JPS6161252B2 - - Google Patents
Info
- Publication number
- JPS6161252B2 JPS6161252B2 JP54026495A JP2649579A JPS6161252B2 JP S6161252 B2 JPS6161252 B2 JP S6161252B2 JP 54026495 A JP54026495 A JP 54026495A JP 2649579 A JP2649579 A JP 2649579A JP S6161252 B2 JPS6161252 B2 JP S6161252B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- mask
- boron
- diffused
- organic film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2649579A JPS55118039A (en) | 1979-03-07 | 1979-03-07 | Mask for x-ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2649579A JPS55118039A (en) | 1979-03-07 | 1979-03-07 | Mask for x-ray exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55118039A JPS55118039A (en) | 1980-09-10 |
JPS6161252B2 true JPS6161252B2 (enrdf_load_stackoverflow) | 1986-12-24 |
Family
ID=12195066
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2649579A Granted JPS55118039A (en) | 1979-03-07 | 1979-03-07 | Mask for x-ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55118039A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62112933U (enrdf_load_stackoverflow) * | 1986-01-10 | 1987-07-18 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5337365A (en) * | 1976-09-18 | 1978-04-06 | Nippon Telegr & Teleph Corp <Ntt> | Correcting method of d/a converting error for d/a converter |
JPS53134367A (en) * | 1977-04-28 | 1978-11-22 | Toppan Printing Co Ltd | Xxray mask |
-
1979
- 1979-03-07 JP JP2649579A patent/JPS55118039A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62112933U (enrdf_load_stackoverflow) * | 1986-01-10 | 1987-07-18 |
Also Published As
Publication number | Publication date |
---|---|
JPS55118039A (en) | 1980-09-10 |
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