JPS6190485A - パルスレ−ザ発振器 - Google Patents
パルスレ−ザ発振器Info
- Publication number
- JPS6190485A JPS6190485A JP21284284A JP21284284A JPS6190485A JP S6190485 A JPS6190485 A JP S6190485A JP 21284284 A JP21284284 A JP 21284284A JP 21284284 A JP21284284 A JP 21284284A JP S6190485 A JPS6190485 A JP S6190485A
- Authority
- JP
- Japan
- Prior art keywords
- laser
- electrode
- capacitor
- main
- laser gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003990 capacitor Substances 0.000 claims abstract description 47
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 230000003287 optical effect Effects 0.000 claims description 8
- 238000007600 charging Methods 0.000 claims description 5
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 7
- 230000006866 deterioration Effects 0.000 abstract description 3
- 238000009434 installation Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract description 2
- 238000009413 insulation Methods 0.000 abstract 3
- 238000012423 maintenance Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 81
- 230000005284 excitation Effects 0.000 description 19
- 230000010355 oscillation Effects 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000470 constituent Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 230000003252 repetitive effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 101100137546 Arabidopsis thaliana PRF2 gene Proteins 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 241000254158 Lampyridae Species 0.000 description 1
- 101150004094 PRO2 gene Proteins 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000010278 pulse charging Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21284284A JPS6190485A (ja) | 1984-10-09 | 1984-10-09 | パルスレ−ザ発振器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21284284A JPS6190485A (ja) | 1984-10-09 | 1984-10-09 | パルスレ−ザ発振器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6190485A true JPS6190485A (ja) | 1986-05-08 |
JPH0237707B2 JPH0237707B2 (enrdf_load_stackoverflow) | 1990-08-27 |
Family
ID=16629240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21284284A Granted JPS6190485A (ja) | 1984-10-09 | 1984-10-09 | パルスレ−ザ発振器 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6190485A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1988000403A1 (en) * | 1986-06-30 | 1988-01-14 | Kabushiki Kaisha Komatsu Seisakusho | Gas laser |
JPS6377179A (ja) * | 1986-09-19 | 1988-04-07 | Horiba Ltd | N↓2レ−ザ |
JPS6367275U (enrdf_load_stackoverflow) * | 1986-10-21 | 1988-05-06 | ||
JPH0467693A (ja) * | 1990-07-09 | 1992-03-03 | Mitsubishi Electric Corp | 放電励起レーザ装置 |
JPH04221869A (ja) * | 1990-12-21 | 1992-08-12 | Mitsubishi Electric Corp | エキシマレーザ装置 |
KR20210060342A (ko) * | 2019-11-18 | 2021-05-26 | 셈블렉스 코포레이션 | 고강도 스틸용 패스너 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60192467U (ja) * | 1984-05-31 | 1985-12-20 | 日本電気株式会社 | パルスガスレ−ザ装置 |
-
1984
- 1984-10-09 JP JP21284284A patent/JPS6190485A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60192467U (ja) * | 1984-05-31 | 1985-12-20 | 日本電気株式会社 | パルスガスレ−ザ装置 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1988000403A1 (en) * | 1986-06-30 | 1988-01-14 | Kabushiki Kaisha Komatsu Seisakusho | Gas laser |
JPS6377179A (ja) * | 1986-09-19 | 1988-04-07 | Horiba Ltd | N↓2レ−ザ |
JPS6367275U (enrdf_load_stackoverflow) * | 1986-10-21 | 1988-05-06 | ||
JPH0467693A (ja) * | 1990-07-09 | 1992-03-03 | Mitsubishi Electric Corp | 放電励起レーザ装置 |
JPH04221869A (ja) * | 1990-12-21 | 1992-08-12 | Mitsubishi Electric Corp | エキシマレーザ装置 |
KR20210060342A (ko) * | 2019-11-18 | 2021-05-26 | 셈블렉스 코포레이션 | 고강도 스틸용 패스너 |
Also Published As
Publication number | Publication date |
---|---|
JPH0237707B2 (enrdf_load_stackoverflow) | 1990-08-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3524367B2 (ja) | 高パルス繰返し速度エキシマーレーザーのための空気力学的チャンバー設計 | |
US6636545B2 (en) | Supersonic and subsonic laser with radio frequency excitation | |
US5313486A (en) | Discharge excitation pulsed laser oscillation device | |
JPS6190485A (ja) | パルスレ−ザ発振器 | |
JP2001168432A (ja) | 紫外線を放出するガスレーザ装置 | |
JP6701198B2 (ja) | レーザチャンバ | |
JP4326172B2 (ja) | 低圧軸方向励起方式f2レーザ装置 | |
JP3979863B2 (ja) | 放電励起ガスレーザ装置 | |
JP4845094B2 (ja) | 放電励起式パルス発振ガスレーザ装置 | |
US20250266654A1 (en) | Gas laser device and electronic device manufacturing method | |
JP2004179599A (ja) | 放電励起ガスレーザ装置 | |
JP3159528B2 (ja) | 放電励起エキシマレーザ装置 | |
JP2002076489A (ja) | フッ素レーザ装置及びこれを用いた露光装置 | |
Bragin et al. | Prospects for very high repetition rate lasers for microlithography | |
JPS6190481A (ja) | パルスレ−ザ発振器 | |
JPS5850788A (ja) | 横方向励起型ガスレ−ザ装置 | |
JP2004186310A (ja) | 気体レーザのコロナ予備電離方法及び装置 | |
JP2025100133A (ja) | レーザチャンバ、ガスレーザ装置、及び電子デバイスの製造方法 | |
Sugii et al. | Compact, semi‐sealed‐off, high‐repetition‐rate transversely excited atmospheric‐pressure CO2 laser with a surface‐wire‐corona preionization | |
JPS6218781A (ja) | レ−ザ発振器 | |
JPS6339113B2 (enrdf_load_stackoverflow) | ||
JPS6364065B2 (enrdf_load_stackoverflow) | ||
Reilly | High-power electric discharge lasers | |
JPH04322481A (ja) | 放電励起ガスレーザ装置 | |
EP0577870A1 (en) | Discharge excitation pulsed laser oscillation device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |