JPS61193843A - Manufacture of silica steel plate base copper lined laminated board - Google Patents

Manufacture of silica steel plate base copper lined laminated board

Info

Publication number
JPS61193843A
JPS61193843A JP3514585A JP3514585A JPS61193843A JP S61193843 A JPS61193843 A JP S61193843A JP 3514585 A JP3514585 A JP 3514585A JP 3514585 A JP3514585 A JP 3514585A JP S61193843 A JPS61193843 A JP S61193843A
Authority
JP
Japan
Prior art keywords
silicon steel
steel plate
film
copper
clad laminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3514585A
Other languages
Japanese (ja)
Inventor
順一 加藤
善幸 池添
淳司 白金
英吉 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP3514585A priority Critical patent/JPS61193843A/en
Publication of JPS61193843A publication Critical patent/JPS61193843A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/05Insulated conductive substrates, e.g. insulated metal substrate
    • H05K1/056Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an organic insulating layer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/44Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits

Landscapes

  • Laminated Bodies (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔技術分野〕 本発明は絶縁層の密着強度や耐熱性のすぐれた信頼性の
高い珪素鋼板ベース銅張積層板の製造に関するものであ
る。詳しくは、小型・電子制御モータ等のプリント配線
板として使用される金属ベース銅張積層板に於て、その
金属板として電磁特性にすぐれた珪素鋼板(JISC2
552)を使用するに当り、従来は、過電流防止と防錆
のために、予め珪素鋼板の表面に形成されているリン酸
マグネシウム等の絶祥皮膜をそのまま残し、この上に絶
縁層を介して銅箔を接着する方法と、この方法の欠点を
改善するために、これらwA縁皮暎をサンドペーパーや
サンドブラスト等の方法で除去してその粗化面に絶縁層
を介して銅箔を接着する方法が用いられているが本発明
は、珪素鋼板の表面に、絶縁皮膜ではなく、亜鉛メッキ
とクロメート処理あるいはリン酸塩処理を施した電導性
防錆皮膜を形成し、これを除去することなく、この上に
絶縁層を介して銅箔を接着することにより、防錆効果と
皮膜強度が高く、耐熱性、耐湿性、耐電圧等の特性のす
ぐれた信頼性の高い珪素鋼板ベース銅張積層板を製造す
るものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to the production of highly reliable silicon steel plate-based copper-clad laminates with excellent adhesion strength and heat resistance of insulating layers. In detail, in metal-based copper-clad laminates used as printed wiring boards for small electronically controlled motors, silicon steel sheets (JISC2) with excellent electromagnetic properties are used as the metal plate.
552), conventionally, to prevent overcurrent and prevent rust, the coating of magnesium phosphate, etc., previously formed on the surface of the silicon steel plate was left as is, and an insulating layer was placed on top of it. In order to improve the drawbacks of this method, we have developed a method of bonding copper foil to the roughened surface using sandpaper, sandblasting, etc., and then bonding copper foil to the roughened surface via an insulating layer. However, the present invention involves forming, on the surface of a silicon steel plate, an electrically conductive rust-preventing film that is galvanized and chromate-treated or phosphate-treated, rather than an insulating film, and then removing this. By adhering copper foil on top of this via an insulating layer, we have created a highly reliable silicon steel plate-based copper clad with high rust prevention effect and film strength, and excellent properties such as heat resistance, moisture resistance, and withstand voltage. It manufactures laminates.

〔産業上の利用分野〕[Industrial application field]

このような防錆皮膜強度と耐熱性にすぐれた珪素鋼板ベ
ース銅張積層板は、近年とみにその使用が増大している
ビデオテープレコーダやフロッピーディスク等の小型・
電子制御モータの駆動回路や8回転数や位置検出用等の
電磁特性を必要とするプリント回路板に用いられるもの
である。近年、電子機器の軽量、WI型、高密度化が進
み、これに使用されるトランジスタや集積回路(IC)
あるいは抵抗やコンデンサ等の電子部品が小型化され、
高密度化され、また高出力化されて来た。これに伴い、
これら電子部品類の単位表面積あたりの発熱量は著しく
高まっており、これら部品を取りつけるプリント配線板
にもすぐれた耐熱性が要求される。このため、そのプリ
ント配線板用の銅張積層板として放熱性のよい金属板上
に、エポキシやポリイミド等、耐熱性のよい絶縁層を介
して銅箔を接着したものが要求され始めた。本発明によ
るすぐれた絶縁皮膜密着強度や耐熱性のすぐれた珪素鋼
板ベース銅張積層板は、上記のような電子機器の今後の
小型化・高密度化をおおいに促進しまたその絶縁性、耐
熱性等の信鯨性をおおいに高めるために使用されるもの
である。
Copper-clad laminates based on silicon steel sheets, which have excellent anti-rust film strength and heat resistance, are used in small-sized devices such as video tape recorders and floppy disks, which have been increasingly used in recent years.
It is used in drive circuits for electronically controlled motors and printed circuit boards that require electromagnetic characteristics such as 8 rotation speed and position detection. In recent years, electronic devices have become lighter, WI-type, and more dense, and the transistors and integrated circuits (ICs) used in these devices have become lighter.
Or electronic components such as resistors and capacitors are miniaturized,
The density has been increased and the output has been increased. Along with this,
The amount of heat generated per unit surface area of these electronic components is increasing significantly, and the printed wiring boards to which these components are attached are also required to have excellent heat resistance. For this reason, demand has begun for copper-clad laminates for printed wiring boards in which copper foil is bonded to a metal plate with good heat dissipation through an insulating layer with good heat resistance, such as epoxy or polyimide. The silicon steel plate-based copper clad laminate of the present invention, which has excellent insulating film adhesion strength and heat resistance, will greatly promote the future miniaturization and higher density of electronic devices as described above, and will also improve its insulation and heat resistance. It is used to greatly enhance the confidence of people such as the public.

