JPS6184537A - 容量式センサの製造方法 - Google Patents
容量式センサの製造方法Info
- Publication number
- JPS6184537A JPS6184537A JP20663984A JP20663984A JPS6184537A JP S6184537 A JPS6184537 A JP S6184537A JP 20663984 A JP20663984 A JP 20663984A JP 20663984 A JP20663984 A JP 20663984A JP S6184537 A JPS6184537 A JP S6184537A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- epitaxial layer
- type
- diffused
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 230000001681 protective effect Effects 0.000 claims abstract description 8
- 238000009792 diffusion process Methods 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 abstract description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052710 silicon Inorganic materials 0.000 abstract description 4
- 239000010703 silicon Substances 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 239000012535 impurity Substances 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 241000282693 Cercopithecidae Species 0.000 description 1
- 235000009827 Prunus armeniaca Nutrition 0.000 description 1
- 244000018633 Prunus armeniaca Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Fluid Pressure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20663984A JPS6184537A (ja) | 1984-10-02 | 1984-10-02 | 容量式センサの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20663984A JPS6184537A (ja) | 1984-10-02 | 1984-10-02 | 容量式センサの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6184537A true JPS6184537A (ja) | 1986-04-30 |
| JPH0443226B2 JPH0443226B2 (enrdf_load_stackoverflow) | 1992-07-15 |
Family
ID=16526684
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20663984A Granted JPS6184537A (ja) | 1984-10-02 | 1984-10-02 | 容量式センサの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6184537A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02290524A (ja) * | 1989-01-30 | 1990-11-30 | Dresser Ind Inc | 半導体ウエーハ及びその形成法とトランスジューサ及びその製法 |
| JPH04143628A (ja) * | 1990-10-05 | 1992-05-18 | Yamatake Honeywell Co Ltd | 静電容量式圧力センサ |
| EP0501359A3 (en) * | 1991-02-25 | 1994-05-18 | Canon Kk | Semiconductor sensor of electrostatic capacitance type |
| US5520051A (en) * | 1989-09-27 | 1996-05-28 | Nippondenso Co., Ltd. | Strain sensing device |
| US6250165B1 (en) | 1998-02-02 | 2001-06-26 | Denso Corporation | Semiconductor physical quantity sensor |
| US6388300B1 (en) | 1999-01-25 | 2002-05-14 | Denso Corporation | Semiconductor physical quantity sensor and method of manufacturing the same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR112022014518A2 (pt) * | 2020-01-31 | 2022-09-20 | Sumitomo Metal Mining Co | Partículas absorventes de onda eletromagnética, líquido de dispersão de partícula absorvente de onda eletromagnética e método para fabricação de partículas absorventes de onda eletromagnética |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5764978A (en) * | 1980-10-03 | 1982-04-20 | Ibm | Capacitive pressure transducer |
| JPS5873166A (ja) * | 1981-10-13 | 1983-05-02 | ユナイテツド・テクノロジ−ズ・コ−ポレイシヨン | 容量性圧力トランスジューサの製造方法 |
-
1984
- 1984-10-02 JP JP20663984A patent/JPS6184537A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5764978A (en) * | 1980-10-03 | 1982-04-20 | Ibm | Capacitive pressure transducer |
| JPS5873166A (ja) * | 1981-10-13 | 1983-05-02 | ユナイテツド・テクノロジ−ズ・コ−ポレイシヨン | 容量性圧力トランスジューサの製造方法 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02290524A (ja) * | 1989-01-30 | 1990-11-30 | Dresser Ind Inc | 半導体ウエーハ及びその形成法とトランスジューサ及びその製法 |
| US5520051A (en) * | 1989-09-27 | 1996-05-28 | Nippondenso Co., Ltd. | Strain sensing device |
| JPH04143628A (ja) * | 1990-10-05 | 1992-05-18 | Yamatake Honeywell Co Ltd | 静電容量式圧力センサ |
| EP0501359A3 (en) * | 1991-02-25 | 1994-05-18 | Canon Kk | Semiconductor sensor of electrostatic capacitance type |
| US6250165B1 (en) | 1998-02-02 | 2001-06-26 | Denso Corporation | Semiconductor physical quantity sensor |
| US6388300B1 (en) | 1999-01-25 | 2002-05-14 | Denso Corporation | Semiconductor physical quantity sensor and method of manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0443226B2 (enrdf_load_stackoverflow) | 1992-07-15 |
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