JPS6194388A - Semiconductor laser element - Google Patents

Semiconductor laser element

Info

Publication number
JPS6194388A
JPS6194388A JP21663684A JP21663684A JPS6194388A JP S6194388 A JPS6194388 A JP S6194388A JP 21663684 A JP21663684 A JP 21663684A JP 21663684 A JP21663684 A JP 21663684A JP S6194388 A JPS6194388 A JP S6194388A
Authority
JP
Japan
Prior art keywords
laser
section
inp
beams
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21663684A
Other languages
Japanese (ja)
Other versions
JP2681909B2 (en
Inventor
Yasushi Matsui
松井 康
Tomoaki Uno
智昭 宇野
Masato Ishino
正人 石野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59216636A priority Critical patent/JP2681909B2/en
Publication of JPS6194388A publication Critical patent/JPS6194388A/en
Application granted granted Critical
Publication of JP2681909B2 publication Critical patent/JP2681909B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To modulate an output from laser beams without changing injecting currents, and to obtain oscillating beams at a stable mode by electrically controlling a degree in which laser beams are coupled with an optical waveguide section adjacently arranged to a semiconductor laser section. CONSTITUTION:An InGaAsP optical waveguide layer 12, N<+>-InP 13, an InGaAsP active layer 21 and a P<+>-InP clad 14 are superposed on an N<+>-InP substrate 11, a P<+>-InP loading section is formed, and ohmic electrodes 16, 17 are attached. The active layer 21 and the clad layer 14 are buried to P-InP 19 and N-InP 20. Currents are injected from the electrode 16, beams emitted from the active layer 21 are laser-oscillated while crossing the waveguide layer 12, and there is a laser output even under the loading section 15 by distribution coupling. When constant currents are flowed through a laser section and the refractive index of a waveguide is changed by an electro-optic effect by utilizing a P-N junction under the loading section 15, coupling with the laser section varies, and an optical output from the laser section largely alters, thus acquiring oscillating beams at a mode more stable than normal direct modulation.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は半導体レーザ素子の変調構造に関する。[Detailed description of the invention] Industrial applications The present invention relates to a modulation structure for a semiconductor laser device.

従来例の構成とその問題点 従来半導体レーザの変調方式は、活性層に注入する電流
を変化させることにより行なう直接変調方式が主流であ
る。しかし電流注入量を変化させることによりレーザ部
の屈折率の変化に伴う発振モード変化が発生し、それが
ノイズ等の原因となっていた。従来の基本構成例を第1
図に示す。ここで1はn型半導体基板、2は活性層、3
はP型クラッド層、4はP型層へのオーミック電極、5
はn型基板へのオーミック電極、6.7はそれぞれPお
よびn型の埋込み層である。
Conventional Structures and Problems The main modulation method for conventional semiconductor lasers is the direct modulation method, which is performed by changing the current injected into the active layer. However, changing the amount of current injection causes a change in oscillation mode due to a change in the refractive index of the laser section, which causes noise and the like. The conventional basic configuration example is the first
As shown in the figure. Here, 1 is an n-type semiconductor substrate, 2 is an active layer, and 3
is a P-type cladding layer, 4 is an ohmic electrode to the P-type layer, 5 is
is an ohmic electrode to the n-type substrate, and 6.7 are P- and n-type buried layers, respectively.

発明の目的 本発明は、半導体レーザに注入するキャリア密度を変化
させることなく光出力を変調できる半導体発光素子を得
ることを目的とする。
OBJECTS OF THE INVENTION It is an object of the present invention to provide a semiconductor light emitting device that can modulate optical output without changing the carrier density injected into a semiconductor laser.

発明の構成 本発明は半導体レーザ部に近接して配置された光導波路
部にレーザ光が結合でる度合を電気的に制御することに
より変調信号光を得るものである。
Structure of the Invention The present invention obtains modulated signal light by electrically controlling the degree to which laser light is coupled to an optical waveguide section disposed close to a semiconductor laser section.

実施例の説明 本発明の一実施例のレーザ素子構成を第2図を用いて説
明する。なお説明には便宜上InGaAsP系の半導体
材料を用いるが本発明はこの材料に限定されるものでは
ない。第2図はレーザ共振器方向に対し垂直な方向での
断面図である。第2図において11はn+−InP基板
、12はInGILASP光導波層、13はn−InP
層、21はInGaAsP活性層、1a(dP+−In
Pクラッド層、16はP−InP装荷部、16はP+−
InPクラッド14に対するオーミック電極、17ばP
+−InP装荷部15に対するオーミック電極、18は
n+−InP基板111C対するオーミック電極、また
1 9 、20はそれぞれPおよびn−InP埋込み層
である。ここで電極16から電流注入されたことにより
発光するレーザ光は図中の破線で示した部分に分布する
。すなわち活性層21で発光した光は導波層12にまた
がった形で発光しレーザ発振を起こす。またレーザスト
ライプ近傍に形成された装荷部15の直下には導波路が
形成されているため分布結合によジレーザ出力はこの装
荷部15の下にも存在する。
DESCRIPTION OF EMBODIMENTS The configuration of a laser element according to an embodiment of the present invention will be described with reference to FIG. In the description, an InGaAsP-based semiconductor material is used for convenience, but the present invention is not limited to this material. FIG. 2 is a cross-sectional view taken in a direction perpendicular to the direction of the laser resonator. In FIG. 2, 11 is an n+-InP substrate, 12 is an InGILASP optical waveguide layer, and 13 is an n-InP substrate.
layer 21 is an InGaAsP active layer, 1a (dP+-In
P cladding layer, 16 is P-InP loading part, 16 is P+-
Ohmic electrode for InP cladding 14, 17P
An ohmic electrode 18 is for the +-InP loading section 15, an ohmic electrode 18 is for the n+-InP substrate 111C, and 19 and 20 are P and n-InP buried layers, respectively. Here, the laser light emitted by the current injected from the electrode 16 is distributed in the portion shown by the broken line in the figure. That is, the light emitted from the active layer 21 is emitted across the waveguide layer 12, causing laser oscillation. Further, since a waveguide is formed directly under the loading section 15 formed near the laser stripe, the laser output is also present under the loading section 15 due to distributed coupling.