〔従来の技術および問題点〕[Conventional technology and problems]

上記のとおり、近年の電子部品の小型化と高出力化によ
り、これら電子部品をとりつけ−るプリント配線板の耐
熱性を向上する手段としてテリント配線板の片面あるい
は内部に放熱性のすぐれたアルミ、銅、鉄等の金属板を
使用する傾向が増大している。特に小型・電子化モータ
や回転数や位置検出用のプリント配線板については更に
その電磁特性をよくするため珪素鋼板が使用され始めて
いる。この珪素鋼板は電磁特性にすぐれている反面、耐
食性に劣っており特に夏期や多湿時には発錆しやすい。
As mentioned above, with the recent miniaturization and high output of electronic components, aluminum with excellent heat dissipation is used on one side or inside of the TELINT wiring board as a means to improve the heat resistance of the printed wiring board on which these electronic components are attached. There is an increasing trend to use metal plates such as copper, iron, etc. In particular, silicon steel sheets are beginning to be used for small electronic motors and printed wiring boards for detecting rotational speed and position in order to further improve their electromagnetic properties. Although this silicon steel sheet has excellent electromagnetic properties, it has poor corrosion resistance and is prone to rusting, especially in summer or in high humidity.

これを防止するためおよび電[1M失を防止するために
、珪素鋼板製造業者では、この表面にリン酸マグネシウ
ムや重クロム酸マグネシウム等の無機質や一部にはアク
リル、スチレン、酢ビ等の有機物を添加した皮膜を形成
し、防錆・絶縁皮膜を兼ねそなえた皮膜付構造で製造販
売している。この珪素鋼板をプリント配線板用の銅張積
層板に使用するには、従来は第1図に示すように珪素鋼
板1の両面に皮膜6を有したものを使用し3次に第2図
に示すように、その皮膜6の上にエポキシ等の絶縁層4
を介して銅箔5を接着する。
In order to prevent this and to prevent the loss of electricity [1M], silicon steel sheet manufacturers use inorganic substances such as magnesium phosphate and magnesium dichromate, and some organic substances such as acrylic, styrene, and vinyl acetate, on the surface. The company manufactures and sells a structure with a coating that combines anti-corrosion and insulation coating. In order to use this silicon steel plate for a copper-clad laminate for printed wiring boards, conventionally a silicon steel plate 1 with a coating 6 on both sides as shown in FIG. As shown, an insulating layer 4 of epoxy or the like is formed on the film 6.
Copper foil 5 is bonded through.

しかし、このような構成で積層板の打抜加工を行なうと
珪素鋼板1と皮膜6の間ではがれを生じやすい。これは
第1図に示すような通常の絶縁皮膜6のみの場合には見
られない現象であり第2図のように、この皮膜6の上に
更に絶縁層4や銅箔5を形成した多層構成時のみに見ら
れる現象である。この時、皮膜6の材質をリン酸マグネ
シウム系や重クロム酸マグネシウム等に変更しても、ま
た皮膜の厚みを少くしたり、またこの皮膜に有機物を添
加したものに変更しても第2図に示す多層構成時には、
はがれを生じやすい現象は変らない。一方、銅張積層板
は。
However, when a laminated plate with such a configuration is punched, peeling is likely to occur between the silicon steel plate 1 and the coating 6. This is a phenomenon that cannot be observed in the case of only a normal insulating film 6 as shown in FIG. 1, and as shown in FIG. This is a phenomenon that can only be seen during configuration. At this time, even if the material of the film 6 is changed to magnesium phosphate, magnesium dichromate, etc., the thickness of the film is reduced, or organic matter is added to this film, as shown in Figure 2. When using the multilayer configuration shown in
The phenomenon that tends to cause peeling remains unchanged. On the other hand, copper clad laminates.

使用温度に於ける長期の寿命を保証するため。To ensure long service life at operating temperatures.

使用温度よりも数十度高い温度で長期間の促進加熱テス
トを行なったりまた高温加湿テスト。
We conduct long-term accelerated heating tests at temperatures several dozen degrees higher than the operating temperature, and high-temperature humidification tests.

