JPS5970777A - スパツタリング装置 - Google Patents

スパツタリング装置

Info

Publication number
JPS5970777A
JPS5970777A JP18249782A JP18249782A JPS5970777A JP S5970777 A JPS5970777 A JP S5970777A JP 18249782 A JP18249782 A JP 18249782A JP 18249782 A JP18249782 A JP 18249782A JP S5970777 A JPS5970777 A JP S5970777A
Authority
JP
Japan
Prior art keywords
mesh
substrate holder
holder
anode
sputtering apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18249782A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6160910B2 (enExample
Inventor
Eiichiro Imaoka
今岡　英一郎
Tsuneaki Uema
上間　恒明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu General Ltd
Aerojet Rocketdyne Holdings Inc
Original Assignee
Fujitsu General Ltd
Gencorp Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu General Ltd, Gencorp Inc filed Critical Fujitsu General Ltd
Priority to JP18249782A priority Critical patent/JPS5970777A/ja
Publication of JPS5970777A publication Critical patent/JPS5970777A/ja
Publication of JPS6160910B2 publication Critical patent/JPS6160910B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP18249782A 1982-10-18 1982-10-18 スパツタリング装置 Granted JPS5970777A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18249782A JPS5970777A (ja) 1982-10-18 1982-10-18 スパツタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18249782A JPS5970777A (ja) 1982-10-18 1982-10-18 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS5970777A true JPS5970777A (ja) 1984-04-21
JPS6160910B2 JPS6160910B2 (enExample) 1986-12-23

Family

ID=16119321

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18249782A Granted JPS5970777A (ja) 1982-10-18 1982-10-18 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS5970777A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102409312A (zh) * 2011-11-23 2012-04-11 林嘉宏 少落尘的真空磁控溅射镀膜设备
JP2016148108A (ja) * 2015-02-11 2016-08-18 煙台首鋼磁性材料株式有限公司 ネオジム磁石の表面コーティング装置及び表面コーティング方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55100979A (en) * 1979-01-23 1980-08-01 Fujitsu General Ltd Sputtering apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55100979A (en) * 1979-01-23 1980-08-01 Fujitsu General Ltd Sputtering apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102409312A (zh) * 2011-11-23 2012-04-11 林嘉宏 少落尘的真空磁控溅射镀膜设备
JP2016148108A (ja) * 2015-02-11 2016-08-18 煙台首鋼磁性材料株式有限公司 ネオジム磁石の表面コーティング装置及び表面コーティング方法

Also Published As

Publication number Publication date
JPS6160910B2 (enExample) 1986-12-23

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