JPS6410946U - - Google Patents

Info

Publication number
JPS6410946U
JPS6410946U JP10554487U JP10554487U JPS6410946U JP S6410946 U JPS6410946 U JP S6410946U JP 10554487 U JP10554487 U JP 10554487U JP 10554487 U JP10554487 U JP 10554487U JP S6410946 U JPS6410946 U JP S6410946U
Authority
JP
Japan
Prior art keywords
container
chamber
ion source
oven
cooling system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10554487U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10554487U priority Critical patent/JPS6410946U/ja
Publication of JPS6410946U publication Critical patent/JPS6410946U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図、第2図、第3図はそれぞれ本考案の実
施例を示す。第4図は、従来よりのイオン源固体
オーブンの一例を示す。 1……イオン源室、2……導入管、3……オー
ブンチヤンバー、4……オーブン容器、5……加
熱機構、6……固体金属、7……円筒支持体、8
……エアー供給管、9,10,11……バルブ、
12……冷却板、13……ベローズ、14……支
柱。
1, 2, and 3 each show an embodiment of the present invention. FIG. 4 shows an example of a conventional ion source solid state oven. DESCRIPTION OF SYMBOLS 1...Ion source chamber, 2...Introduction tube, 3...Oven chamber, 4...Oven container, 5...Heating mechanism, 6...Solid metal, 7...Cylindrical support, 8
...Air supply pipe, 9,10,11...Valve,
12... Cooling plate, 13... Bellows, 14... Support.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] オーブンチヤンバー内にオーブン容器、前記容
器に対する加熱機構、前記チヤンバー内外に前記
容器と外界との間に介在する冷却系を備えるイオ
ン源において、前記容器を熱伝導率の小さい支柱
で前記チヤンバーに支持し、前記容器の加熱時、
前記冷却系に熱伝導を著しく小さくする機構を備
えることを特徴とするイオン源。
In an ion source that includes an oven container in an oven chamber, a heating mechanism for the container, and a cooling system interposed between the container and the outside world inside and outside the chamber, the container is supported on the chamber by supports with low thermal conductivity. and when heating the container,
An ion source characterized in that the cooling system is equipped with a mechanism that significantly reduces heat conduction.
JP10554487U 1987-07-09 1987-07-09 Pending JPS6410946U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10554487U JPS6410946U (en) 1987-07-09 1987-07-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10554487U JPS6410946U (en) 1987-07-09 1987-07-09

Publications (1)

Publication Number Publication Date
JPS6410946U true JPS6410946U (en) 1989-01-20

Family

ID=31338252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10554487U Pending JPS6410946U (en) 1987-07-09 1987-07-09

Country Status (1)

Country Link
JP (1) JPS6410946U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01246747A (en) * 1988-03-29 1989-10-02 Ulvac Corp Ion source
JPWO2016046939A1 (en) * 2014-09-25 2017-04-27 三菱電機株式会社 Ion implanter
JP2017523566A (en) * 2014-07-02 2017-08-17 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド Dynamic temperature controller for ion source

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01246747A (en) * 1988-03-29 1989-10-02 Ulvac Corp Ion source
JP2017523566A (en) * 2014-07-02 2017-08-17 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド Dynamic temperature controller for ion source
JPWO2016046939A1 (en) * 2014-09-25 2017-04-27 三菱電機株式会社 Ion implanter
CN107078005A (en) * 2014-09-25 2017-08-18 三菱电机株式会社 Ion implantation apparatus
US10043635B2 (en) 2014-09-25 2018-08-07 Mitsubishi Electric Corporation Ion implantation apparatus
DE112014006989B4 (en) 2014-09-25 2022-12-22 Mitsubishi Electric Corporation ion implanter

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