高低温ヒートショックテスト、高温水侵入テスト等を行
なうがこれらの促進寿命テストに於ても、第2図に示す
ような多層構成時には、皮膜6が珪素鋼板1よりはくす
する現象やあるいは皮膜6と絶縁層40間ではべりする
現象が発生する。これらはいずれも;珪素鋼板1と層膜
6の間の密着性が低く不充分であり、また皮膜6の表面
処理が不充分であることが原因である。
High-temperature heat shock tests, high-temperature water intrusion tests, etc. are performed, and even in these accelerated life tests, when the multi-layer structure shown in FIG. A phenomenon of slippage occurs between the insulating layer 40 and the insulating layer 40. All of these are caused by the low and insufficient adhesion between the silicon steel plate 1 and the layer film 6, and the insufficient surface treatment of the film 6.

最近この改良として、第3図に示すように珪素鋼板の片
面の皮膜をサンドベーパやスコッチプライト等で研磨除
去したあと珪素鋼板の表面に直接エポキシ等の絶縁接着
層4を作り、これに銅箔5を接着するという方法が考え
られ実施されている(特開昭59−148390)。ま
たこの方法では表面の凹凸や薄い絶縁接着層4の耐電圧
特性の低下という欠点があり、これを改良するため、金
属球やセラミック球等を吹付けるサンドブラスト法によ
りこの皮膜を除去し表面を粗化したあと絶縁層4を介し
て銅箔5を接着するという方法が提案されている(特開
昭59−148392)、Lかし、これらの方法はいず
れも一度形成した珪素鋼板上の皮膜を除去するという工
程が追加され製造原価が上り、またその除去作業の変動
により珪素鋼板の表面状態が一定でなく従ってこの上に
形成しようとする絶縁層の密着性が不安定であり信頼性
が低い。
Recently, as an improvement on this, as shown in Fig. 3, after polishing off the film on one side of the silicon steel plate with sand vapor or Scotch prite, an insulating adhesive layer 4 of epoxy or the like is directly formed on the surface of the silicon steel plate, and then a layer of copper foil 5 is applied to this. A method has been devised and implemented (Japanese Unexamined Patent Publication No. 148390/1983). In addition, this method has the drawbacks of unevenness on the surface and a reduction in the withstand voltage characteristics of the thin insulating adhesive layer 4. In order to improve this, this film is removed by a sandblasting method in which metal balls, ceramic balls, etc. are sprayed to roughen the surface. A method has been proposed in which a copper foil 5 is bonded via an insulating layer 4 after the film has been formed (Japanese Patent Laid-Open No. 59-148392). The addition of the removal process increases manufacturing costs, and due to fluctuations in the removal process, the surface condition of the silicon steel plate is not constant, resulting in unstable adhesion and low reliability of the insulating layer to be formed on it. .

このため信頼性テストに於て2高温での加熱促進テスト
や高温加湿テスト、あるいは高温水侵入テストで絶縁層
がはくすしやすく、この現象は実使用状態での絶縁層は
くり事故が予想され最悪の場合はプリント配線板に取り
つけた電子部品類がはずれて落下してしまうという致命
的事故を発生することも考えられる。また珪素鋼板の上
の皮膜を除去してしまうのでこの皮膜の一つの目的であ
る防錆効果が失なわれてしまいこのため高温加湿テスト
に於て銹を発生し、この発錆のため絶縁層の浮き上りや
ばくりに至ることがある。また皮膜を除去した珪素鋼板
は耐食性に劣るため、夏期や多湿時には錆びやすく皮膜
除去後は直ちに銅張積層板を製造しなければならず工程
上問題があった。さらに1片面銅張積層板の場合、銅箔
を張らない裏面側は加工時や取り扱い時にすり傷がつき
やすく、この表面の通常0.5〜2μm程度の薄いリン
酸マグネシウム等の皮膜では傷により下地珪素鋼板が露
出し、錆が発生しやすい。
For this reason, in reliability tests, the insulation layer tends to peel off during accelerated heating tests at high temperatures, high-temperature humidification tests, or high-temperature water penetration tests, and this phenomenon can be expected to cause accidents when the insulation layer peels off during actual use. In the worst case, electronic components attached to the printed wiring board may come off and fall, causing a fatal accident. In addition, since the film on the silicon steel plate is removed, the anti-corrosion effect, which is one of the purposes of this film, is lost, and as a result, rust is generated during high-temperature humidification tests, and due to this rust, the insulation layer This may lead to the surface rising or falling. Furthermore, since the silicon steel sheet from which the coating has been removed has poor corrosion resistance, it tends to rust during summer or high humidity, and a copper-clad laminate must be manufactured immediately after the coating is removed, which poses a problem in terms of process. Furthermore, in the case of single-sided copper-clad laminates, the back side, which is not covered with copper foil, is easily scratched during processing and handling, and the thin coating of magnesium phosphate, etc., which is usually about 0.5 to 2 μm thick on this surface, is easily scratched. The underlying silicon steel plate is exposed and rust is likely to occur.

