JPS6161532B2 - - Google Patents

Info

Publication number
JPS6161532B2
JPS6161532B2 JP55101254A JP10125480A JPS6161532B2 JP S6161532 B2 JPS6161532 B2 JP S6161532B2 JP 55101254 A JP55101254 A JP 55101254A JP 10125480 A JP10125480 A JP 10125480A JP S6161532 B2 JPS6161532 B2 JP S6161532B2
Authority
JP
Japan
Prior art keywords
resist
pattern
developer
rinsing
resist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55101254A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5727031A (en
Inventor
Tadamasa Ogawa
Minoru Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP10125480A priority Critical patent/JPS5727031A/ja
Publication of JPS5727031A publication Critical patent/JPS5727031A/ja
Publication of JPS6161532B2 publication Critical patent/JPS6161532B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP10125480A 1980-07-25 1980-07-25 Formation of resist pattern Granted JPS5727031A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10125480A JPS5727031A (en) 1980-07-25 1980-07-25 Formation of resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10125480A JPS5727031A (en) 1980-07-25 1980-07-25 Formation of resist pattern

Publications (2)

Publication Number Publication Date
JPS5727031A JPS5727031A (en) 1982-02-13
JPS6161532B2 true JPS6161532B2 (enrdf_load_stackoverflow) 1986-12-26

Family

ID=14295770

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10125480A Granted JPS5727031A (en) 1980-07-25 1980-07-25 Formation of resist pattern

Country Status (1)

Country Link
JP (1) JPS5727031A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4535054A (en) * 1983-05-05 1985-08-13 Hughes Aircraft Company Wet process for developing styrene polymer resists for submicron lithography

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5511311A (en) * 1978-07-10 1980-01-26 Hitachi Ltd Method of photoresist developing

Also Published As

Publication number Publication date
JPS5727031A (en) 1982-02-13

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