating layer, and metal substrate. In view of this, as a result of intensive research by the present inventors, we have discovered a surface treatment layer that will prevent the insulating layer from peeling off from the metal substrate in any humidity environment in the substrate for forming electric circuits, and based on this knowledge, we have created a surface treatment layer that has excellent peeling resistance. They developed a base for forming electrical circuits consisting of metal foil, an insulating layer, and a metal substrate.

1問題点を解決するための手段1 本発明に係る電気回路形成用基盤の特徴とするところは
、金属基板に燐酸塩皮膜、絶縁層および金属箔の順に設
けられていることにある。
Means for Solving Problem 1 The feature of the electric circuit forming board according to the present invention is that a phosphate film, an insulating layer, and a metal foil are provided in this order on a metal substrate.

本発明に係る電気回路形成用基盤について以F詳細に説
明する。
The electric circuit forming base according to the present invention will be described in detail below.

先ず、本発明に係る電気回路形成用基盤において、使用
する材料について説明」る。
First, the materials used in the electric circuit forming board according to the present invention will be explained.

金属箔は導体となるものであるから、当然に導電率の優
れた銅により製造され、厚さはS = 70μとするの
がよい。さらに、この金属箔はアルミニウム、銅合金、
ニッケル、銀或いは導電性を有する金属またはその合金
等が使用される。
Since the metal foil is a conductor, it is naturally made of copper, which has excellent conductivity, and preferably has a thickness of S = 70μ. Furthermore, this metal foil can be used for aluminum, copper alloy,
Nickel, silver, a conductive metal, or an alloy thereof is used.

絶縁層は、接着剤・耐熱絶縁フィルム・接着剤よりなっ
ており、以下接着剤と耐熱絶縁フィルムについて説明す
る。
The insulating layer is made of an adhesive, a heat-resistant insulating film, and an adhesive, and the adhesive and the heat-resistant insulating film will be explained below.

接着剤は比較的電気絶縁性の良好なエポキシ系の接着剤
を使用するのがよく、その他金属との接着力が良く、か
つ、電気絶縁性の良好な接着剤、例えば、ポリアミド・
イミド系、シリコーン系、アクリル系、ポリエステル系
、ポリウレタン系のものでも使用することができる。ま
た、接着剤の厚さは耐熱絶縁フィルムを合ぜで電気絶縁
層としては要求される絶縁性から決めるのがよく、約2
0〜200μとするのあよい。
It is best to use an epoxy adhesive that has relatively good electrical insulation properties, and other adhesives that have good adhesion to metals and good electrical insulation properties, such as polyamide, etc.
Imide-based, silicone-based, acrylic-based, polyester-based, and polyurethane-based materials can also be used. In addition, the thickness of the adhesive should be determined based on the insulation required as an electrical insulation layer when combined with a heat-resistant insulation film, and is approximately 2.
The thickness is preferably 0 to 200μ.

14%Mfflフィルムはピンホール等の欠陥がなく加
熱によっても溶融することがなり櫃・1熱性を有し、接
着剤にも影響されず、さらに、電気絶縁性の優れたもの
が必要であり、例えば、ポリイミドフィルムが好ましい
。この耐熱絶縁フィルムの厚さは=3− 5〜50ツノとするのがよい。また、この絶縁フィルム
はL記の外にポリエステルフィルム、ポリエーテルイミ
ド、ポリスル7オンフイルム等も用途によって使用でき
る。そして、この絶縁層は金属箔のパターンエツチング
により何等の影響を受けない。
The 14% Mffl film has no defects such as pinholes, can be melted by heating, has heat resistance, is unaffected by adhesives, and has excellent electrical insulation properties. For example, polyimide film is preferred. The thickness of this heat-resistant insulating film is preferably from 3-5 to 50 mm. In addition to the insulating film listed in L, polyester film, polyetherimide, polysulfonate film, etc. can also be used depending on the purpose. This insulating layer is not affected by pattern etching of the metal foil.

金属基板は厚さ0.3〜3.0曲の普通鋼板が或いは厚
さ0.1〜1.0mmの珪素鋼板を使用する。また、ア
ルミニウム、アルミニウム合金を使用することができる
As the metal substrate, an ordinary steel plate with a thickness of 0.3 to 3.0 mm or a silicon steel plate with a thickness of 0.1 to 1.0 mm is used. Additionally, aluminum and aluminum alloys can be used.

燐酸塩皮膜は通常の燐酸塩処理により設けるのである。The phosphate coating is provided by conventional phosphate treatment.

また、クロメート処理皮膜も考えられるが、鉄基板また
はアルミニウム基板にこのクロメート処理を行なうと、
3価および6価のクロム酸塩で形成されるが、6価クロ
ムは水溶性であり透過湿分により6価クロムが溶出して
、鉄基板またはアルミニウム合金基板から絶縁層がはが
れるようになる。
A chromate treatment film may also be considered, but if this chromate treatment is applied to an iron or aluminum substrate,
It is formed from trivalent and hexavalent chromates, but hexavalent chromium is water-soluble, and the hexavalent chromium is eluted by permeating moisture, causing the insulating layer to peel off from the iron or aluminum alloy substrate.

よって、本発明に係る電気回路形成基板における表面処
理には燐酸塩皮膜として、燐酸亜鉛皮膜、燐酸カルシウ
ム皮膜、燐酸鉄、燐酸クロム皮膜が適用できるが、特に
、燐酸亜鉛皮膜を設けるのが好適である。
Therefore, as the phosphate film, a zinc phosphate film, a calcium phosphate film, an iron phosphate film, or a chromium phosphate film can be applied to the surface treatment of the electric circuit forming board according to the present invention, but it is particularly preferable to provide a zinc phosphate film. be.