ここでレーザ部に一定の電流を流した状態において、装
荷部15下部に形成されたP−N接合を利用し装荷部下
の導波路の屈折率を電気光学効果により変化させるとレ
ーザ部と装荷部との結合が変化し、レーザ部の光出力は
大さく変化する。
Here, when a constant current is flowing through the laser section, the refractive index of the waveguide under the loading section is changed by electro-optic effect using the P-N junction formed at the bottom of the loading section 15. As a result, the optical output of the laser section changes significantly.

これを利用すればレーザ部の注入電流を直接液イヒさせ
ることなく変調が可能となる。またここでレーザ部とし
てDFBレーザ等の襞間面を必要としないものを用いる
ことにより光集積回路への応用が可能となる。
By utilizing this, it becomes possible to modulate the current injected into the laser section without directly causing it to ignite. Furthermore, by using a laser section that does not require an interfold surface, such as a DFB laser, application to optical integrated circuits becomes possible.

発明の効果 半導体レーザ光の出力を、注入電流を変化させることな
く変調可能となり、通常の直接変調に比べ安定したモー
ドでの発振光が得られる。
Effects of the Invention The output of semiconductor laser light can be modulated without changing the injection current, and oscillation light in a more stable mode can be obtained than in normal direct modulation.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は半導体レーザの従来例の断面図、第2図は本発
明の一実施例の半導体レーザ素子の断面図である。 11 ・・・・n型半導体基板、12  ・光導波層、
13 ・ n型半導体分離層、21− ・活性層、14
・・ P クラッド層、15,15,16.1617.
17’、18・・・・・オーミック電極、19゜20 
・・埋込み層。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
FIG. 1 is a sectional view of a conventional example of a semiconductor laser, and FIG. 2 is a sectional view of a semiconductor laser element according to an embodiment of the present invention. 11... n-type semiconductor substrate, 12 - optical waveguide layer,
13 - n-type semiconductor separation layer, 21- - active layer, 14
... P cladding layer, 15,15,16.1617.
17', 18...Ohmic electrode, 19°20
...Embedded layer. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
figure

Claims (2)

【特許請求の範囲】[Claims] (1)同一半導体基板上に発光機能を有するレーザ部と
すくなくとも一部が前記レーザ部と近接しかつレーザス
トライプに平行に光導波路が形成され、前記光導波路の
伝搬特性を電気的に変化させることによりレーザ光を前
記光導波路部に結合させることにより前記レーザ出力を
制御することを特徴とした半導体レーザ素子。
(1) A laser section having a light emitting function and an optical waveguide, at least a part of which is close to the laser section and parallel to the laser stripe, are formed on the same semiconductor substrate, and the propagation characteristics of the optical waveguide are electrically changed. A semiconductor laser device characterized in that the laser output is controlled by coupling laser light to the optical waveguide section.
(2)半導体レーザがその発振波長に対し十分透明な光
導波領域を該半導体レーザの活性層近傍に構成している
ことを特徴とする該レーザ部を有する特許請求の範囲第
1項記載の半導体レーザ素子。
(2) A semiconductor according to claim 1, which has a laser section, characterized in that the semiconductor laser has an optical waveguide region that is sufficiently transparent for its oscillation wavelength in the vicinity of the active layer of the semiconductor laser. laser element.
JP59216636A 1984-10-16 1984-10-16 Semiconductor laser device Expired - Lifetime JP2681909B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59216636A JP2681909B2 (en) 1984-10-16 1984-10-16 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59216636A JP2681909B2 (en) 1984-10-16 1984-10-16 Semiconductor laser device

Publications (2)

Publication Number Publication Date
JPS6194388A true JPS6194388A (en) 1986-05-13
JP2681909B2 JP2681909B2 (en) 1997-11-26

Family

ID=16691539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59216636A Expired - Lifetime JP2681909B2 (en) 1984-10-16 1984-10-16 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JP2681909B2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5019441A (en) * 1973-05-18 1975-02-28
JPS56108261A (en) * 1980-02-01 1981-08-27 Nec Corp Optical integrated circuit
JPS57207387A (en) * 1981-06-16 1982-12-20 Nec Corp Semiconductor optical function element
JPS6072286A (en) * 1983-09-28 1985-04-24 Nippon Telegr & Teleph Corp <Ntt> Wave guide coupled type semiconductor light emitting device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5019441A (en) * 1973-05-18 1975-02-28
JPS56108261A (en) * 1980-02-01 1981-08-27 Nec Corp Optical integrated circuit
JPS57207387A (en) * 1981-06-16 1982-12-20 Nec Corp Semiconductor optical function element
JPS6072286A (en) * 1983-09-28 1985-04-24 Nippon Telegr & Teleph Corp <Ntt> Wave guide coupled type semiconductor light emitting device

Also Published As

Publication number Publication date
JP2681909B2 (en) 1997-11-26

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