JPS62112791A - サ−キツトボ−ド等をエツチングするためのプラズマ反応器 - Google Patents

サ−キツトボ−ド等をエツチングするためのプラズマ反応器

Info

Publication number
JPS62112791A
JPS62112791A JP26084986A JP26084986A JPS62112791A JP S62112791 A JPS62112791 A JP S62112791A JP 26084986 A JP26084986 A JP 26084986A JP 26084986 A JP26084986 A JP 26084986A JP S62112791 A JPS62112791 A JP S62112791A
Authority
JP
Japan
Prior art keywords
reaction chamber
frit
plasma reactor
circuit board
reactor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26084986A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0129875B2 (enrdf_load_stackoverflow
Inventor
リチャード　エーレンフェルドナー
ディーター　ヴァーグナー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Voestalpine AG
Original Assignee
Voestalpine AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Voestalpine AG filed Critical Voestalpine AG
Publication of JPS62112791A publication Critical patent/JPS62112791A/ja
Publication of JPH0129875B2 publication Critical patent/JPH0129875B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0055—After-treatment, e.g. cleaning or desmearing of holes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/09—Treatments involving charged particles
    • H05K2203/095—Plasma, e.g. for treating a substrate to improve adhesion with a conductor or for cleaning holes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • ing And Chemical Polishing (AREA)
JP26084986A 1985-11-04 1986-11-04 サ−キツトボ−ド等をエツチングするためのプラズマ反応器 Granted JPS62112791A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT3170/85 1985-11-04
AT317085A AT386315B (de) 1985-11-04 1985-11-04 Plasmareaktor zum aetzen von leiterplatten

Publications (2)

Publication Number Publication Date
JPS62112791A true JPS62112791A (ja) 1987-05-23
JPH0129875B2 JPH0129875B2 (enrdf_load_stackoverflow) 1989-06-14

Family

ID=3546420

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26084986A Granted JPS62112791A (ja) 1985-11-04 1986-11-04 サ−キツトボ−ド等をエツチングするためのプラズマ反応器

Country Status (4)

Country Link
JP (1) JPS62112791A (enrdf_load_stackoverflow)
AT (1) AT386315B (enrdf_load_stackoverflow)
CH (1) CH671303A5 (enrdf_load_stackoverflow)
DE (1) DE3635647A1 (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63186875A (ja) * 1987-01-29 1988-08-02 Tadahiro Omi 表面反応成膜装置
US4997677A (en) * 1987-08-31 1991-03-05 Massachusetts Institute Of Technology Vapor phase reactor for making multilayer structures
WO1990010092A1 (en) * 1989-02-24 1990-09-07 Massachusetts Institute Of Technology A modified stagnation flow apparatus for chemical vapor deposition providing excellent control of the deposition
JPH02295116A (ja) * 1989-05-10 1990-12-06 Mitsubishi Electric Corp 半導体製造装置
US5054420A (en) * 1989-09-29 1991-10-08 Alcan International Limited Use of a particulate packed bed at the inlet of a vertical tube MOCVD reactor to achieve desired gas flow characteristics
US5134963A (en) * 1991-10-28 1992-08-04 International Business Machines Corporation LPCVD reactor for high efficiency, high uniformity deposition
US5653806A (en) * 1995-03-10 1997-08-05 Advanced Technology Materials, Inc. Showerhead-type discharge assembly for delivery of source reagent vapor to a substrate, and CVD process utilizing same
US5741363A (en) * 1996-03-22 1998-04-21 Advanced Technology Materials, Inc. Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition
CN105575796A (zh) * 2014-10-13 2016-05-11 友威科技股份有限公司 用于印刷电路板的等离子体蚀刻装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5378170A (en) * 1976-12-22 1978-07-11 Toshiba Corp Continuous processor for gas plasma etching
US4297162A (en) * 1979-10-17 1981-10-27 Texas Instruments Incorporated Plasma etching using improved electrode
US4289598A (en) * 1980-05-03 1981-09-15 Technics, Inc. Plasma reactor and method therefor
FR2538987A1 (fr) * 1983-01-05 1984-07-06 Commissariat Energie Atomique Enceinte pour le traitement et notamment la gravure de substrats par la methode du plasma reactif
DE3312307A1 (de) * 1983-04-06 1984-10-11 Sando Iron Works Co., Ltd., Wakayama, Wakayama Vorrichtung zum behandeln eines textilguts

Also Published As

Publication number Publication date
JPH0129875B2 (enrdf_load_stackoverflow) 1989-06-14
ATA317085A (de) 1987-12-15
CH671303A5 (enrdf_load_stackoverflow) 1989-08-15
DE3635647A1 (de) 1987-05-07
AT386315B (de) 1988-08-10

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