JPS62108408A - Transparent electrode - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a transparent electrode using a plastic film or sheet as a substrate.

More specifically, applications using transparent conductivity, such as electrodes for liquid crystal displays, electrodes for electroluminescent materials, electrodes for touch panels, electrodes for photoconductive photoreceptors, and electrodes for laminated devices (for example, liquid crystal color displays, etc.), etc. The present invention relates to a transparent electrode made of a plastic film or Geton substrate that can be widely used in the fields of electronics and electricity.

[Prior art]

The currently widely used transparent electrodes are tin oxide films or I To (Indium Tin Oxide) films on glass.
It is formed by forming a film or the like. However, since the base material is glass, properties such as flexibility and processability are inferior, and therefore, depending on the application, it may not be used as a preferable material.

Therefore, in recent years, transparent electrodes based on plastic films or sheets have attracted attention in terms of flexibility, processability, impact resistance, lightweight, etc. There were problems with the incorporation, moisture permeation resistance, and airflow resistance of transparent electrodes that were directly provided on sheet substrates. Moisture resistance and air resistance can be satisfied to some extent or obtained by increasing the thickness of the plastic film or sheet substrate, or by laminating a plastic film with high gas barrier and water vapor barrier properties on the substrate. However, in order to obtain a substrate with sufficient moisture permeability and airflow resistance, the thickness of the plastic film or sheet and/or the thickness of the plastic film with high gas barrier properties and water vapor barrier properties should be adjusted.
It was quite thick (because it had no choice but to do so, it became a problem in terms of gender).

The present inventors first laminated a transparent modified layer of a low melting point metal, a transparent metal oxide layer that is not corroded by hydrochloric acid, and a transparent conductive layer on one side of a plastic film or sheet. The transparent electrode has excellent moisture permeability, air permeability, and flexibility, and also satisfies other performance requirements for transparent electrodes, such as transparency, conductivity, chemical resistance, scratch resistance, etc. It was disclosed that the material can be used as a transparent electrode.

[Problem that the invention seeks to solve]

An object of the present invention is to provide a transparent electrode having a structure different from the above-described invention of the present inventors.

[Means for solving problems]

The inventors of the present invention have intensively studied methods for producing transparent electrodes using plastic films or sheet substrates, and have found that transparent electrodes having the following configuration are superior in terms of performance and
They have discovered that it can be manufactured by a simple method and have finally arrived at the present invention.

That is, the present invention provides: (1) a transparent plastic film or sheet (low in g) (both of which are layered on one side with a substance selected from metal oxides, metal nitrides, metal carbides, and metals);
j! :Characteristic transparent electrode.

(2) Metal oxide, metal nitride, metal carbide film layer (C) on one side of the transparent plastic film or sheet
1. A transparent electrode characterized in that a transparent conductive layer) is laminated in sequence, and a transparent conductive layer is laminated on the opposite side.

(3) A transparent electrode characterized in that a transparent conductive layer (Dl) is laminated on one side of a transparent plastic film or sheet (Al) and on the other side of a metal oxide, metal nitride, or metal carbide.

It is.

Hereinafter, the present invention will be explained in detail with reference to the drawings.

1 to 3 are cross-sectional views showing the structure of the transparent electrode according to the present invention. In the figures, 1 is a substrate made of a plastic film or sheet, and 2 is a material made of a metal oxide, metal nitride, or metal carbide. and out of metal.

Plastic film or sheet used in the present invention (5)
As such, it has a low light transmittance at a wavelength of 600 nm (preferably 80% or more, but this does not apply if the film itself is a polarizing film).

In addition, hydrophobic resins are preferable as materials, and examples of preferable resins include polyolefin, polyester, polyamide, polyether, polysulfone, polyvinyl,
Examples include homopolymers or copolymers such as polyether sulfone and polycarbonate.

The thickness of the plastic film or sheet used in the present invention is usually 5 to 1000 μm, preferably 30 to 1000 μm.
A suitable thickness is 500 μm, more preferably 50 to 200 μm.

Metal oxides, metal nitrides, metals used in the present invention, usually 10
~10. ODD^, preferably 50 to 2,000 shaku, more preferably 2CIO to 1,000 λ, and the light transmittance at 600 nm after laminating the layers is 90% or more of that before laminating. This is desirable. on the other hand,
Among these layers, a low melting point metal oxide layer is preferably used for the layer in contact with the transparent plastic film or sheet. Here, a low melting point metal is a metal with a melting point of 10008C.
Hereinafter, metals or alloys with a temperature of 500°C or less are preferably used, especially Zn, At, Sb, and In.

Sn and mixtures or alloys thereof are preferably used. Note that these oxides may contain a trace amount of impurity. On the other hand, in the case of the transparent electrode according to claim 3, a transparent metal baride layer that is not corroded by hydrochloric acid is preferably used as the outermost layer,
Among these, aluminum oxide, silicon oxide, zirconium oxide, titanium oxide, and mixtures thereof are preferably used. Note that these carbides contain a trace amount of impurity, and it is suitable that the light transmittance at 600 nm after laminating the layers is 90% or more of that before lamination. Note that the layer may be a multilayer. Any base material may be used as long as the atomic fraction of elements other than carbon, hydrogen, nitrogen, and oxygen is 30% or less, preferably 20% or less, and more preferably 10% or less (spray method). The film is formed using a known method such as a coating method, a plasma processing method, or the like.

