JPS6154112B2 - - Google Patents
Info
- Publication number
- JPS6154112B2 JPS6154112B2 JP57053396A JP5339682A JPS6154112B2 JP S6154112 B2 JPS6154112 B2 JP S6154112B2 JP 57053396 A JP57053396 A JP 57053396A JP 5339682 A JP5339682 A JP 5339682A JP S6154112 B2 JPS6154112 B2 JP S6154112B2
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- magnetic field
- electric field
- target
- control device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5339682A JPS58171569A (ja) | 1982-03-31 | 1982-03-31 | スパッタリング方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5339682A JPS58171569A (ja) | 1982-03-31 | 1982-03-31 | スパッタリング方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58171569A JPS58171569A (ja) | 1983-10-08 |
JPS6154112B2 true JPS6154112B2 (enrdf_load_stackoverflow) | 1986-11-20 |
Family
ID=12941659
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5339682A Granted JPS58171569A (ja) | 1982-03-31 | 1982-03-31 | スパッタリング方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58171569A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58199860A (ja) * | 1982-05-17 | 1983-11-21 | Hitachi Ltd | 成膜方法 |
US5744011A (en) * | 1993-03-18 | 1998-04-28 | Kabushiki Kaisha Toshiba | Sputtering apparatus and sputtering method |
JP4537899B2 (ja) * | 2005-07-05 | 2010-09-08 | 富士通セミコンダクター株式会社 | 成膜方法及び半導体装置の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU475272B2 (en) * | 1971-09-07 | 1976-08-19 | Felio Corporation | Glow discharge method and apparatus |
JPS5432638A (en) * | 1977-08-17 | 1979-03-10 | Asahi Denka Kogyo Kk | Cosmetic base composition |
FR2423065A1 (fr) * | 1978-04-12 | 1979-11-09 | Battelle Memorial Institute | Procede de fabrication d'electrodes pour piles a combustible, dispositif pour la mise en oeuvre du procede et electrodes resultant de ce procede |
JPS5816068A (ja) * | 1981-07-22 | 1983-01-29 | Hitachi Ltd | プレ−ナマグネトロン方式のスパッタリング方法 |
-
1982
- 1982-03-31 JP JP5339682A patent/JPS58171569A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58171569A (ja) | 1983-10-08 |
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