〔発明の目的〕[Purpose of the invention]

本発明はかかる現状に鑑みなされたもので本発明の目的
は珪素鋼板の表面に、珪素鋼板との密着性の高い防錆皮
膜を形成し、さらにこの皮膜表面を処理することにより
、その上に形成する絶縁接着層との密着性を高めた珪素
鋼板ベース銅張積層板を製造することにある。
The present invention was made in view of the current situation, and the purpose of the present invention is to form a rust-preventing film on the surface of a silicon steel plate, which has high adhesion to the silicon steel plate, and further treat the surface of this film to form a rust-preventive film on the surface of the silicon steel plate. The object of the present invention is to manufacture a silicon steel plate-based copper-clad laminate that has improved adhesion to the insulating adhesive layer to be formed.

本発明により、切断・打抜等の加工ではくりを生じない
、また、耐熱性、耐湿性、防錆性のすぐれた信頼性の高
い珪素鋼板ベースプリント配線板の製造が可能となった
。従来、珪素調板の表面皮膜の密着性が充分でなかった
ために。
The present invention has made it possible to manufacture a highly reliable silicon steel plate-based printed wiring board that does not produce hollowing during processing such as cutting and punching, and has excellent heat resistance, moisture resistance, and rust prevention properties. Conventionally, the adhesion of the surface film of silicon tone plates was not sufficient.

そのすぐれた電磁特性をプリント配線板用として充分利
用できなかったが本発明により今後小型電子化モータ用
プリント配線板や回転数検出回路基板など電磁特性のす
ぐれた金属板ベースプリント配線板として珪素鋼板を積
極的に利用してゆくものである。
Although its excellent electromagnetic properties could not be fully utilized for printed wiring boards, the present invention enables silicon steel sheets to be used as metal plate-based printed wiring boards with excellent electromagnetic properties, such as printed wiring boards for small electronic motors and rotation speed detection circuit boards. will be actively utilized.

〔発明の開示〕[Disclosure of the invention]

すなわち本発明の要旨は、従来のリン酸マグネシウム等
の絶縁・防錆皮膜の代りに、珪素鋼板の表面に防錆効果
の高い亜鉛メッキの電導性皮膜を形成して珪素鋼板との
密着性を高め、さらにこの上に形成する絶縁層との密着
性を高めるためにその表面を適量のクロメート処理また
はリン酸塩処理を施して、これを除去することなくその
上に絶縁層を介して銅箔を接着するものである。以下1
本発明の詳細な説明する0本発明で珪素鋼板の表面に施
される亜鉛メッキとしては通常の鉄板に使用される亜鉛
メッキで充分であるが、そのメッキ量は5〜10g/r
dが望ましい、5g/m2未満の場合は防錆効果がなく
、また皮膜厚みが著しく低いため加工時や取り扱い時の
傷のため銹を発生しやすい。また7 0 g/rr1以
上のメッキでは打抜加工時の衝撃力でメッキがはがれや
すく、また曲げや絞り成形等の加工に適さない、またこ
の亜鉛メッキの上にクロメート処理またはリン酸処理を
施すことにより耐食性が増すとともに、この上に形成す
る絶縁層との密着性が向上する。この場合クロメート処
理は10〜50■/rrrが望ましい。
In other words, the gist of the present invention is to form a galvanized conductive film with a high rust prevention effect on the surface of a silicon steel plate in place of the conventional insulating/rust preventive film such as magnesium phosphate, thereby improving the adhesion to the silicon steel plate. Furthermore, in order to increase the adhesion with the insulating layer formed on top of this, the surface is subjected to an appropriate amount of chromate treatment or phosphate treatment, and the copper foil is placed on top of it through the insulating layer without removing this. It is used to glue. Below 1
Detailed explanation of the present invention 0 As the galvanizing applied to the surface of the silicon steel plate in the present invention, the galvanizing used for ordinary iron plates is sufficient, but the amount of plating is 5 to 10 g/r.
d is desirable; if it is less than 5 g/m2, there is no rust prevention effect, and the film thickness is extremely low, so rust is likely to occur due to scratches during processing or handling. Furthermore, if the plating is over 70 g/rr1, the plating will easily peel off due to the impact force during punching, and it will not be suitable for bending, drawing, or other processes. This increases corrosion resistance and improves adhesion with the insulating layer formed thereon. In this case, the chromate treatment is preferably 10 to 50 .mu./rrr.

