JPS6210996Y2 - - Google Patents

Info

Publication number
JPS6210996Y2
JPS6210996Y2 JP18038681U JP18038681U JPS6210996Y2 JP S6210996 Y2 JPS6210996 Y2 JP S6210996Y2 JP 18038681 U JP18038681 U JP 18038681U JP 18038681 U JP18038681 U JP 18038681U JP S6210996 Y2 JPS6210996 Y2 JP S6210996Y2
Authority
JP
Japan
Prior art keywords
tank
organic solvent
liquid storage
volatile organic
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18038681U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5885337U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18038681U priority Critical patent/JPS5885337U/ja
Publication of JPS5885337U publication Critical patent/JPS5885337U/ja
Application granted granted Critical
Publication of JPS6210996Y2 publication Critical patent/JPS6210996Y2/ja
Granted legal-status Critical Current

Links

JP18038681U 1981-12-03 1981-12-03 半導体基板の有機処理装置 Granted JPS5885337U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18038681U JPS5885337U (ja) 1981-12-03 1981-12-03 半導体基板の有機処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18038681U JPS5885337U (ja) 1981-12-03 1981-12-03 半導体基板の有機処理装置

Publications (2)

Publication Number Publication Date
JPS5885337U JPS5885337U (ja) 1983-06-09
JPS6210996Y2 true JPS6210996Y2 (enrdf_load_html_response) 1987-03-16

Family

ID=29976932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18038681U Granted JPS5885337U (ja) 1981-12-03 1981-12-03 半導体基板の有機処理装置

Country Status (1)

Country Link
JP (1) JPS5885337U (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0793254B2 (ja) * 1987-07-22 1995-10-09 松下電子工業株式会社 レジスト膜形成用基板の処理方法

Also Published As

Publication number Publication date
JPS5885337U (ja) 1983-06-09

Similar Documents

Publication Publication Date Title
US4695327A (en) Surface treatment to remove impurities in microrecesses
KR940006209A (ko) 표면 처리방법 및 장치
DE3650127D1 (de) Verfahren und vorrichtung zum entfernen von schichten von substraten.
JPH03151228A (ja) 容器の製造方法
EP0047308A1 (en) CENTRIFUGAL MICROPHONE PROCESSOR.
ES455868A1 (es) Procedimiento de formacion sobre un substrato,de una capa unimolecular de moleculas aufifilas
JPS6210996Y2 (enrdf_load_html_response)
US20020144707A1 (en) Method and apparatus for improving resist pattern developing
EP0952610A3 (en) Microelectronic device package containing a liquid and method
JPH067888A (ja) 消失模型の塗型装置
JPS6347935A (ja) 半導体基板水洗装置
JPS63199423A (ja) 半導体基板表面処理方法
JPH01226157A (ja) 半導体基板の乾燥方法
JPS5753933A (ja) Handotaisoshinoseizohoho
JPS6127970Y2 (enrdf_load_html_response)
JPS58190027A (ja) 半導体基板有機処理装置
WO1993018221A3 (de) Verfahren und vorrichtung zur behandlung von textilen substraten in überkritischen fluida
JPS6097351A (ja) レジスト塗布装置
JPH089765B2 (ja) セラミツク溶射材の封孔処理方法
JPH058676Y2 (enrdf_load_html_response)
JPH0362521A (ja) 半導体ウエハの洗浄方法およびその装置
JPS6038677Y2 (ja) 表面処理槽
JPH0222057Y2 (enrdf_load_html_response)
KR19990066233A (ko) 반도체 웨이퍼 기상분해시스템 및 이를 사용한 기상분해방법
SU1426659A1 (ru) Устройство дл нанесени покрыти