JPH0247031U - - Google Patents

Info

Publication number
JPH0247031U
JPH0247031U JP12587288U JP12587288U JPH0247031U JP H0247031 U JPH0247031 U JP H0247031U JP 12587288 U JP12587288 U JP 12587288U JP 12587288 U JP12587288 U JP 12587288U JP H0247031 U JPH0247031 U JP H0247031U
Authority
JP
Japan
Prior art keywords
photomask
reticle
cleaning
chemical solution
scrub
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12587288U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12587288U priority Critical patent/JPH0247031U/ja
Publication of JPH0247031U publication Critical patent/JPH0247031U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例の縦断面図、第2図
は本考案の他の実施例の縦断面図、第3図は従来
のブラシ洗浄機の縦断面図である。 1……レチクル(又はフオトマスク)、2,1
2……ブラシ、3……洗浄槽、4……オーバーフ
ロー槽、5……レチクル保持アーム、6……ノズ
ル、7……シヤワー、8……排液口。
FIG. 1 is a vertical cross-sectional view of one embodiment of the present invention, FIG. 2 is a vertical cross-sectional view of another embodiment of the present invention, and FIG. 3 is a vertical cross-sectional view of a conventional brush washer. 1...Reticle (or photomask), 2,1
2... Brush, 3... Cleaning tank, 4... Overflow tank, 5... Reticle holding arm, 6... Nozzle, 7... Shower, 8... Drain port.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体製造用フオトマスク及びレチクルの表面
に薬液を供給しながらブラシ及びスポンジにより
スクラブ機構を用いてスクラブ洗浄するフオトマ
スク・レチクル洗浄機において、薬液を浸たした
洗浄槽中にスクラブ機構を設け、薬液中でスクラ
ブ洗浄することを特徴とするフオトマスク・レチ
クル洗浄機。
In a photomask/reticle cleaning machine that uses a scrubbing mechanism with a brush and sponge to scrub the surface of a photomask or reticle for semiconductor manufacturing while supplying a chemical solution to the surface, the scrubbing mechanism is installed in a cleaning tank immersed in the chemical solution. A photomask/reticle cleaning machine that performs scrub cleaning.
JP12587288U 1988-09-26 1988-09-26 Pending JPH0247031U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12587288U JPH0247031U (en) 1988-09-26 1988-09-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12587288U JPH0247031U (en) 1988-09-26 1988-09-26

Publications (1)

Publication Number Publication Date
JPH0247031U true JPH0247031U (en) 1990-03-30

Family

ID=31376862

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12587288U Pending JPH0247031U (en) 1988-09-26 1988-09-26

Country Status (1)

Country Link
JP (1) JPH0247031U (en)

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