JPS62103379A - Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 - Google Patents

Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Info

Publication number
JPS62103379A
JPS62103379A JP24366285A JP24366285A JPS62103379A JP S62103379 A JPS62103379 A JP S62103379A JP 24366285 A JP24366285 A JP 24366285A JP 24366285 A JP24366285 A JP 24366285A JP S62103379 A JPS62103379 A JP S62103379A
Authority
JP
Japan
Prior art keywords
vacuum chamber
dry etching
lid
main body
cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24366285A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0553871B2 (show.php
Inventor
Yutaka Kato
豊 加藤
Eizo Isoyama
礒山　永三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP24366285A priority Critical patent/JPS62103379A/ja
Publication of JPS62103379A publication Critical patent/JPS62103379A/ja
Publication of JPH0553871B2 publication Critical patent/JPH0553871B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP24366285A 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 Granted JPS62103379A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24366285A JPS62103379A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24366285A JPS62103379A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Publications (2)

Publication Number Publication Date
JPS62103379A true JPS62103379A (ja) 1987-05-13
JPH0553871B2 JPH0553871B2 (show.php) 1993-08-11

Family

ID=17107136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24366285A Granted JPS62103379A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Country Status (1)

Country Link
JP (1) JPS62103379A (show.php)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6027792A (en) * 1995-10-03 2000-02-22 Kabushiki Kaisha Kobe Seiko Sho Coating film excellent in resistance to halogen-containing gas corrosion and halogen-containing plasma corrosion, laminated structure coated with the same, and method for producing the same
US6533910B2 (en) 2000-12-29 2003-03-18 Lam Research Corporation Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
US6537429B2 (en) 2000-12-29 2003-03-25 Lam Research Corporation Diamond coatings on reactor wall and method of manufacturing thereof
US6613442B2 (en) 2000-12-29 2003-09-02 Lam Research Corporation Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
US6620520B2 (en) 2000-12-29 2003-09-16 Lam Research Corporation Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
US6790242B2 (en) 2000-12-29 2004-09-14 Lam Research Corporation Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof
US6830622B2 (en) 2001-03-30 2004-12-14 Lam Research Corporation Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof
US7128804B2 (en) 2000-12-29 2006-10-31 Lam Research Corporation Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4796464B2 (ja) 2005-11-17 2011-10-19 株式会社神戸製鋼所 耐食性に優れたアルミニウム合金部材

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6027792A (en) * 1995-10-03 2000-02-22 Kabushiki Kaisha Kobe Seiko Sho Coating film excellent in resistance to halogen-containing gas corrosion and halogen-containing plasma corrosion, laminated structure coated with the same, and method for producing the same
US6533910B2 (en) 2000-12-29 2003-03-18 Lam Research Corporation Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
US6537429B2 (en) 2000-12-29 2003-03-25 Lam Research Corporation Diamond coatings on reactor wall and method of manufacturing thereof
US6613442B2 (en) 2000-12-29 2003-09-02 Lam Research Corporation Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
US6620520B2 (en) 2000-12-29 2003-09-16 Lam Research Corporation Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
US6773751B2 (en) 2000-12-29 2004-08-10 Lam Research Corporation Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
US6790242B2 (en) 2000-12-29 2004-09-14 Lam Research Corporation Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof
US7128804B2 (en) 2000-12-29 2006-10-31 Lam Research Corporation Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
US7255898B2 (en) 2000-12-29 2007-08-14 Lam Research Corporation Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
US7605086B2 (en) 2000-12-29 2009-10-20 Lam Research Corporation Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
US8486841B2 (en) 2000-12-29 2013-07-16 Lam Research Corporation Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
US6830622B2 (en) 2001-03-30 2004-12-14 Lam Research Corporation Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof

Also Published As

Publication number Publication date
JPH0553871B2 (show.php) 1993-08-11

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