10■/m2未満では処理の効果が認められず50■/
rrrを越えるとクロメート処理層と絶縁層との密着性
が悪く、高温での寿命試験でクロメート層はくりを生じ
る。またリン酸塩処理の場合は、1〜5g/rdである
ことが望ましい、1g/n(以下ではリン酸処理の効果
が少なく5g1cd以上ではリン酸塩処理と絶縁層との
密着性が悪くばくりか生じやすい。
If it is less than 10■/m2, the effect of the treatment will not be recognized and 50■/m2
If rrr is exceeded, the adhesion between the chromate-treated layer and the insulating layer is poor, and the chromate layer peels off during a life test at high temperatures. In addition, in the case of phosphate treatment, it is desirable that the rate is 1 to 5 g/rd, 1 g/n (below, the phosphoric acid treatment is less effective, and above 5 g/1 cd, the adhesion between the phosphate treatment and the insulating layer is poor). Cracks are likely to occur.

このようにして形成した珪素鋼板上の皮膜は従来とは異
なり電導性でありこの表面に微細な傷が発生しても電気
化学的な現象により銹の進展を防止する。また珪素鋼板
とは電気化学的な力で直接結合しているため鋼板との密
着性がよい、また適量のクロメート処理とリン酸塩処理
により絶縁層との密着性がすぐれている。従って、この
皮膜を残したままその上に絶縁層を介して銅箔を接着し
た珪素鋼板ベース銅張積層板は従来のものの欠点を大幅
に改善し、高い信韻性と長期の寿命を保証す・るもので
ある、以下1本発明を図面を参照しながら説明すると第
4図に示すように珪素鋼板1の上に亜鉛メッキ2を施し
、更にこれにクロメート処理またはリン酸塩処理3を施
した皮膜を形成し、これを除去することなく。
The film formed on the silicon steel plate in this manner is electrically conductive, unlike the conventional film, and even if minute scratches occur on the surface, the electrochemical phenomenon prevents the growth of rust. In addition, since it is directly bonded to the silicon steel plate by electrochemical force, it has good adhesion to the steel plate, and the appropriate amount of chromate treatment and phosphate treatment provides excellent adhesion to the insulating layer. Therefore, silicon steel plate-based copper-clad laminates, in which copper foil is bonded via an insulating layer while leaving this film on, have greatly improved the drawbacks of conventional products and ensured high reliability and long service life. The present invention will be described below with reference to the drawings. As shown in FIG. without removing it.

その上に絶縁層4を介して銅箔5を接着して珪素鋼板ベ
ース銅張積層板を製造する。
A copper foil 5 is bonded thereon via an insulating layer 4 to produce a silicon steel plate-based copper-clad laminate.

なお珪素鋼板の種類がJIS  C2552の5−18
以上のハイグレードの場合は珪素の含有率が多くなるた
め亜鉛との密着性が悪くなる傾向にあるので、第5図に
示すように珪素鋼板の表面を研磨、サンドブラスト、あ
るいは薬液等により処理することが望ましくこの表面を
粗化した珪素鋼板1の上に亜鉛メッキ2とクロメート処
理またはリン酸塩処理3を施した皮膜を形成し、これを
除去することなく、この上に絶縁層4を介して銅箔5を
接着して製造した珪素鋼板ベース銅張積層板はさらにす
ぐれた耐食性、打抜加工性、耐熱性、耐湿性を有してい
る。なお9本発明で用いる絶縁層はエポキシ樹脂、フェ
ノール樹脂不飽和ポリエステル樹脂、ポリイミド樹脂等
の樹脂液で上記処理した珪素鋼板に塗布するか、または
銅箔に塗布するかあるいはこれら樹脂をガラス繊維、ポ
リエステル繊維8紙等の基材で補強した接着プレプレグ
シートにして、これら樹脂を介して銅箔を積層し加圧し
て積層板を製造する。また実施例は珪素鋼板の片面に銅
箔を接着した例を示したが両面に接着してもよい。なお
、加熱加圧法としては通常積層プレスを使用するが、連
続加圧スチールベルトやロールプレスを用いてもよい。
The type of silicon steel plate is JIS C2552 5-18.
In the case of the above high grades, the adhesion with zinc tends to be poor due to the high silicon content, so the surface of the silicon steel plate is treated by polishing, sandblasting, or chemical solution as shown in Figure 5. It is desirable to form a film of zinc plating 2 and chromate treatment or phosphate treatment 3 on the silicon steel plate 1 whose surface has been roughened, and to apply an insulating layer 4 thereon without removing the film. The silicon steel plate-based copper-clad laminate produced by adhering the copper foil 5 has further excellent corrosion resistance, punching workability, heat resistance, and moisture resistance. Note that the insulating layer used in the present invention may be applied to the above-treated silicon steel plate with a resin liquid such as epoxy resin, phenolic resin unsaturated polyester resin, or polyimide resin, or may be applied to copper foil, or these resins may be applied to glass fiber, polyimide resin, or the like. An adhesive prepreg sheet is made into an adhesive prepreg sheet reinforced with a base material such as polyester fiber 8 paper, and copper foil is laminated via these resins and pressurized to produce a laminate. Further, although the embodiment shows an example in which copper foil is bonded to one side of a silicon steel plate, it may be bonded to both sides. Note that as the heating and pressing method, a lamination press is usually used, but a continuous pressing steel belt or a roll press may also be used.

