JPS6183032U - - Google Patents
Info
- Publication number
- JPS6183032U JPS6183032U JP16759184U JP16759184U JPS6183032U JP S6183032 U JPS6183032 U JP S6183032U JP 16759184 U JP16759184 U JP 16759184U JP 16759184 U JP16759184 U JP 16759184U JP S6183032 U JPS6183032 U JP S6183032U
- Authority
- JP
- Japan
- Prior art keywords
- pure water
- semiconductor wafers
- cleaning
- utility
- registration request
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
第1図は本考案の一実施例による洗浄装置の断
面図である。
1……水洗槽、2……バブリング用窒素配管、
3……オーバーフロー用純水供給口、4……キヤ
リア固定用テフロン製ハンガー、5……金属製ア
ーム、6……カム、7……排気ダクト、8……キ
ヤリア。
FIG. 1 is a sectional view of a cleaning device according to an embodiment of the present invention. 1...Washing tank, 2...Nitrogen piping for bubbling,
3...Pure water supply port for overflow, 4...Teflon hanger for fixing the carrier, 5...Metal arm, 6...Cam, 7...Exhaust duct, 8...Carrier.
Claims (1)
キヤリア本体に機械的な上下振動を与えることを
特徴とする半導体ウエーハの純水洗浄装置。 A device for cleaning semiconductor wafers with pure water, which is characterized by applying mechanical vertical vibration to a wafer carrier body during cleaning of semiconductor wafers with pure water.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16759184U JPS6183032U (en) | 1984-11-05 | 1984-11-05 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16759184U JPS6183032U (en) | 1984-11-05 | 1984-11-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6183032U true JPS6183032U (en) | 1986-06-02 |
Family
ID=30725380
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16759184U Pending JPS6183032U (en) | 1984-11-05 | 1984-11-05 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6183032U (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62202393U (en) * | 1986-06-12 | 1987-12-23 | ||
JPH01199432A (en) * | 1987-09-09 | 1989-08-10 | Orr Robert F | Method and apparatus for washing , rinsing and drying silicon wafer |
JPH0291339U (en) * | 1989-01-05 | 1990-07-19 |
-
1984
- 1984-11-05 JP JP16759184U patent/JPS6183032U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62202393U (en) * | 1986-06-12 | 1987-12-23 | ||
JPH01199432A (en) * | 1987-09-09 | 1989-08-10 | Orr Robert F | Method and apparatus for washing , rinsing and drying silicon wafer |
JPH0291339U (en) * | 1989-01-05 | 1990-07-19 |
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