The transparent conductive layer n has a sheet resistivity of 10 to 0.
If the light transmittance at 600 nm after laminating the layers is 7 or less, preferably 500Ω/or less, oxides of sb, In, Sn, and mixtures or alloys thereof are listed. On the other hand, the thickness of the layer is usually
So-10,00OA, better (100-5.
It is 00OA.

〔Effect of the invention〕

The transparent electrode of the present invention, like the transparent electrode of the present inventors' previous invention (Japanese Patent Application No. 60-029444), has a property that is flexible, has chemical resistance, moisture barrier property, gas barrier property,
However, since the structure is different from the transparent electrode of the previous invention, it is possible to diversify the manufacturing method of the transparent electrode.

〔Example〕

Hereinafter, the present invention will be explained in detail with reference to Examples. In addition, the measured values in the examples were based on the following method.

The light transmittance at 6 [) Onm was measured using a 1 fM light transmittance visible spectrophotometer.

electrical resistivity It was measured using the four-probe method and converted to obtain the sheet resistivity.

Film thickness It was determined by a cutting method using a transmission electron microscope.

The sample was immersed in 18% hydrochloric acid until the conductivity was 18%, thoroughly washed with water and dried, and then measured in accordance with Condition B of JISZ 020B.

Example 1 On one side of an unstretched film made of polyethersulfone with a thickness of 100 μm and a light transmittance of 89% at 600 nm, an indium oxide film/a plasma polymerized film using ethylene as a monomer/an oxide, and an indium film were formed in this order. did. Note that the indium oxide film was formed by high frequency ion blating method.

The film thickness of the laminate is 800A15000A/70
It was 0A. In addition, the characteristics of the laminate include a light transmittance of 8
0%, electrical resistivity 100Ω/mouth, moisture permeability 16f/rrI
-day.

Example 2 ITO (Sn: 5%) films were formed on both sides of the film used in Example 1 by magnetron sputtering. Thereafter, a hexamethyldisilazane film was formed on one side of the I'IN) film by a spray method.

The film thickness of the laminate is 1200A/film (100μm
)/1200^/4μm. In addition, the characteristics of the laminate include a light transmittance of 81% and an electrical resistivity of 1000Ω/
The moisture permeation rate was 14 y/m/day.

Example 6 One side of the film of Example 2 in which double-sided ITO films were laminated,
A tin oxide film and a silicon oxide film were sequentially laminated using the high frequency ion blating method.

The film thickness of the laminate is 1200A/film (100μm
) The characteristics of the laminate are a light transmittance of 79% and a moisture permeability of 152%.
It was ♂ day.

[Brief explanation of drawings]

1 to 3 are cross-sectional views showing the structure of a transparent electrode according to the present invention, in which 1 is a substrate, 2 is a barrier layer, 3 is an organic layer,
4 is a conductive layer. Patent Applicant: Mitsui Toatsu Chemical Co., Ltd. Drawing 81 Figure 2 Figure 30 □1 ＼Fast Procedure Principal Fu Zheng Shuei) July 9, 1986

Claims (7)

[Claims] (1) On at least one side of the transparent plastic film or sheet (A), one or more transparent thin film layers (B ), transparent organic thin film layer (C
) and a transparent conductive layer (D), which are successively laminated. (2) On one side of the transparent plastic film or sheet (A), one or more transparent thin film layers (B) made of any one of metal oxides, metal nitrides, metal carbides, and metals. A transparent electrode characterized in that transparent organic thin film layers (C) are sequentially laminated, and a transparent conductive layer (D) is laminated on the opposite side. (3) On one side of the transparent plastic film or sheet (A), one or more transparent thin film layers (B) made of any one of metal oxides, metal nitrides, metal carbides, and metals. are laminated, and a transparent conductive layer (D
) is laminated. (4) Among the transparent thin film layers (B), at least the layer in contact with the transparent plastic film or sheet (A) is
The transparent electrode according to any one of claims 1 to 3, which is a transparent oxide layer (E) of a low melting point metal. (5) The transparent oxide layer (E) of a low melting point metal contains one or more metal oxides selected from the group consisting of zinc oxide, aluminum oxide, antimony oxide, indium oxide, and tin oxide. 5. The transparent electrode according to claim 4, which is a layer comprising: (6) Of the transparent thin film layer (B), the layer in contact with the plastic film or sheet (A) is a transparent oxide layer (E) of a low melting point metal, and the outermost layer on the opposite side is a transparent layer that is not corroded by hydrochloric acid. The transparent electrode according to claim 3, which is a metal oxide layer (F). (7) Transparent metal oxide layer (F
) is a layer containing one or more metal oxides selected from the group consisting of aluminum oxide, silicon oxide, zirconium oxide, and titanium oxide.
Transparent electrode as described in section.