以下2本発明を実施例に基づきさらに詳細に説明する。The present invention will be described in more detail below based on two examples.

1’4 I、r’( 〔実施例1〕 皮膜のない珪素鋼板(S−18)を9600ノサンドペ
ーパで研磨後、゛電気亜鉛メッキを20g/rrr施し
た。さらに亜鉛メッキの上に25mg/m2のクロメー
ト処理を行なった珪素鋼板を作成した。また35μの銅
箔にエポキシ系樹脂溶液を塗付、乾燥し50μの絶縁層
付銅箔を作成し、上記珪素鋼板に重ね合せ。
1'4 I, r' ([Example 1] After polishing a silicon steel plate (S-18) without a coating with 9600 sandpaper, electrolytic galvanizing was applied at 20 g/rrr.Furthermore, 25 mg/rrr was applied on top of the zinc plating. A chromate-treated silicon steel plate with a thickness of m2 was prepared.An epoxy resin solution was applied to a 35μ copper foil and dried to produce a 50μ copper foil with an insulating layer, which was laminated on the silicon steel plate.

30kg/cal  teo℃、2Hrの条件で加熱加
圧成形して珪素鋼板ベース片面銅張積層板を得た。
A single-sided copper-clad laminate based on a silicon steel plate was obtained by heating and pressing under the conditions of 30 kg/cal teo°C and 2 hours.

〔実施例2〕      ・ 実施例1珪素鋼板においてクロメート処理の代りにリン
酸塩処理3g/rrfを行なった珪素鋼板を用い、実施
例1と同様にして珪素鋼板ベース片面鋼張積層板を得た
[Example 2] - A silicon steel plate-based single-sided steel clad laminate was obtained in the same manner as in Example 1, using a silicon steel plate that had been subjected to 3 g/rrf of phosphate treatment instead of chromate treatment in Example 1. .

〔実施例3〕 皮膜のない珪素鋼板(S−30)を研磨しないで実施例
1と同様に電気亜鉛メッキ20g/rd施した。
[Example 3] A silicon steel plate (S-30) without a coating was electrolytically galvanized at 20 g/rd in the same manner as in Example 1 without polishing.

〔比較例1〕 実施例1の珪素鋼板において亜鉛メッキ量100g/n
l施した他は実施例1と同様にして片面銅張積層板を得
た。
[Comparative Example 1] Zinc plating amount of 100 g/n in the silicon steel sheet of Example 1
A single-sided copper-clad laminate was obtained in the same manner as in Example 1, except for the following steps.

〔比較例2〕 実施例1の珪素鋼板においてクロメート処理量を80a
w/rr1行なった他は実施例1と同様にして片面銅張
積層板を得た。
[Comparative Example 2] The amount of chromate treated in the silicon steel plate of Example 1 was 80a.
A single-sided copper-clad laminate was obtained in the same manner as in Example 1, except that w/rr1 was carried out.

〔比較例3〕 絶縁皮膜のない珪素鋼板を#600のサンドペーパで研
磨後電気亜鉛メッキを25g/−施したのみの珪素鋼板
に実施例1と同様にして片面銅張積層板を得た。
[Comparative Example 3] A single-sided copper-clad laminate was obtained in the same manner as in Example 1 using a silicon steel plate without an insulating film, polished with #600 sandpaper, and then electrolytically galvanized at 25 g/min.

〔比較例4〕 実施例2の珪素鋼板においてリン酸塩処理を10 g1
0f行なった他は実施例1と同様にして片面鋼張積層板
を得た。
[Comparative Example 4] The silicon steel plate of Example 2 was treated with phosphate at 10 g1
A single-sided steel-clad laminate was obtained in the same manner as in Example 1, except that 0f was carried out.

〔比較例5〕 厚さ約1μのリン酸マグネシウムで表面処理されている
珪素鋼板(S−12)を用い、実施例1と同様にして銅
張積層板を得た。
[Comparative Example 5] A copper-clad laminate was obtained in the same manner as in Example 1 using a silicon steel plate (S-12) surface-treated with magnesium phosphate and having a thickness of about 1 μm.

〔比較例6〕 比較例5の珪素鋼板の片面を#180のサンドペーパで
研磨し、この研磨面に実施例1に示す絶縁層付銅箔を重
ね合せ、実施例1と同様にして片面銅箔積層板を得た。
[Comparative Example 6] One side of the silicon steel plate of Comparative Example 5 was polished with #180 sandpaper, and the copper foil with an insulating layer shown in Example 1 was superimposed on this polished surface, and a single-sided copper foil was prepared in the same manner as in Example 1. A laminate was obtained.

