JPS618921A - 転写マスクのじんあい捕そく器及び半導体装置の製造方法 - Google Patents

転写マスクのじんあい捕そく器及び半導体装置の製造方法

Info

Publication number
JPS618921A
JPS618921A JP59129762A JP12976284A JPS618921A JP S618921 A JPS618921 A JP S618921A JP 59129762 A JP59129762 A JP 59129762A JP 12976284 A JP12976284 A JP 12976284A JP S618921 A JPS618921 A JP S618921A
Authority
JP
Japan
Prior art keywords
dust
thin film
glass mask
adhesive
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59129762A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0583902B2 (cg-RX-API-DMAC10.html
Inventor
Yoshihiro Osada
長田　芳裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP59129762A priority Critical patent/JPS618921A/ja
Publication of JPS618921A publication Critical patent/JPS618921A/ja
Publication of JPH0583902B2 publication Critical patent/JPH0583902B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59129762A 1984-06-23 1984-06-23 転写マスクのじんあい捕そく器及び半導体装置の製造方法 Granted JPS618921A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59129762A JPS618921A (ja) 1984-06-23 1984-06-23 転写マスクのじんあい捕そく器及び半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59129762A JPS618921A (ja) 1984-06-23 1984-06-23 転写マスクのじんあい捕そく器及び半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS618921A true JPS618921A (ja) 1986-01-16
JPH0583902B2 JPH0583902B2 (cg-RX-API-DMAC10.html) 1993-11-30

Family

ID=15017570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59129762A Granted JPS618921A (ja) 1984-06-23 1984-06-23 転写マスクのじんあい捕そく器及び半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS618921A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57179624A (en) * 1981-04-30 1982-11-05 Taamo:Kk Vibration sensing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57179624A (en) * 1981-04-30 1982-11-05 Taamo:Kk Vibration sensing device

Also Published As

Publication number Publication date
JPH0583902B2 (cg-RX-API-DMAC10.html) 1993-11-30

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Legal Events

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EXPY Cancellation because of completion of term