JPS62109737U - - Google Patents
Info
- Publication number
- JPS62109737U JPS62109737U JP19940485U JP19940485U JPS62109737U JP S62109737 U JPS62109737 U JP S62109737U JP 19940485 U JP19940485 U JP 19940485U JP 19940485 U JP19940485 U JP 19940485U JP S62109737 U JPS62109737 U JP S62109737U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- gas
- switching valve
- transfer pipe
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003028 elevating effect Effects 0.000 claims 1
- 230000017525 heat dissipation Effects 0.000 claims 1
- 238000009832 plasma treatment Methods 0.000 claims 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Description
第１図、第２図は本考案の一実施例である真空
処理装置を示す断面図である。
１……処理室、２……試料台電極、６，９……
ガス移送管、１１……シリンダ、１２……ガス供
給装置、１７……切換え弁室、１８……切換え弁
。
1 and 2 are cross-sectional views showing a vacuum processing apparatus which is an embodiment of the present invention. 1... Processing chamber, 2... Sample stage electrode, 6, 9...
Gas transfer pipe, 11... cylinder, 12... gas supply device, 17... switching valve chamber, 18... switching valve.
Claims (1)
あつて試料を載置し前記処理室内にプラズマを発
生させるための資料台電極と、該試料台電極上の
プラズマ処理によつて高温加熱した試料の熱伝導
による放熱を促進させる熱伝導媒体ガスを供給す
るガス供給装置と、前記試料台電極と前記試料と
の間に前記ガス供給装置からの熱伝導媒体ガスを
移送するガス移送管とから成り、前記試料台電極
の内部に前記ガス移送管が通り途中に切換え弁室
を有し、前記ガス移送管には前記試料台電極内部
の切換え弁室部で切換え弁を有し、前記切換え弁
室内で前記切換え弁を上下させ前記熱伝導媒体ガ
スの流路を切り換える昇降手段を具備したことを
特徴とする真空処理装置。 A processing chamber whose inside is evacuated, a material stand electrode for placing a sample in the processing chamber and generating plasma in the processing chamber, and a sample heated to a high temperature by plasma treatment on the sample stand electrode. a gas supply device that supplies a heat conduction medium gas that promotes heat dissipation by heat conduction; and a gas transfer pipe that transfers the heat conduction medium gas from the gas supply device between the sample stage electrode and the sample. The gas transfer pipe has a switching valve chamber inside the sample stage electrode, and the gas transfer pipe has a switching valve inside the sample stage electrode, and the gas transfer pipe has a switching valve inside the sample stage electrode. A vacuum processing apparatus characterized in that the vacuum processing apparatus is equipped with an elevating means for moving the switching valve up and down to switch the flow path of the heat transfer medium gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19940485U JPS62109737U (en) | 1985-12-27 | 1985-12-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19940485U JPS62109737U (en) | 1985-12-27 | 1985-12-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62109737U true JPS62109737U (en) | 1987-07-13 |
Family
ID=31160996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19940485U Pending JPS62109737U (en) | 1985-12-27 | 1985-12-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62109737U (en) |
-
1985
- 1985-12-27 JP JP19940485U patent/JPS62109737U/ja active Pending
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