JPS6160910B2 - - Google Patents

Info

Publication number
JPS6160910B2
JPS6160910B2 JP57182497A JP18249782A JPS6160910B2 JP S6160910 B2 JPS6160910 B2 JP S6160910B2 JP 57182497 A JP57182497 A JP 57182497A JP 18249782 A JP18249782 A JP 18249782A JP S6160910 B2 JPS6160910 B2 JP S6160910B2
Authority
JP
Japan
Prior art keywords
mesh
holder
chamber
substrate
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57182497A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5970777A (ja
Inventor
Eiichiro Imaoka
Tsuneaki Uema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu General Ltd
Original Assignee
Fujitsu General Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu General Ltd filed Critical Fujitsu General Ltd
Priority to JP18249782A priority Critical patent/JPS5970777A/ja
Publication of JPS5970777A publication Critical patent/JPS5970777A/ja
Publication of JPS6160910B2 publication Critical patent/JPS6160910B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP18249782A 1982-10-18 1982-10-18 スパツタリング装置 Granted JPS5970777A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18249782A JPS5970777A (ja) 1982-10-18 1982-10-18 スパツタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18249782A JPS5970777A (ja) 1982-10-18 1982-10-18 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS5970777A JPS5970777A (ja) 1984-04-21
JPS6160910B2 true JPS6160910B2 (enExample) 1986-12-23

Family

ID=16119321

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18249782A Granted JPS5970777A (ja) 1982-10-18 1982-10-18 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS5970777A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102409312A (zh) * 2011-11-23 2012-04-11 林嘉宏 少落尘的真空磁控溅射镀膜设备
CN104651779A (zh) * 2015-02-11 2015-05-27 烟台首钢磁性材料股份有限公司 一种用于钕铁硼磁体的镀膜设备及镀膜工艺

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5835591B2 (ja) * 1979-01-23 1983-08-03 株式会社富士通ゼネラル スパツタリング装置

Also Published As

Publication number Publication date
JPS5970777A (ja) 1984-04-21

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