JPS6211789B2 - - Google Patents
Info
- Publication number
- JPS6211789B2 JPS6211789B2 JP55156723A JP15672380A JPS6211789B2 JP S6211789 B2 JPS6211789 B2 JP S6211789B2 JP 55156723 A JP55156723 A JP 55156723A JP 15672380 A JP15672380 A JP 15672380A JP S6211789 B2 JPS6211789 B2 JP S6211789B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- well
- oxidation
- oxide film
- material layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
Landscapes
- Element Separation (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55156723A JPS5780757A (en) | 1980-11-07 | 1980-11-07 | Manufacture of complementary mos semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55156723A JPS5780757A (en) | 1980-11-07 | 1980-11-07 | Manufacture of complementary mos semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5780757A JPS5780757A (en) | 1982-05-20 |
JPS6211789B2 true JPS6211789B2 (cs) | 1987-03-14 |
Family
ID=15633918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55156723A Granted JPS5780757A (en) | 1980-11-07 | 1980-11-07 | Manufacture of complementary mos semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5780757A (cs) |
-
1980
- 1980-11-07 JP JP55156723A patent/JPS5780757A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5780757A (en) | 1982-05-20 |
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