なお、鉄基板の場合には、通常の電気めっき法により亜
鉛または亜鉛合金めっきを鉄基板の片面または両面に設
けることができる。
In addition, in the case of an iron substrate, zinc or zinc alloy plating can be provided on one or both sides of the iron substrate by a normal electroplating method.

次に、本発明に係る電気回路形成用基盤の製造方法簡単
に説明すると、長尺の金属箔に接着剤を塗布して加熱後
耐熱絶縁フィルムを接着してコイル状とし、この耐熱絶
縁フィルムに接着剤を塗布し、燐酸塩皮膜が設けられた
鉄基板(亜鉛めっきが設けられていてもよい。)とを、
接着剤と燐酸塩皮膜を接着して電気回路形成用基盤の素
材とし、適宜の寸法に切断し、さら加熱することによっ
て電気回路形成用基盤製品とするのである。また、アル
ミニウム基板の場合も」ユ記説明した鉄基板と同様にし
て電気回路形成用基盤を製造することができる。
Next, to briefly explain the manufacturing method of the base for forming an electric circuit according to the present invention, an adhesive is applied to a long metal foil, and after heating, a heat-resistant insulating film is bonded to form a coil shape. An iron substrate coated with an adhesive and provided with a phosphate film (it may also be provided with zinc plating),
An adhesive and a phosphate film are bonded together to form a base material for forming an electric circuit, which is then cut into appropriate dimensions and further heated to form a base product for forming an electric circuit. Furthermore, in the case of an aluminum substrate, an electric circuit forming substrate can be manufactured in the same manner as the iron substrate described in section 1.

従って、第1図に示す本発明に係る電気回路形成用基盤
は鉄基板−ににめっきされた亜鉛めっき上の燐酸塩皮膜
と絶縁層とが強固に接着されているのでいかなる湿度環
境においても、鉄基板と絶縁層とが剥離することがない
Therefore, in the electric circuit forming board according to the present invention shown in FIG. 1, the phosphate film on the zinc plating and the insulating layer are firmly adhered to the iron substrate, so that it can be used in any humidity environment. The iron substrate and the insulating layer will not peel off.

[実 施 例1 本発明に係る電気回路形成用基盤について実施例を説明
する。
[Embodiment 1] An embodiment of the electric circuit forming board according to the present invention will be described.

実施例 鉄基板に亜鉛めっき(片面20g、両面めっき)を施し
た材料を、(1)燐酸塩処理により燐酸亜鉛皮膜を形成
し、(2)クロメート処理によりクロメート皮膜を形成
し、これら2つの表面処J’!1!された鉄基板に絶縁
層(接着材・耐熱絶縁フィルム・接着剤)5()μを形
成して、銅箔を貼合せた。、二の(1)(2)の材料に
ついて、常態接着強度、湿式接着強度およびプレッシャ
ークンカー試験を行ない、その結果を第1表に示する。
Example: A material obtained by galvanizing an iron substrate (20 g on one side, plating on both sides) was treated by (1) phosphate treatment to form a zinc phosphate film, (2) chromate treatment to form a chromate film, and these two surfaces were Where J'! 1! An insulating layer (adhesive material, heat-resistant insulating film, adhesive) 5()μ was formed on the iron substrate, and a copper foil was bonded thereto. , 2-(1) and (2) were subjected to normal adhesive strength, wet adhesive strength and pressure Kunker tests, and the results are shown in Table 1.

この第1表より、本発明に係る電気回路形成用基盤は、
常態、湿潤の接着強度は他の例に比して優れており、全
く剥離は発生[2ていないことがわかる。
From this Table 1, it can be seen that the electric circuit formation substrate according to the present invention is:
It can be seen that the adhesive strength in normal and wet conditions is superior to other examples, and no peeling occurred at all.

[発明の効果1 以−1−説明したように、本発明に係る電気回路形成用
基盤はに記の構成であるから、金属基板と絶縁層は剥離
することがなく、接着強度も優れているという効果を有
する。
[Advantageous Effects of the Invention 1] As explained below-1, since the electric circuit forming substrate according to the present invention has the structure described below, the metal substrate and the insulating layer do not peel off and have excellent adhesive strength. It has this effect.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る電気回路形成用基盤を示す断面図
、第2図は接着強度を測定する説明図である。 fl 図 −?2図
FIG. 1 is a cross-sectional view showing a substrate for forming an electric circuit according to the present invention, and FIG. 2 is an explanatory view for measuring adhesive strength. fl Figure-? Figure 2

Claims (1)

【特許請求の範囲】[Claims] 金属基板に燐酸塩皮膜、絶縁層および金属箔の順に設け
られていることを特徴とする電気回路形成用基盤。
A base for forming an electric circuit, characterized in that a phosphate film, an insulating layer, and a metal foil are provided in this order on a metal substrate.
JP26571985A 1985-11-26 1985-11-26 Electric circuit forming substrate Pending JPS62125690A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26571985A JPS62125690A (en) 1985-11-26 1985-11-26 Electric circuit forming substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26571985A JPS62125690A (en) 1985-11-26 1985-11-26 Electric circuit forming substrate

Publications (1)

Publication Number Publication Date
JPS62125690A true JPS62125690A (en) 1987-06-06

Family

ID=17421058

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26571985A Pending JPS62125690A (en) 1985-11-26 1985-11-26 Electric circuit forming substrate

Country Status (1)

Country Link
JP (1) JPS62125690A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012227422A (en) * 2011-04-21 2012-11-15 Hitachi Chem Co Ltd Method of manufacturing metal housing integrated type circuit board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012227422A (en) * 2011-04-21 2012-11-15 Hitachi Chem Co Ltd Method of manufacturing metal housing integrated type circuit board

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