実施例1〜3.および比較例1〜6で得られた珪素鋼板
ベース銅張積層板をシャーやプレスによる打抜加工性、
耐電圧(JISC2110)、300℃ハンダ耐熱性(
JISC6481に準拠)を表−1に示す、さらにそれ
ぞれの片面銅張積層板をエツチングにより銅箔を除去し
た後190℃の高温の加熱試験を行ない密着性の評価を
行ない表−1に示す、また、35℃ 5%濃度の塩水噴
霧試験72Hrにより珪素鋼板の腐食性の結果も表−1
に示す。
Examples 1-3. And the punching workability of the silicon steel plate-based copper clad laminates obtained in Comparative Examples 1 to 6 using a shear or press,
Withstand voltage (JISC2110), 300℃ soldering heat resistance (
Furthermore, after removing the copper foil from each single-sided copper-clad laminate by etching, a heating test at a high temperature of 190°C was conducted to evaluate the adhesion, and the results are shown in Table-1. Table 1 also shows the corrosiveness results of silicon steel plate by 72 hours of 5% concentration salt water spray test at 35°C.
Shown below.

以下余白 実施例かられかるとおり本発明により打返加工時による
剥離がなく耐電圧特性、耐熱性に優れるとともに裏面の
珪素鋼板面の耐食性のよい珪素鋼板ベース銅張積層板を
得ることができた。
As can be seen from the blank examples below, according to the present invention, it was possible to obtain a silicon steel plate-based copper-clad laminate that was free from peeling during back processing, had excellent voltage resistance and heat resistance, and had good corrosion resistance on the silicon steel plate surface on the back side. .

〔発明の効果〕〔Effect of the invention〕

上記発明から明らかなごとく本発明によれば■珪素鋼板
の表面の絶縁防錆皮膜を除去する工程がない、■珪素鋼
板の表面が安定した亜鉛メッキ皮膜であるので防錆効果
が高い。
As is clear from the above invention, according to the present invention, (1) there is no step of removing the insulating anti-rust coating on the surface of the silicon steel plate, and (2) the surface of the silicon steel plate is a stable galvanized coating, so that the anti-corrosion effect is high.

■亜鉛メッキは珪素鋼板と電気化学的なカで密着してい
るので接着力が高(、加工時に剥離することがない、■
加圧時に傷がついても亜鉛メッキの防錆効果により銹が
進展しにくい、■銹にくいので長期の保管が可能なので
銅張積層板にする加工工程上の時間的制約がない、■亜
鉛メッキ表面を適量のクロメート処理やリン酸塩処理を
行なっているので、この上に形成する絶縁層との密着力
が高い、■絶縁層は加工性、耐熱性、耐湿性にすぐれて
おり、長期の寿命特性がある。■珪素鋼板のもつすぐれ
た電磁特性を生かしたプリント配線板の用途を拡大する
ことが出来、またその使用温度を上げることができる。
■ Zinc plating is in close contact with the silicon steel plate by electrochemical force, so it has high adhesive strength (no peeling during processing,
Even if it gets scratched during pressurization, rust will not develop due to the rust-preventing effect of galvanizing.■ Since it is rust-resistant, it can be stored for a long time, so there is no time constraint in the process of making copper-clad laminates. ■ Galvanized surface The insulating layer is treated with appropriate amounts of chromate and phosphate, so it has high adhesion with the insulating layer formed on it. ■The insulating layer has excellent processability, heat resistance, and moisture resistance, and has a long service life. It has characteristics. ■It is possible to expand the uses of printed wiring boards that take advantage of the excellent electromagnetic properties of silicon steel sheets, and it is also possible to increase the operating temperature.

などの効果を奏し、その工業的価値は非常に大きい。It has the following effects, and its industrial value is extremely large.

特に今後、小型化・高密度化・高出力化する電子部品の
表面温度がどんどん高温化するに従いこれら部品を取り
つけるプリント配線板には高い耐熱性が要求され、また
電磁損失の少ないことや、あるいは隣接回路や電磁波発
生体からの電磁波シールド性が要求されている用途には
大きな効果を発揮する。
In particular, in the future, as the surface temperatures of electronic components become increasingly smaller, more dense, and more powerful, the printed wiring boards to which these components are attached will be required to have high heat resistance, as well as low electromagnetic loss. It is highly effective in applications that require electromagnetic shielding from adjacent circuits and electromagnetic wave generators.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明の実施例と比較例を示すもので、第1図は
一般に市販されている珪素鋼板を示すもので、その表面
に絶縁・防錆皮膜を有している状況を示し、第2図は珪
素鋼板の上に絶縁層を介して銅箔を接着したもので比較
例5を示し、第3図は珪素鋼板の上面の皮膜のみをサン
ドペーパで除去し、これに銅箔を接着した比較例6を示
し、第4図は珪素鋼板の上に亜鉛メッキを施し、さらに
クロメート処理やリン酸塩処理を施した皮膜を形成しこ
れを除去せずに銅箔を接着した実施例3を示し、第5図
は珪素鋼板を粗化したあと亜鉛メッキを施し2 さらに
クロメート処理やリン酸塩処理を施した皮膜を形成し、
これを除去せずに銅箔を接着した実施例1および2を示
す。 符号の説明 1 珪素鋼板    2 亜鉛メッキ 3 処理面     4 絶縁層 第1図
The drawings show examples and comparative examples of the present invention. Figure 1 shows a generally commercially available silicon steel plate with an insulating and rust-preventing film on its surface, and Figure 2 shows a silicon steel plate that is generally commercially available. The figure shows Comparative Example 5, in which copper foil is bonded on a silicon steel plate through an insulating layer, and Figure 3 shows a comparison in which only the film on the top surface of the silicon steel plate is removed with sandpaper, and copper foil is bonded to this. Example 6 is shown, and Figure 4 shows Example 3, in which a silicon steel plate is galvanized, a film is further treated with chromate or phosphate, and copper foil is bonded without removing this film. , Figure 5 shows a silicon steel plate that has been roughened, then galvanized, and then chromate-treated or phosphate-treated to form a film.
Examples 1 and 2 are shown in which the copper foil was bonded without removing it. Explanation of symbols 1 Silicon steel plate 2 Galvanized 3 Treated surface 4 Insulating layer Fig. 1

Claims (1)

【特許請求の範囲】 1、珪素鋼板の表面に亜鉛メッキによる電導性防錆皮膜
と、さらにクロメート処理またはリン酸塩処理による皮
膜を形成し、この上に絶縁層を介して銅箔を積層するこ
とを特徴とする珪素鋼板ベース銅張積層板の製造方法。 2、珪素鋼板に施す亜鉛メッキ量が5〜70g/m^2
であることを特徴とする特許請求範囲第1項記載の珪素
鋼板ベース銅張積層板の製造方法。 3、クロメート処理の量が10〜50mg/m^2であ
ることを特徴とする特許請求範囲第1項記載の珪素鋼板
ベース銅張積層板の製造方法。 4、リン酸塩処理の量が1〜5g/m^2であることを
特徴とする特許請求範囲第1項記載の珪素鋼板ベース銅
張積層板の製造方法。 5、珪素鋼板の表面を研磨、サンドプラスト、または薬
液処理等により表面を粗面化したあと亜鉛メッキを施す
ことを特徴とする特許請求範囲第1項記載の珪素鋼板ベ
ース銅張積層板の製造方法。
[Claims] 1. Forming a conductive anti-rust film on the surface of a silicon steel plate by galvanizing and further forming a film by chromate treatment or phosphate treatment, and then laminating copper foil on top of this with an insulating layer interposed therebetween. A method for producing a silicon steel plate-based copper-clad laminate, characterized by: 2. The amount of zinc plating applied to silicon steel plate is 5 to 70 g/m^2
A method for producing a silicon steel plate-based copper-clad laminate according to claim 1. 3. The method for manufacturing a silicon steel sheet-based copper-clad laminate according to claim 1, wherein the amount of chromate treatment is 10 to 50 mg/m^2. 4. The method for manufacturing a silicon steel sheet-based copper-clad laminate according to claim 1, wherein the amount of phosphate treatment is 1 to 5 g/m^2. 5. Manufacturing a silicon steel sheet-based copper-clad laminate according to claim 1, characterized in that the surface of the silicon steel sheet is roughened by polishing, sand blasting, chemical treatment, etc. and then galvanized. Method.
JP3514585A 1985-02-22 1985-02-22 Manufacture of silica steel plate base copper lined laminated board Pending JPS61193843A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3514585A JPS61193843A (en) 1985-02-22 1985-02-22 Manufacture of silica steel plate base copper lined laminated board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3514585A JPS61193843A (en) 1985-02-22 1985-02-22 Manufacture of silica steel plate base copper lined laminated board

Publications (1)

Publication Number Publication Date
JPS61193843A true JPS61193843A (en) 1986-08-28

Family

ID=12433736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3514585A Pending JPS61193843A (en) 1985-02-22 1985-02-22 Manufacture of silica steel plate base copper lined laminated board

Country Status (1)

Country Link
JP (1) JPS61193843A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63147636A (en) * 1986-12-11 1988-06-20 日立化成工業株式会社 Manufacture of silicon steel-plate base copper-clad laminated plate
JP2012066583A (en) * 2010-09-21 2012-04-05 Azotek Co Ltd Laminated heat radiation substrate and electronic assembly structure using the same
CN104786627A (en) * 2015-04-17 2015-07-22 新高电子材料(中山)有限公司 Polyamideimide double-sided flexible copper-clad plate and manufacture method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63147636A (en) * 1986-12-11 1988-06-20 日立化成工業株式会社 Manufacture of silicon steel-plate base copper-clad laminated plate
JP2012066583A (en) * 2010-09-21 2012-04-05 Azotek Co Ltd Laminated heat radiation substrate and electronic assembly structure using the same
CN104786627A (en) * 2015-04-17 2015-07-22 新高电子材料(中山)有限公司 Polyamideimide double-sided flexible copper-clad plate and manufacture method thereof

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